JPS5778533A - Dry type development method - Google Patents

Dry type development method

Info

Publication number
JPS5778533A
JPS5778533A JP55154962A JP15496280A JPS5778533A JP S5778533 A JPS5778533 A JP S5778533A JP 55154962 A JP55154962 A JP 55154962A JP 15496280 A JP15496280 A JP 15496280A JP S5778533 A JPS5778533 A JP S5778533A
Authority
JP
Japan
Prior art keywords
irradiation
molecular weight
electron beam
resist
under
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55154962A
Other languages
Japanese (ja)
Other versions
JPS647652B2 (en
Inventor
Masami Kakuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP55154962A priority Critical patent/JPS5778533A/en
Publication of JPS5778533A publication Critical patent/JPS5778533A/en
Publication of JPS647652B2 publication Critical patent/JPS647652B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To form a high precision pattern, by executing electron beam patternwise exposure and ultraviolet ray irradiation on a positive type resist. CONSTITUTION:An electron beam positive type rsist decreasing in molecular weight under electron beam irradiation and increasing in molecular weight under its high irradiation is coated on a substrate, the resist is patternwise exposed to electron beams, and the unexposed part to the electron beams and the weakly exposed part are removed by irradiation of ultraviolet rays. In the figure, (a), (b), (c) represent changes of molecular weights of polymethyl methacrylate, polyhexafluoro- methacrylate, and polytetrafluoropropylmethacrylate, respectively, and in the case of the small irradiation region, the main chain is cut and the molecular weight decreases. Under the intense irradiation, cross-linking reaction occurs, the molecular weight increases, but the product is different in ractivity and physical property from the undeveloped part because of the side reactions different from the cross- linking reaction of the negative type resist. The parts except the electron beam exposed part are decomposed and removed.
JP55154962A 1980-11-04 1980-11-04 Dry type development method Granted JPS5778533A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55154962A JPS5778533A (en) 1980-11-04 1980-11-04 Dry type development method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55154962A JPS5778533A (en) 1980-11-04 1980-11-04 Dry type development method

Publications (2)

Publication Number Publication Date
JPS5778533A true JPS5778533A (en) 1982-05-17
JPS647652B2 JPS647652B2 (en) 1989-02-09

Family

ID=15595704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55154962A Granted JPS5778533A (en) 1980-11-04 1980-11-04 Dry type development method

Country Status (1)

Country Link
JP (1) JPS5778533A (en)

Also Published As

Publication number Publication date
JPS647652B2 (en) 1989-02-09

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