JPH0160132B2 - - Google Patents

Info

Publication number
JPH0160132B2
JPH0160132B2 JP5774682A JP5774682A JPH0160132B2 JP H0160132 B2 JPH0160132 B2 JP H0160132B2 JP 5774682 A JP5774682 A JP 5774682A JP 5774682 A JP5774682 A JP 5774682A JP H0160132 B2 JPH0160132 B2 JP H0160132B2
Authority
JP
Japan
Prior art keywords
dioxane
polymer
solution
water
hydroxyethyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5774682A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5833241A (ja
Inventor
Hirokazu Tsukahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Paper Mills Ltd
Original Assignee
Mitsubishi Paper Mills Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Paper Mills Ltd filed Critical Mitsubishi Paper Mills Ltd
Priority to JP5774682A priority Critical patent/JPS5833241A/ja
Publication of JPS5833241A publication Critical patent/JPS5833241A/ja
Publication of JPH0160132B2 publication Critical patent/JPH0160132B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP5774682A 1982-04-07 1982-04-07 フリ−ラジカル系感光性樹脂組成物の製造方法 Granted JPS5833241A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5774682A JPS5833241A (ja) 1982-04-07 1982-04-07 フリ−ラジカル系感光性樹脂組成物の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5774682A JPS5833241A (ja) 1982-04-07 1982-04-07 フリ−ラジカル系感光性樹脂組成物の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3760274A Division JPS5741482B2 (fr) 1974-04-03 1974-04-03

Publications (2)

Publication Number Publication Date
JPS5833241A JPS5833241A (ja) 1983-02-26
JPH0160132B2 true JPH0160132B2 (fr) 1989-12-21

Family

ID=13064460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5774682A Granted JPS5833241A (ja) 1982-04-07 1982-04-07 フリ−ラジカル系感光性樹脂組成物の製造方法

Country Status (1)

Country Link
JP (1) JPS5833241A (fr)

Also Published As

Publication number Publication date
JPS5833241A (ja) 1983-02-26

Similar Documents

Publication Publication Date Title
EP0223373B1 (fr) Photo-initiateurs solubles dans l'eau
US4416975A (en) Photopolymerization process employing compounds containing acryloyl groups and maleimide groups
US4435496A (en) Photopolymer cleavage imaging system
EP0009832A2 (fr) Matériaux photopolymérisables améliorés pour l'enregistrement
US4054635A (en) Copolymer of glycidyl methacrylate and allyl glycidyl ether
JPH10500169A (ja) ビニルベンジルチミン単量体およびそれから造られた重合体および製品
US3595656A (en) Reprographic materials containing a water-insoluble azidochalcone
JPH09249712A (ja) 感光性組成物に有用な酸無水物改質ポリビニルアセタールの製造法
US4442196A (en) Photosensitive composition
US3615630A (en) Light-sensitive coating and recording material containing photopolymerizable compounds
JP2952861B2 (ja) 置換スルホネート基を有する重合体化合物、この重合体化合物を含む感放射線性組成物および重合体化合物の製造方法
US3857822A (en) Light-sensitive copolymers, a process for their manufacture and copying compositions containing them
KR100311848B1 (ko) N,n-이치환설폰아미드및이로부터제조한방사선민감성혼합물
US1587269A (en) Synthetic resins, photographic process, and media
US5200291A (en) Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin
US3888671A (en) Photoreactive compositions and products made therewith
CA2022150A1 (fr) Composition pour serigraphie a grande vitesse
JPH0160132B2 (fr)
US3725064A (en) Photosensitive propargyl polymer composition and method of using
JP3315757B2 (ja) 感光性多官能芳香族ジアゾ化合物およびそれを用いた感光性組成物
US4021242A (en) Negative working photoresist material comprising a N-vinyl monomer, an organic halogen compound photoactivator and a maleic anhydride modified rosin and the use thereof
US4065314A (en) Photoreactive compositions comprising polymers containing alkoxyaromaticglyoxy groups
US3635720A (en) Light-sensitive film element comprising a polyester of a polyhydric alcohol and {62 -substituted-{60 -cyanacrylic acid
US3661573A (en) Light-sensitive compounds
JPS6076735A (ja) 光硬化樹脂組成物