JPS5814078B2 - 金属の選択的付着方法 - Google Patents
金属の選択的付着方法Info
- Publication number
- JPS5814078B2 JPS5814078B2 JP55003709A JP370980A JPS5814078B2 JP S5814078 B2 JPS5814078 B2 JP S5814078B2 JP 55003709 A JP55003709 A JP 55003709A JP 370980 A JP370980 A JP 370980A JP S5814078 B2 JPS5814078 B2 JP S5814078B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- layer
- metal
- metallurgy
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/88—Metals
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing of the conductive pattern
- H05K3/245—Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques
- H05K3/246—Reinforcing conductive paste, ink or powder patterns by other methods, e.g. by plating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/01—Manufacture or treatment
- H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0302—Properties and characteristics in general
- H05K2201/0317—Thin film conductor layer; Thin film passive component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
- H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
- H05K3/048—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/016,033 US4206254A (en) | 1979-02-28 | 1979-02-28 | Method of selectively depositing metal on a ceramic substrate with a metallurgy pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55118687A JPS55118687A (en) | 1980-09-11 |
| JPS5814078B2 true JPS5814078B2 (ja) | 1983-03-17 |
Family
ID=21775021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55003709A Expired JPS5814078B2 (ja) | 1979-02-28 | 1980-01-18 | 金属の選択的付着方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4206254A (it) |
| EP (1) | EP0016925B1 (it) |
| JP (1) | JPS5814078B2 (it) |
| CA (1) | CA1132857A (it) |
| DE (1) | DE3060787D1 (it) |
| IT (1) | IT1151078B (it) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4493856A (en) * | 1982-03-18 | 1985-01-15 | International Business Machines Corporation | Selective coating of metallurgical features of a dielectric substrate with diverse metals |
| US4501768A (en) * | 1982-03-18 | 1985-02-26 | International Business Machines Corporation | Thin film floating zone metal coating technique |
| US4442137A (en) * | 1982-03-18 | 1984-04-10 | International Business Machines Corporation | Maskless coating of metallurgical features of a dielectric substrate |
| EP0092971B1 (en) * | 1982-04-27 | 1989-08-16 | Richardson Chemical Company | Process for selectively depositing a nickel-boron coating over a metallurgy pattern on a dielectric substrate and products produced thereby |
| US4474465A (en) * | 1982-09-07 | 1984-10-02 | International Business Machines Corporation | Method and apparatus for making a mask conforming to a ceramic substrate metallization pattern |
| DE3242069A1 (de) * | 1982-11-13 | 1984-05-17 | Erwin W. Dipl.-Chem. Dr. 7000 Stuttgart Wartenberg | Verfahren zum herstellen gemusterter luesterueberzuege auf oberflaechen von koerpern und siebdruckpaste zur durchfuehrung des verfahrens |
| US4604299A (en) * | 1983-06-09 | 1986-08-05 | Kollmorgen Technologies Corporation | Metallization of ceramics |
| US4526859A (en) * | 1983-12-12 | 1985-07-02 | International Business Machines Corporation | Metallization of a ceramic substrate |
| US4701352A (en) * | 1984-05-10 | 1987-10-20 | Kollmorgen Corporation | Surface preparation of ceramic substrates for metallization |
| US4552615A (en) * | 1984-05-21 | 1985-11-12 | International Business Machines Corporation | Process for forming a high density metallurgy system on a substrate and structure thereof |
| US4582722A (en) * | 1984-10-30 | 1986-04-15 | International Business Machines Corporation | Diffusion isolation layer for maskless cladding process |
| US4732780A (en) * | 1985-09-26 | 1988-03-22 | General Electric Company | Method of making hermetic feedthrough in ceramic substrate |
| US4684446A (en) * | 1985-09-26 | 1987-08-04 | General Electric Company | Secondary metallization by glass displacement in ceramic substrate |
| US4833039A (en) * | 1985-09-26 | 1989-05-23 | General Electric Company | Hermetic feedthrough in ceramic substrate |
| US4699811A (en) * | 1986-09-16 | 1987-10-13 | Macdermid, Incorporated | Chromium mask for electroless nickel or copper plating |
| EP0302946A1 (en) * | 1987-02-27 | 1989-02-15 | Asahi Glass Company Ltd. | Method for electrically isolating large area electrode bodies |
| US4835008A (en) * | 1987-10-05 | 1989-05-30 | Harris Corp. | Process of forming breadboard interconnect structure having plated through-holes |
| US4805683A (en) * | 1988-03-04 | 1989-02-21 | International Business Machines Corporation | Method for producing a plurality of layers of metallurgy |
| US4898117A (en) * | 1988-04-15 | 1990-02-06 | International Business Machines Corporation | Solder deposition system |
| US4934309A (en) * | 1988-04-15 | 1990-06-19 | International Business Machines Corporation | Solder deposition system |
| AT398675B (de) * | 1989-08-29 | 1995-01-25 | Austria Tech & System Tech | Verfahren zum partiellen galvanisieren von metallischen oberflächen von gedruckten schaltungen |
| US5104689A (en) * | 1990-09-24 | 1992-04-14 | International Business Machines Corporation | Method and apparatus for automated solder deposition at multiple sites |
| US8404582B2 (en) * | 2010-05-04 | 2013-03-26 | International Business Machines Corporation | Structure and method for manufacturing interconnect structures having self-aligned dielectric caps |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3617373A (en) * | 1968-05-24 | 1971-11-02 | Western Electric Co | Methods of making thin film patterns |
| DE2040180B2 (de) * | 1970-01-22 | 1977-08-25 | Intel Corp, Mountain View, Calif. (V.St.A.) | Verfahren zur verhinderung von mechanischen bruechen einer duennen, die oberflaeche eines halbleiterkoerpers ueberdeckende isolierschichten ueberziehenden elektrisch leitenden schicht |
| US3948706A (en) * | 1973-12-13 | 1976-04-06 | International Business Machines Corporation | Method for metallizing ceramic green sheets |
| US4008115A (en) * | 1976-02-25 | 1977-02-15 | Dennison Manufacturing Company | Method for making durable overcoated labels |
| DE2723499A1 (de) * | 1977-05-25 | 1978-12-07 | Licentia Gmbh | Verfahren zum herstellen eines fensters in einer isolierschicht bei halbleiteranordnungen |
-
1979
- 1979-02-28 US US06/016,033 patent/US4206254A/en not_active Expired - Lifetime
- 1979-12-13 CA CA341,840A patent/CA1132857A/en not_active Expired
-
1980
- 1980-01-18 JP JP55003709A patent/JPS5814078B2/ja not_active Expired
- 1980-02-01 IT IT19613/80A patent/IT1151078B/it active
- 1980-02-01 DE DE8080100495T patent/DE3060787D1/de not_active Expired
- 1980-02-01 EP EP80100495A patent/EP0016925B1/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| EP0016925A1 (de) | 1980-10-15 |
| IT8019613A0 (it) | 1980-02-01 |
| US4206254A (en) | 1980-06-03 |
| EP0016925B1 (de) | 1982-09-01 |
| CA1132857A (en) | 1982-10-05 |
| IT1151078B (it) | 1986-12-17 |
| DE3060787D1 (en) | 1982-10-28 |
| JPS55118687A (en) | 1980-09-11 |
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