JPS5833241A - フリ−ラジカル系感光性樹脂組成物の製造方法 - Google Patents

フリ−ラジカル系感光性樹脂組成物の製造方法

Info

Publication number
JPS5833241A
JPS5833241A JP5774682A JP5774682A JPS5833241A JP S5833241 A JPS5833241 A JP S5833241A JP 5774682 A JP5774682 A JP 5774682A JP 5774682 A JP5774682 A JP 5774682A JP S5833241 A JPS5833241 A JP S5833241A
Authority
JP
Japan
Prior art keywords
polymer
dioxane
solution
hydroxyethyl
polymn
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5774682A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0160132B2 (fr
Inventor
Hirokazu Tsukahara
束原　宏和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Paper Mills Ltd
Original Assignee
Mitsubishi Paper Mills Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Paper Mills Ltd filed Critical Mitsubishi Paper Mills Ltd
Priority to JP5774682A priority Critical patent/JPS5833241A/ja
Publication of JPS5833241A publication Critical patent/JPS5833241A/ja
Publication of JPH0160132B2 publication Critical patent/JPH0160132B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP5774682A 1982-04-07 1982-04-07 フリ−ラジカル系感光性樹脂組成物の製造方法 Granted JPS5833241A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5774682A JPS5833241A (ja) 1982-04-07 1982-04-07 フリ−ラジカル系感光性樹脂組成物の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5774682A JPS5833241A (ja) 1982-04-07 1982-04-07 フリ−ラジカル系感光性樹脂組成物の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3760274A Division JPS5741482B2 (fr) 1974-04-03 1974-04-03

Publications (2)

Publication Number Publication Date
JPS5833241A true JPS5833241A (ja) 1983-02-26
JPH0160132B2 JPH0160132B2 (fr) 1989-12-21

Family

ID=13064460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5774682A Granted JPS5833241A (ja) 1982-04-07 1982-04-07 フリ−ラジカル系感光性樹脂組成物の製造方法

Country Status (1)

Country Link
JP (1) JPS5833241A (fr)

Also Published As

Publication number Publication date
JPH0160132B2 (fr) 1989-12-21

Similar Documents

Publication Publication Date Title
EP0223373B1 (fr) Photo-initiateurs solubles dans l'eau
US4269933A (en) Methods of developing photopolymerizable compositions containing an 0-nitroaromatic compound as photoinhibitor
EP0014012B1 (fr) Composition photosensible contenant un composé à insaturation éthylénique, initiateur et sensibilisateur
CH504022A (de) Lichtempfindliches Material
EP0009832A2 (fr) Matériaux photopolymérisables améliorés pour l'enregistrement
US4054635A (en) Copolymer of glycidyl methacrylate and allyl glycidyl ether
US3575925A (en) Photosensitive coating systems
JPH10500169A (ja) ビニルベンジルチミン単量体およびそれから造られた重合体および製品
US3495979A (en) Copying material for use in the photochemical preparation of printing plates
US3821167A (en) Photo-sensitive polymers,process for producing same and compositions containing said polymers
US3417055A (en) Process for preparation and separation of light sensitive stabilized diazo resins
JPS6088005A (ja) 光硬化樹脂組成物
US3615630A (en) Light-sensitive coating and recording material containing photopolymerizable compounds
US3857822A (en) Light-sensitive copolymers, a process for their manufacture and copying compositions containing them
US1587269A (en) Synthetic resins, photographic process, and media
JPH05255216A (ja) α，β−不飽和カルボキサミド単位を有する重合体結合剤を含有する放射線感応性混合物
US4326018A (en) Lithographic printing plate
JPS5833241A (ja) フリ−ラジカル系感光性樹脂組成物の製造方法
US3725064A (en) Photosensitive propargyl polymer composition and method of using
US3847610A (en) Photopolymerisation of ethylenically unsaturated organic compounds
US4021242A (en) Negative working photoresist material comprising a N-vinyl monomer, an organic halogen compound photoactivator and a maleic anhydride modified rosin and the use thereof
US3341328A (en) Photopolymerization system using ceric salts
JP3127476B2 (ja) 光反応性化合物および該化合物を使用してなる光硬化性樹脂組成物
US3930856A (en) Photopolymerisable compositions and their uses with diazonium salts as photocatalysts
JPS6076735A (ja) 光硬化樹脂組成物