JPS5964542A - Preparation of silica glass - Google Patents
Preparation of silica glassInfo
- Publication number
- JPS5964542A JPS5964542A JP17446382A JP17446382A JPS5964542A JP S5964542 A JPS5964542 A JP S5964542A JP 17446382 A JP17446382 A JP 17446382A JP 17446382 A JP17446382 A JP 17446382A JP S5964542 A JPS5964542 A JP S5964542A
- Authority
- JP
- Japan
- Prior art keywords
- silica glass
- alkoxyl
- water
- ammonia
- alkoxyl silicone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Compositions (AREA)
- Silicon Compounds (AREA)
Abstract
Description
【発明の詳細な説明】 本発明はシリカガラスの製造方法に関する。[Detailed description of the invention] The present invention relates to a method for manufacturing silica glass.
si(CH30)、等のアルコキシルシリコンを原料と
してシリカガラスを製造する場合、従来、CH30Hに
よって希釈されたSi (CHBO)4溶液に、攪拌し
ながら、直接、NT(、OHを含んだ水を加えて固化(
ゲル化)させ、さらに乾燥、焼結を経て、シリカガラス
体が得られていた。When producing silica glass using alkoxyl silicon such as si(CH30) as a raw material, conventionally, water containing NT(, OH) is directly added to a Si(CHBO)4 solution diluted with CH30H while stirring. and solidify (
After gelation), drying, and sintering, a silica glass body was obtained.
しかしながらこの従来の方法では、CH30Hによって
希釈されたsi(CH30)4溶液に、反応触媒である
NH4OHを含んだ水を直接加えるので、該添加水中の
NH,OHの濃度が高すぎると、si (CH30)。However, in this conventional method, water containing NH4OH, which is a reaction catalyst, is directly added to the si(CH30)4 solution diluted with CH30H, so if the concentration of NH,OH in the added water is too high, si(CH30) CH30).
の加水分解反応が速すぎ、白色沈澱を生じて、同化(ゲ
ル化)シナい一方、該添加水中のNH,OH濃度が低す
ぎると、加水分解反応が進行せず、ゲル体が得られない
という欠点があった。すなわちアルコキシルシリコンに
NH,O)(を含んだ水を直接加え、加水分解して、均
一なゲル体を得るのは極めて難しく、結果として良質な
シリカガラスが得られないという欠点があった。The hydrolysis reaction of is too fast, producing a white precipitate and inhibiting assimilation (gelation). On the other hand, if the NH and OH concentrations in the added water are too low, the hydrolysis reaction does not proceed and a gel body cannot be obtained. There was a drawback. That is, it is extremely difficult to obtain a uniform gel body by directly adding water containing NH, O) (to alkoxyl silicone and hydrolyzing it), resulting in a drawback that good quality silica glass cannot be obtained.
本発明はこれらの欠点を除去するため、原料とするアル
コキシルシリコンにあらかじめ水を適量加えて混合した
後、この混合溶液を反応触媒であるアンモニアを含むガ
ス体に曝らし、固化(ゲル化)せしめるものであり、そ
の目的は、均一な加水分解反応を実現して、均一なゲル
体を得る手法を提供することによって、良質なシリカガ
ラスの製造を可能にすることにある。In order to eliminate these drawbacks, the present invention involves adding an appropriate amount of water to the raw material alkoxyl silicon in advance and mixing it, and then exposing this mixed solution to a gaseous body containing ammonia, which is a reaction catalyst, to solidify (gel) it. The purpose of this method is to realize a uniform hydrolysis reaction and provide a method for obtaining a uniform gel body, thereby making it possible to manufacture high-quality silica glass.
第1図は、本発明の一実施例図であって、1は反応容器
、2はアルコキシルシリコン、アルコールおよび水の混
合液、3は発泡管、4は配管、5はサチュレータ、6は
アンモニア水である。第1図の実施例では、反応容器1
内に入れたアルコキシルシリコン、アルコールおよび水
の混合液2を、サチュレータ5からArガスによって輸
送される反応促進剤であるNH,OHを含むアンモニア
水の蒸気に、一定時間際らした後、発泡管3を取り出し
、該混合液2を固化させるものである。FIG. 1 is a diagram showing an embodiment of the present invention, in which 1 is a reaction vessel, 2 is a mixture of alkoxyl silicone, alcohol, and water, 3 is a foaming tube, 4 is piping, 5 is a saturator, and 6 is aqueous ammonia. It is. In the embodiment of FIG.
