JPS59227121A - 荷電ビ−ム露光装置 - Google Patents

荷電ビ−ム露光装置

Info

Publication number
JPS59227121A
JPS59227121A JP58102488A JP10248883A JPS59227121A JP S59227121 A JPS59227121 A JP S59227121A JP 58102488 A JP58102488 A JP 58102488A JP 10248883 A JP10248883 A JP 10248883A JP S59227121 A JPS59227121 A JP S59227121A
Authority
JP
Japan
Prior art keywords
signal
exposed
register
circuit
movement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58102488A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0352212B2 (de
Inventor
Tomeo Suzuki
鈴木　留夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
NTT Inc
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP58102488A priority Critical patent/JPS59227121A/ja
Publication of JPS59227121A publication Critical patent/JPS59227121A/ja
Publication of JPH0352212B2 publication Critical patent/JPH0352212B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58102488A 1983-06-08 1983-06-08 荷電ビ−ム露光装置 Granted JPS59227121A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58102488A JPS59227121A (ja) 1983-06-08 1983-06-08 荷電ビ−ム露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58102488A JPS59227121A (ja) 1983-06-08 1983-06-08 荷電ビ−ム露光装置

Publications (2)

Publication Number Publication Date
JPS59227121A true JPS59227121A (ja) 1984-12-20
JPH0352212B2 JPH0352212B2 (de) 1991-08-09

Family

ID=14328814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58102488A Granted JPS59227121A (ja) 1983-06-08 1983-06-08 荷電ビ−ム露光装置

Country Status (1)

Country Link
JP (1) JPS59227121A (de)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55116108A (en) * 1979-03-02 1980-09-06 Hitachi Ltd Positioning control system
JPS56153737A (en) * 1980-04-30 1981-11-27 Fujitsu Ltd Exposing method for electron beam
JPS57162334A (en) * 1981-03-31 1982-10-06 Fujitsu Ltd Electron beam exposing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55116108A (en) * 1979-03-02 1980-09-06 Hitachi Ltd Positioning control system
JPS56153737A (en) * 1980-04-30 1981-11-27 Fujitsu Ltd Exposing method for electron beam
JPS57162334A (en) * 1981-03-31 1982-10-06 Fujitsu Ltd Electron beam exposing method

Also Published As

Publication number Publication date
JPH0352212B2 (de) 1991-08-09

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