JPS59201445A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS59201445A
JPS59201445A JP58076521A JP7652183A JPS59201445A JP S59201445 A JPS59201445 A JP S59201445A JP 58076521 A JP58076521 A JP 58076521A JP 7652183 A JP7652183 A JP 7652183A JP S59201445 A JPS59201445 A JP S59201445A
Authority
JP
Japan
Prior art keywords
chip
pattern
package
integrated circuit
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58076521A
Other languages
Japanese (ja)
Inventor
Masataka Mizukoshi
正孝 水越
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58076521A priority Critical patent/JPS59201445A/en
Publication of JPS59201445A publication Critical patent/JPS59201445A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00Marks applied to devices, e.g. for alignment or identification
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00Marks applied to devices, e.g. for alignment or identification
    • H10W46/601Marks applied to devices, e.g. for alignment or identification for use after dicing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/541Dispositions of bond wires
    • H10W72/5449Dispositions of bond wires not being orthogonal to a side surface of the chip, e.g. fan-out arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/931Shapes of bond pads
    • H10W72/932Plan-view shape, i.e. in top view

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To avoid the mismounting of a package to a chip surface by forming an identification pattern which indicates the type of the package in which an IC chip is contained on that IC chip. CONSTITUTION:An indication area 13 is provided to the pattern surface of an IC chip 11 and the type and terminal counts of a package in which the chip 11 is contained are indicated by a pattern in that area 13. For that purpose, when a mask, which allocates logic function units in a design circuit diagram to unit cells 12 of the chip 11, is formed, the identification pattern 15 is formed on the circumference zone of the chip 11. The pattern 15 is composed of the letters each of which has dimensions of 20-40mum. For instance, combination of English capital letters and small letters such as ''DIP 28'' indicates the ceramic DIP composition and terminal counts of 28. With this constitution, the type of the package corresponding to the IC chip 11 can be identified visually and the mismounting is avoided.

Description

【発明の詳細な説明】 (3+  発明の技術分野、 本発明は半導体パッケージの種類例えはパッケージの型
式やビン数を表示する識別パi−ンを半導体装ツブの工
面に有する半導体装置に関する。
DETAILED DESCRIPTION OF THE INVENTION (3+ Technical Field of the Invention) The present invention relates to a semiconductor device having an identification pin on the surface of a semiconductor chip for indicating the type of semiconductor package and the number of bottles.

(bi  技術の背景 大規模集積回路(Ll)を形成する方法の一つに予じめ
基本パターンを設計し、必要に応じて累、子間の接続方
法を変えて11成するマスlスライス方式がある。この
方式は半導体素子上に抵ゎL1トランジスη等からなる
単位セルを予じめ配設し、拡散工程まで名品種とも生産
プロセスを共通させ、配線パターンのみを品種により変
更する。従ってLSIの量産効果と論理回路の多品m性
を両立させるため半導体素子を収容するバクケージは多
様化している。例えはユーザの仕様番こあった多品種の
論理ICを短時間で供#1liT罷なケートアレ、(I
Cは設置1仕様により入出力端子数が変わってくるので
こtlに対応する端子数を具備した複数種類のパッケー
ジが用意される。またパッケージ自体の種類が増加する
につれて素子をf&載するパッケージと素子との組合せ
パl−ンも増大してきている。
(bi) Background of the Technology One of the methods for forming large-scale integrated circuits (Ll) is the mass l slicing method in which a basic pattern is designed in advance and the connection method between the children is changed as necessary to form 11. In this method, a unit cell consisting of a resistor L1 transistor η, etc. is arranged in advance on a semiconductor element, the production process is the same up to the diffusion process with famous products, and only the wiring pattern is changed depending on the product. In order to achieve both the mass production effect of LSI and the multi-product nature of logic circuits, the back cages that house semiconductor devices are diversifying. Kate Ale, (I
Since the number of input/output terminals of C changes depending on the installation specifications, multiple types of packages are prepared with the number of terminals corresponding to Tl. Furthermore, as the types of packages themselves increase, the number of combinations of packages and devices on which devices are mounted has also increased.

