JPS6041981B2 - Processing liquid circulation mechanism of connected chemical processing equipment - Google Patents
Processing liquid circulation mechanism of connected chemical processing equipmentInfo
- Publication number
- JPS6041981B2 JPS6041981B2 JP15053977A JP15053977A JPS6041981B2 JP S6041981 B2 JPS6041981 B2 JP S6041981B2 JP 15053977 A JP15053977 A JP 15053977A JP 15053977 A JP15053977 A JP 15053977A JP S6041981 B2 JPS6041981 B2 JP S6041981B2
- Authority
- JP
- Japan
- Prior art keywords
- processing liquid
- processing
- chemical processing
- chemical
- equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- ing And Chemical Polishing (AREA)
Description
【発明の詳細な説明】 本発明は、化学処理装置に関するものである。[Detailed description of the invention] The present invention relates to chemical processing equipment.
従来の各種メッキの前処理や後処理、各種金属のエッチ
ングその他化学処理に用いられる化学処理装置は、通常
第１図に示すごとく、化学処理装置１の処理液貯槽にた
くわえられた化学処理液２が、スプレーポンプ３により
吸いこまれスプレーノズル５からはきだされることによ
つて被処理物と接触し処理する機構てある、この化学処
理装置１を単独て使用する場合は、これでよいが、処理
時間を短くして作業能率を向上する目的てしはしば２台
以上連結して使用される。特に最近化学処理装置がユニ
ット化される傾向にあり、連続化学システムを構成する
場合、ユニット化される各々の化学処理装置を２台以上
連結して使用する機会が多くなつている。この場合、連
結パイプ５で各化学処理装置の処理液貯槽が連結される
が、これだけでは、化学処理液２の攪拌が不充分で化学
処理装置別に化学処理液２の劣化度が異なり、化学処理
液２の管理が困難になる。したがつて、細い管理を必要
とする化学処理を行なうことができない問題があつた。
この問題を解決するために、従来、第２図に示すごとく
、新らたに循環ポンプ及び配管を設ける必要があつた。
本発明の目的とするところは、上記のごとき問題点を除
去することであり、２台以上の化学処理装置を連結して
使用する場合において、循環ポンプ８を設けることなし
に、化学処理液２の攪拌が充分行なえるという効果を有
する化学処理装置を提供することである。Conventional chemical processing equipment used for various plating pre-treatments, post-treatments, etching of various metals, and other chemical treatments is usually as shown in Fig. However, when using this chemical processing apparatus 1 alone, which has a mechanism for contacting and treating the object by being sucked in by the spray pump 3 and ejected from the spray nozzle 5, this is fine. Two or more units are often connected to shorten processing time and improve work efficiency. In particular, recently there has been a tendency for chemical processing equipment to be unitized, and when configuring a continuous chemical system, there are many occasions where two or more of each unitized chemical processing equipment are connected and used. In this case, the processing liquid storage tanks of each chemical processing equipment are connected by the connecting pipe 5, but with this alone, the chemical processing liquid 2 is not sufficiently stirred and the degree of deterioration of the chemical processing liquid 2 differs depending on the chemical processing equipment. It becomes difficult to manage liquid 2. Therefore, there was a problem in that it was not possible to carry out chemical treatments that required careful management.
In order to solve this problem, it has conventionally been necessary to newly install a circulation pump and piping as shown in FIG.
An object of the present invention is to eliminate the above-mentioned problems, and when two or more chemical processing apparatuses are connected and used, the chemical processing liquid 2 It is an object of the present invention to provide a chemical processing apparatus which has the effect of sufficiently stirring the .
本発明の特徴とするところは、従来の２台以上連結され
た化学処理装置に、スプレーされた化学処理液２の受皿
９を設け、液面の高さの差により受皿９の化学処理液２
が循環配管１０をへて連結されている化学処理装置に送
られることである。A feature of the present invention is that a receiving tray 9 for the sprayed chemical processing liquid 2 is provided in a conventional chemical processing apparatus in which two or more units are connected.
is sent through the circulation pipe 10 to the connected chemical processing equipment.
本発明の実施例を図を用いて説明する。連結された化学
処理装置内にスプレーされた化学処理液・２を受ける受
皿９を化学処理液液面より高くなるようにして設け、そ
こから連結した他の化学処理装置へ連結パイプを通して
配管する。このようにすることにより、液面の高さの差
により処理液受皿９から連結した化学処理装置へ化学処
理液が送・られ、それと同量の化学処理液が連結パイプ
を通してもどつてくる。以上の構成にすることにより、
連結した化学処理装置間の化学処理液の循環が充分行な
われ化学処理液が均一化し液管理が容易になる。Embodiments of the present invention will be described with reference to the drawings. A saucer 9 for receiving the chemical treatment liquid 2 sprayed in the connected chemical treatment equipment is provided so as to be higher than the liquid level of the chemical treatment liquid, and a connecting pipe is connected from there to the other connected chemical treatment equipment. By doing this, the chemical processing liquid is sent from the processing liquid receiving tray 9 to the connected chemical processing device due to the difference in the height of the liquid level, and the same amount of the chemical processing liquid is returned through the connecting pipe. By configuring the above,
The chemical processing liquid is sufficiently circulated between the connected chemical processing apparatuses, making the chemical processing liquid uniform and facilitating liquid management.