The mixture 2 of alkoxyl silicone, alcohol, and water placed in the tube is exposed to ammonia water vapor containing NH and OH as reaction accelerators transported by Ar gas from the saturator 5 for a certain period of time, and then 3 is taken out and the mixed liquid 2 is solidified.
今、前記実施例において、混合液2として、51(cH
8o)4、C’H80HおよびH2Cを1:2:30体
積比で含む溶液を10e1またアンモニア水6として5
%N)(、OH液を使用した場合、30℃の温度下にお
いて、毎分100JのArガスによって輸送されたアン
モニアを含むガスに、1分間該混合液を曝らすことによ
って均質なゲル体が得られた。Now, in the above example, 51 (cH
8o) A solution containing 4, C'H80H and H2C in a volume ratio of 1:2:30 as 10e1 and ammonia water 6 as 5
%N) (When using an OH solution, a homogeneous gel body is formed by exposing the mixed solution for 1 minute to a gas containing ammonia transported by Ar gas at 100 J/min at a temperature of 30°C. was gotten.
°この際、ゲル化させるための接触時間(曝らす時間)
は、アンモニア水中のNH,OHa度、反応温度、混合
液中の51(an、o)、の割合に依存し、アンモニア
水中のNH4OHa度が高いほど、また反応温度が高い
ほど、さらに混合液中のS i (CH30) 4の割
合が多いほど、ゲル化のための接触時間は短くなる。°At this time, contact time (exposure time) for gelation
depends on the degree of NH4OHa in the ammonia water, the reaction temperature, and the ratio of 51(an, o) in the mixture.The higher the degree of NH4OHa in the ammonia water and the higher the reaction temperature, the more The higher the proportion of S i (CH30) 4, the shorter the contact time for gelation.
なお混合液中の81(C14aO)+の割合が一定値以
下となると、NH,OH濃度を高めても、また反応温度
を高めても、ゲル化反応は生じず、ゲル体は得られない
。Note that when the proportion of 81(C14aO)+ in the mixed solution is below a certain value, no gelation reaction occurs and no gel body is obtained even if the NH and OH concentrations are increased or the reaction temperature is increased.
第2図は混合液のゲル化領域を示した図である。FIG. 2 is a diagram showing the gelation region of the mixed liquid.
縦軸は、H2Cと5i(aH8o)4の混合割合(体積
比)を、横軸は、接触させるアンモニア水中のNH,O
H濃度(モル%)を示している。第2図かられかるよう
に、混合液中のS i (CH30)2割合が高い場合
、接触アンモニア水中のNH4OHIAs度が低くても
容易にゲル化するが、水の混合割合を大きくすると、ゲ
ル化しにく(なり、第2図の曲線以上の領域条件ではゲ
ル体は得られなかった。The vertical axis is the mixing ratio (volume ratio) of H2C and 5i(aH8o)4, and the horizontal axis is the NH, O in the ammonia water to be brought into contact.
The H concentration (mol%) is shown. As can be seen from Figure 2, when the proportion of Si (CH30)2 in the mixed solution is high, gelation occurs easily even if the concentration of NH4OHIAs in the contact ammonia water is low, but when the proportion of water is increased, gelation occurs. However, no gel was obtained under the conditions of the area above the curve in FIG. 2.
以上のようにして得られた均質なゲル体を乾燥した後、
1づ・00〜1500℃の温度で焼結することによって
良質な透明シリカガラス体が得られた。After drying the homogeneous gel body obtained as above,
A high-quality transparent silica glass body was obtained by sintering at a temperature of 1.00 to 1500°C.