IcI  従来技術と問題点 第1図は半導体集積回路チップに形成されるマスlスラ
イスICのパターン例を示す平面図、第2図はワイヤボ
ンデング後の半導体集積回路チップの平面図である。第
1図においτ半4体集積回路手y )1上に予じめ抵抗
、トランジスタ等力)らなる単位セル2が形成される。
IcI Prior Art and Problems FIG. 1 is a plan view showing an example of a pattern of a mass l-slice IC formed on a semiconductor integrated circuit chip, and FIG. 2 is a plan view of the semiconductor integrated circuit chip after wire bonding. In FIG. 1, a unit cell 2 consisting of a resistor, a transistor, etc. is formed in advance on a τ half-quadruple integrated circuit (y)1.

半導体集積回路チップ1の周辺には外・部に接続される
壬ツブ9品子即ち電源パッド3.信号バッド4を配設し
て構成される。設計図により回路図中のブロックを牛導
体集積回路チップ1の単位セル2に割当し、更にブロッ
ク間の配線処理の順でレイアウトを行ない論理回路の構
成に応じて結線パターンを設ける。パターン形成した半
導体集積回路千ツブ1は半導体パッケージに収容されパ
ッドとパッケージ側のインナーリード5とがワイヤ6で
第2図の如く接続される。一方半導体集積回路チツブ1
上の信号パッドの数及び配置はICの回路構成にか\わ
らず固定されているが、複数のパッドの中で使用される
パッドの数は第2図に示すようにICの回路構成によっ
て変動するためそれに対応したビン数の複数種類のパッ
ケージが必要とされる。この様に半導体集積回路チップ
とそれを収容するパッケージとの組合せが多岐にわたる
と半導体集積回路チップを外見上では判別できないので
その組立搭載時適切な対応がとれず誤搭載が発生する。
On the periphery of the semiconductor integrated circuit chip 1, there are 9 parts connected to the outside, ie power supply pads 3. It is configured by arranging a signal pad 4. The blocks in the circuit diagram are assigned to the unit cells 2 of the conductor integrated circuit chip 1 according to the design drawing, and the layout is further performed in the order of wiring processing between the blocks to provide a wiring pattern according to the configuration of the logic circuit. The patterned semiconductor integrated circuit block 1 is housed in a semiconductor package, and the pads and inner leads 5 on the package side are connected by wires 6 as shown in FIG. On the other hand, semiconductor integrated circuit chip 1
The number and arrangement of the signal pads on the top are fixed regardless of the circuit configuration of the IC, but the number of pads used among multiple pads varies depending on the circuit configuration of the IC, as shown in Figure 2. Therefore, multiple types of packages with corresponding number of bins are required. As described above, when there are a wide variety of combinations of semiconductor integrated circuit chips and packages that house them, it is impossible to distinguish the semiconductor integrated circuit chips from their appearance, and appropriate measures cannot be taken when assembling and mounting them, resulting in incorrect mounting.

試験においても同様にセットアツプを間違え半導体素子
にダメージを与えることがある。
Similarly, during testing, incorrect setup can cause damage to semiconductor devices.

td+  発明の目的 本発明は上記の点に鑑み、半導体集積回路チップ面にそ
れを収容するバフケージ種類を表示するようにして誤搭
載を防止することを目的とする。
td+ OBJECTS OF THE INVENTION In view of the above-mentioned points, it is an object of the present invention to prevent incorrect mounting by displaying the type of buff cage that accommodates a semiconductor integrated circuit chip on the surface of the chip.

tel  発明の構成 上自己目的は本発明によれは半導体集積回路チップ上に
該半導体集積回路チップが収容されるパッケージの種類
を表示する職別パターンを形成することによって達せら
れる。
According to the present invention, the structural purpose of the invention is achieved by forming on a semiconductor integrated circuit chip a functional pattern indicating the type of package in which the semiconductor integrated circuit chip is housed.

