JPS5826014A - シリコン窒化膜の形成方法 - Google Patents

シリコン窒化膜の形成方法

Info

Publication number
JPS5826014A
JPS5826014A JP56119194A JP11919481A JPS5826014A JP S5826014 A JPS5826014 A JP S5826014A JP 56119194 A JP56119194 A JP 56119194A JP 11919481 A JP11919481 A JP 11919481A JP S5826014 A JPS5826014 A JP S5826014A
Authority
JP
Japan
Prior art keywords
silicon nitride
nitride film
gaseous
film
temp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56119194A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6310893B2 (de
Inventor
Kenji Ikeda
健志 池田
Kazuhisa Takahashi
和久 高橋
Jun Osawa
大沢　潤
Wataru Suzaki
須崎　渉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP56119194A priority Critical patent/JPS5826014A/ja
Publication of JPS5826014A publication Critical patent/JPS5826014A/ja
Publication of JPS6310893B2 publication Critical patent/JPS6310893B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
JP56119194A 1981-07-31 1981-07-31 シリコン窒化膜の形成方法 Granted JPS5826014A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56119194A JPS5826014A (ja) 1981-07-31 1981-07-31 シリコン窒化膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56119194A JPS5826014A (ja) 1981-07-31 1981-07-31 シリコン窒化膜の形成方法

Publications (2)

Publication Number Publication Date
JPS5826014A true JPS5826014A (ja) 1983-02-16
JPS6310893B2 JPS6310893B2 (de) 1988-03-10

Family

ID=14755243

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56119194A Granted JPS5826014A (ja) 1981-07-31 1981-07-31 シリコン窒化膜の形成方法

Country Status (1)

Country Link
JP (1) JPS5826014A (de)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421171A (en) * 1977-07-18 1979-02-17 Matsushita Electric Ind Co Ltd Manufacture for compound semiconductor device
JPS5664442A (en) * 1979-10-30 1981-06-01 Mitsubishi Electric Corp Manufacture of semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421171A (en) * 1977-07-18 1979-02-17 Matsushita Electric Ind Co Ltd Manufacture for compound semiconductor device
JPS5664442A (en) * 1979-10-30 1981-06-01 Mitsubishi Electric Corp Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS6310893B2 (de) 1988-03-10

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