また本発明で、アルコキシルシリコンに、他の金属アル
キル化合物、たとえばアルコキシルゲルマニウム、アル
コキシルアルミニウム、”Jを一定割合で混合した原料
溶液を使用した場合にも、前記と同様の操作によってゲ
ル体を得ることが可能であり、さらに該ゲル体を乾燥、
焼結すると、ドープトシリカガラス体が得られる。Furthermore, in the present invention, even when a raw material solution containing alkoxyl silicone and other metal alkyl compounds such as alkoxyl germanium, alkoxyl aluminum, and "J" is mixed at a certain ratio, a gel body can be obtained by the same operation as described above. It is possible to further dry the gel body,
Upon sintering, a doped silica glass body is obtained.
以上説明したようK、本発明のシリカガラスの製造方法
によって、アルコキシルシリコンを原料として、容易に
均質なゲル体が得られ、さらにこのゲル体から良質なシ
リカガラス体が得られる。As explained above, by the method for producing silica glass of the present invention, a homogeneous gel body can be easily obtained using alkoxyl silicon as a raw material, and a high-quality silica glass body can be obtained from this gel body.
またこの良質なシリカガラス体およびドープトシリカガ
ラス体を素材として、高品質な光ファイバが得られる。Furthermore, high-quality optical fibers can be obtained using the high-quality silica glass body and doped silica glass body as raw materials.
しかも本発明では、第1図に示した反応容器を大型化し
、大量のシリカガラス体を一度に製造することは容易で
あり、本発明の実施によって安価な光ファイバを提供で
きる利点がある。Moreover, according to the present invention, it is easy to increase the size of the reaction vessel shown in FIG. 1 and manufacture a large amount of silica glass bodies at once, and the present invention has the advantage that an inexpensive optical fiber can be provided by implementing the present invention.
第1図は本発明の一実施例図、第2図は混合液のゲル化
領域を示す図である。
■・・・反応容器、2・・・アルコキシルシリコン、ア
ルコールおよび水の混合液、3・・・発泡管、4・・・
配管、5・・・サチュレータ、6・・・アンモニア水。
特許出願人 日本電信電話公社FIG. 1 is a diagram showing an embodiment of the present invention, and FIG. 2 is a diagram showing a gelation region of a mixed liquid. ■... Reaction container, 2... Mixed solution of alkoxyl silicone, alcohol and water, 3... Foaming tube, 4...
Piping, 5...Saturator, 6...Ammonia water. Patent applicant Nippon Telegraph and Telephone Corporation
Claims (1)
製造するに際して、該アルコキシルシリコンをあらかじ
め水と混合した後に、この混合溶液をアンモニアを含む
ガス体に曝し、固化せしめ、さらに乾燥、焼結してシリ
カガラス体を得ることを特徴とするシリカガラスの製造
方法。 λ 特許請求の範囲第1項記載のシリカガラスの製造方
法において、該アルコキシルシリコン原料中に、他の金
属アルコキシル化合物を含むことを特徴とするシリカガ
ラスの製造方法。[Claims] 1. When producing silica glass using alkoxyl silicon as a raw material, the alkoxyl silicon is mixed with water in advance, and then this mixed solution is exposed to a gaseous body containing ammonia to solidify, and then dried and sintered. A method for producing silica glass, the method comprising: obtaining a silica glass body. λ The method for producing silica glass according to claim 1, characterized in that the alkoxyl silicon raw material contains another metal alkoxyl compound.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17446382A JPS6035295B2 (en) | 1982-10-06 | 1982-10-06 | Silica glass manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17446382A JPS6035295B2 (en) | 1982-10-06 | 1982-10-06 | Silica glass manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5964542A true JPS5964542A (en) | 1984-04-12 |
| JPS6035295B2 JPS6035295B2 (en) | 1985-08-14 |
Family
ID=15978921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17446382A Expired JPS6035295B2 (en) | 1982-10-06 | 1982-10-06 | Silica glass manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6035295B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4806329A (en) * | 1985-09-09 | 1989-02-21 | Tama Chemicals Co., Ltd. | Method of producing granular synthetic silica |
-
1982
- 1982-10-06 JP JP17446382A patent/JPS6035295B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4806329A (en) * | 1985-09-09 | 1989-02-21 | Tama Chemicals Co., Ltd. | Method of producing granular synthetic silica |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6035295B2 (en) | 1985-08-14 |
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