(fl  発明の実施例 以下本発明の一実施例を図面により詳述する。(fl Embodiments of the invention An embodiment of the present invention will be described in detail below with reference to the drawings.

第3図は本発明の一実施例である半導体パッケージの型
式及びビン数表示を施した半導体集積回路チップを示す
平面図、第4図は第3図の表示領域を示す拡大図である
。第3図に8いて半導体集積回路千ツブ11のパターン
面に表示領域13を設け、この表示領域13に半導体集
積回路千ツブ11を収容するパッケージの型式及び端子
数(ビン数)をパl−ン表示するものである。パターン
表示方法の一例として設計回路図中の論理機能単位(プ
ロツクノを半導体モツプ上の単位セル12tこ割当し設
計回路の構成により結線パターンをマスク上に形成する
が、このマスク形成時に識別パターン15を同時に形成
し、配線形成工程で半導体集積回路チップ11の表示領
域13に転写し識別パターン15を形成する。例えばホ
トエッチング工程テ被+15写ハターンを有するマスク
とアルミニウム膜を形成した上にホトレジスト膜を塗布
した半導体基板とを位置合せして重ね合せ露光、現像し
てホトレジスト膜パターンを作り、これをマスクとして
ウェット又はドライエツチングによす所要のアルミニウ
ムのパターンを転写、形成する。向衣示領域13はチッ
プ表面上のどこに設けてもよいが半導体集積回路チップ
11の周辺四隅の倒れか一端の空白部に設ければ素子形
成領域を減少させることなく表示が可能である。また表
示工程は上述の様に最終的な回路構成を行なうバターニ
ング時に基板上に金属膜(通常アルミニウム〕を被着さ
せ前述したホトエツチング法により回路パターンと識別
バl−ンを同時形成する力)、或は半導体集積回路千ツ
ブ11の周辺に設けるパッド14のパターン形成時に行
なうことにより生産プロセスを変更することなく表示が
可能である。また識別パターン15は1文字尚り20μ
〜40μの字画で形成し例えば“DIP28’等と英人
又字、小文字の組合せ、端子数を示す数字に号を表示す
るCとによりセラミックディップ構造で28ビンを弔す
るバクケージを示すことになり、作業者が目視で半導体
集積回路チップに対応するパッケージの種類認識できる
ので誤搭載は防止される。また微細表示で、ちるため大
きなスペースは不要であり表示領域を十分とることかで
さる。更に識別パターンは配線工描よりも前の工程で半
導体基板表面に溝を形成しで構成してもよくパターンと
してはバーコード等ヲ用いてもよく、バーコードをセン
サで認識1−ることによってアセンブリの自動化を図る
Cとも容易である。
FIG. 3 is a plan view showing a semiconductor integrated circuit chip in which the type and number of bins of a semiconductor package are displayed according to an embodiment of the present invention, and FIG. 4 is an enlarged view showing the display area of FIG. 3. In FIG. 3, a display area 13 is provided on the pattern surface of the semiconductor integrated circuit block 11, and the type and number of terminals (bin number) of the package that accommodates the semiconductor integrated circuit block 11 are displayed on the display area 13. It is displayed on the screen. As an example of a pattern display method, a logic function unit (program number) in a designed circuit diagram is assigned to 12t unit cells on a semiconductor chip, and a connection pattern is formed on a mask according to the configuration of the designed circuit. At the same time, the identification pattern 15 is formed and transferred to the display area 13 of the semiconductor integrated circuit chip 11 in the wiring formation process to form the identification pattern 15. For example, in the photoetching process, a mask having +15 pattern patterns and an aluminum film are formed, and then a photoresist film is formed. A photoresist film pattern is created by aligning the coated semiconductor substrate, overlapping exposure, and development, and using this as a mask, a desired aluminum pattern is transferred and formed by wet or dry etching. may be provided anywhere on the chip surface, but if it is provided at the four corners of the semiconductor integrated circuit chip 11 or in a blank space at one end, display can be performed without reducing the element formation area.The display process is as described above. A metal film (usually aluminum) is deposited on the substrate during patterning to form the final circuit configuration, and a circuit pattern and identification balloon are simultaneously formed using the photo-etching method described above), or a semiconductor integrated circuit. By performing this at the time of forming the pattern of the pad 14 provided around the 1000 tubes 11, it is possible to display without changing the production process.In addition, the identification pattern 15 has a thickness of 20μ for each character.
It is formed with a stroke of ~40μ, and for example, "DIP28" is a combination of English letters, lowercase letters, and C indicating the number of terminals, indicating a back cage with a ceramic dip structure that holds 28 bottles. Since the operator can visually recognize the type of package that corresponds to the semiconductor integrated circuit chip, incorrect mounting is prevented.Furthermore, since the display is minute and can be folded, it does not require a large space, so it is important to ensure that the display area is sufficient. The identification pattern may be formed by forming grooves on the surface of the semiconductor substrate in a process prior to wiring drawing, or a bar code or the like may be used as the pattern, and the assembly is performed by recognizing the bar code with a sensor. It is also easy to use C, which aims to automate the process.