加えて、スプレーポンプを循環ポンプとして、兼用する
ため循環ポンプが不要であり、配管も全て化学処理装置
内で行なうため、コンパクトで液もれ等の心配がない。In addition, since the spray pump also serves as a circulation pump, there is no need for a circulation pump, and all piping is done within the chemical processing equipment, so it is compact and there is no need to worry about liquid leaks.
第１図は化学処理装置を単独で使う楊合の装置断面図、
第２図は、化学処理装置を２台連結して使用する場合の
従来例の断面図、第３図は本発明の２台連続した化学処
理装置断面図である。
１・・・・・・化学処理装置、２・・・・・・化学処理
液、３・・・・・・スプレーポンプ、４・・・・・・処
理液吸入口、５・・・・・スプレーノズル、６・・・・
・・連結バイブ、７・・・・・・循環配管、８・・・・
・・循環ポンプ、９・・・・・・処理液受皿、１０・・
・・・・循環配管。Figure 1 is a cross-sectional view of Yanghe's equipment, which uses a chemical treatment equipment alone.
FIG. 2 is a cross-sectional view of a conventional example in which two chemical treatment apparatuses are connected and used, and FIG. 3 is a cross-sectional view of two consecutive chemical treatment apparatuses of the present invention. 1... Chemical processing device, 2... Chemical processing liquid, 3... Spray pump, 4... Processing liquid inlet, 5... Spray nozzle, 6...
...Connection vibrator, 7...Circulation piping, 8...
...Circulation pump, 9...Processing liquid receiver, 10...
...Circulation piping.
Claims (1)
処理装置において、一方の処理装置のスプレー室内に設
けた処理液の受皿と、この受皿で受けた処理液を他方の
処理装置の処理液貯槽に移送するための配管と、移送さ
れる処理液量に見合う処理液をもとの処理装置の処理液
貯槽に逆移送するための配管より構成され、装置運転中
に両装置内の処理液を連続的に循環させることを特徴と
する化学処理装置の処理液循環機構。1 In two or more connected spray-type continuous chemical processing devices, there is a processing liquid receiving tray provided in the spray chamber of one processing device, and the processing liquid received in this receiving tray is transferred to the processing liquid storage tank of the other processing device. It consists of piping for transferring the processing liquid to the storage tank of the original processing equipment, and piping for transferring the processing liquid corresponding to the amount of processing liquid transferred back to the processing liquid storage tank of the original processing equipment. A processing liquid circulation mechanism for chemical processing equipment characterized by continuous circulation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15053977A JPS6041981B2 (en) | 1977-12-16 | 1977-12-16 | Processing liquid circulation mechanism of connected chemical processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15053977A JPS6041981B2 (en) | 1977-12-16 | 1977-12-16 | Processing liquid circulation mechanism of connected chemical processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5483681A JPS5483681A (en) | 1979-07-03 |
| JPS6041981B2 true JPS6041981B2 (en) | 1985-09-19 |
Family
ID=15499070
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15053977A Expired JPS6041981B2 (en) | 1977-12-16 | 1977-12-16 | Processing liquid circulation mechanism of connected chemical processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6041981B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6440891U (en) * | 1987-09-05 | 1989-03-10 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5876135A (en) * | 1981-11-02 | 1983-05-09 | Hitachi Ltd | Mechanism for supplying chemical liquid |
-
1977
- 1977-12-16 JP JP15053977A patent/JPS6041981B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6440891U (en) * | 1987-09-05 | 1989-03-10 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5483681A (en) | 1979-07-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1411026A (en) | Methods and systems for delivery of high melting point oils and other liquids from a tank | |
| EP1197269A3 (en) | Microbiological parts washer | |
| CA2242916A1 (en) | Continuous high pressure solids pump system | |
| JPS6041981B2 (en) | Processing liquid circulation mechanism of connected chemical processing equipment | |
| CA2288715A1 (en) | Card processor for use in fuel dispensing equipment | |
| JPS52146451A (en) | Dipping apparatus | |
| JPH0212480U (en) | ||
| KR100337259B1 (en) | Method and apparatus for removing photoresist from glass substrate of liquid crystal display | |
| JPH07185416A (en) | Paint pipe cleaning equipment | |
| JPH06168928A (en) | Wafer cleaning device and cleaning of wafer | |
| JPS5628671A (en) | Method and apparatus for paint circulation at flow coater apparatus | |
| JPH05304131A (en) | Chemical processing system for semiconductor substrate | |
| JPS5827000U (en) | Aerobic biological treatment equipment | |
| JPS63263728A (en) | Semiconductor substrate cleaning equipment | |
| GB2130879A (en) | Portable lavage device | |
| JP2002514828A (en) | Wet treatment method for manufacturing electronic components | |
| JPS5322611A (en) | Controlling system for oil surface in pressureaccumul ating tank | |
| JPS63184337A (en) | Wet etching device | |
| JPS56152970A (en) | Etching device | |
| JPS61264633A (en) | Panel inner face cleaning device | |
| JPS54103266A (en) | Ultrasonic cleaner | |
| JPS5754263A (en) | Dispersing apparatus of fine particle additive | |
| JPS61124588A (en) | Spray type etching device | |
| KR200360459Y1 (en) | Chemical bath | |
| JPS5877044U (en) | Thin film peeling device |