Igl  発明の効果 以上詳細に説明したように本発明によイ1はパッケージ
屋式及び端子数を牛導体果槓回路千ツブ面番こ表示する
ことにより組立及びf:、験におりf 6誤悟載、又は
wA接続が防止でき作業効率は同上する。
Igl Effects of the Invention As explained in detail above, according to the present invention, by displaying the package type and number of terminals as the number on the surface of the conductor circuit, assembly and f:, f6 error can be avoided. The work efficiency is the same as above as it is possible to prevent the connection between PC and WA.

しかも実装領域を減少させることなくまた通常プロセス
でパターン表示が可能である等大きな効果がある。
Moreover, it has great effects such as being able to display patterns in a normal process without reducing the mounting area.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は半導体集積回路子ンブに形成される識別パター
ン例を示す平面図、第2図はワイヤボンデング後の半導
体集積回路子yブの平面図、第3図は本発明の一実施例
である半導体パッケージの型式及びビン数表示を施した
半導体集積回路子ツブを示す平面図、第4図は第3図の
表示領域を示す拡大図である。 図中11・・・・・・半導体集積回路チップ、12・・
・・・・単位セル、13・・・・・・表示領域、14・
・・・・・パッド、15・・・・・・識別パターン。
FIG. 1 is a plan view showing an example of an identification pattern formed on a semiconductor integrated circuit board, FIG. 2 is a plan view of a semiconductor integrated circuit board after wire bonding, and FIG. 3 is an embodiment of the present invention. FIG. 4 is an enlarged view showing the display area of FIG. 3. FIG. In the figure 11... Semiconductor integrated circuit chip, 12...
... Unit cell, 13 ... Display area, 14.
...Pad, 15...Identification pattern.

Claims (1)

【特許請求の範囲】[Claims] 半導体集積回路チップ上に該半導体集積回路チクプが収
容されるパッケージの種類を界示する鐘別パターンが形
成されていることを特徴とする半導体装置。
1. A semiconductor device, characterized in that a bell pattern indicating the type of package in which the semiconductor integrated circuit chip is housed is formed on the semiconductor integrated circuit chip.
JP58076521A 1983-04-30 1983-04-30 Semiconductor device Pending JPS59201445A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58076521A JPS59201445A (en) 1983-04-30 1983-04-30 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58076521A JPS59201445A (en) 1983-04-30 1983-04-30 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS59201445A true JPS59201445A (en) 1984-11-15

Family

ID=13607582

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58076521A Pending JPS59201445A (en) 1983-04-30 1983-04-30 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS59201445A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5852814A (en) * 1981-09-24 1983-03-29 Nec Corp Semiconductor integrated circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5852814A (en) * 1981-09-24 1983-03-29 Nec Corp Semiconductor integrated circuit

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