JPS6044827B2 - electronic components - Google Patents

electronic components

Info

Publication number
JPS6044827B2
JPS6044827B2 JP52114581A JP11458177A JPS6044827B2 JP S6044827 B2 JPS6044827 B2 JP S6044827B2 JP 52114581 A JP52114581 A JP 52114581A JP 11458177 A JP11458177 A JP 11458177A JP S6044827 B2 JPS6044827 B2 JP S6044827B2
Authority
JP
Japan
Prior art keywords
film
copper foil
resin
electronic components
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52114581A
Other languages
Japanese (ja)
Other versions
JPS5448166A (en
Inventor
嘉雄 足達
健二 中村
齊 岡
弘明 奥平
徹 川野辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP52114581A priority Critical patent/JPS6044827B2/en
Publication of JPS5448166A publication Critical patent/JPS5448166A/en
Publication of JPS6044827B2 publication Critical patent/JPS6044827B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/701Tape-automated bond [TAB] connectors

Landscapes

  • Casings For Electric Apparatus (AREA)
  • Wire Bonding (AREA)

Description

【発明の詳細な説明】 本発明は、テープキャリア方式でしかも樹脂封止され
た半導体素子等の電子部品に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electronic component such as a semiconductor element that uses a tape carrier method and is sealed with resin.

一般に、電子部品特にICの製造においては、製造原
価の大きな部分がボンディング、組立プロセスで占めら
れており、このプロセスの改善、自動化のために種々の
ボンディング、組立プロセスが考えられてきた。
Generally, in the manufacture of electronic components, especially ICs, a large portion of the manufacturing cost is accounted for by bonding and assembly processes, and various bonding and assembly processes have been considered to improve and automate this process.

それらは、従来のワイヤボンドに対しワイヤレ方式は
、ワイヤレスボンディングの一方式であつて、これは金
属ワイヤの代りにビーム状のパターンのついた銅箔(フ
ィンガーリード)を使つてICチップ上のパッド電極部
と外部リードとの間を接続させるもので、ボンディング
速度が従来に比較してきわめて大きく、組立自動化が可
能となり、したがつてIC製造のコストを安くすること
ができる特徴がある。
In contrast to conventional wire bonding, wireless bonding is a method of wireless bonding that uses copper foil with a beam-like pattern (finger leads) instead of metal wires to pad the pads on the IC chip. It connects the electrode part and the external lead, and has a feature that the bonding speed is extremely high compared to the conventional method, and assembly automation is possible, thereby reducing the cost of IC manufacturing.

し力士ながら、従来のテープキャリア方式のICは、
第1図に平面図、第2図にその一部拡大最矢視縦断面図
を示すように、ポリイミド(樹脂)フィルム1にラミネ
ートされた面側のフィンガーリード(銅箔2を基材とし
、その表面に錫めつき膜3を設けたもの)表面にICチ
ップ4におけるパッド電極5を1回で同時各点接合し、
それらを樹脂6によつて封止したものである。
Although he is a sumo wrestler, the conventional tape carrier type IC is
As shown in FIG. 1 as a plan view and as shown in FIG. 2 as a partially enlarged vertical cross-sectional view, the surface side finger leads laminated to polyimide (resin) film 1 (using copper foil 2 as a base material) The pad electrodes 5 of the IC chip 4 are bonded to each point simultaneously at one time on the surface (with a tinned film 3 provided on the surface),
These are sealed with resin 6.

なお、7は、ソルダーレジストあるいは配線保護用オー
バーレイフィルムで、ポリイミドフィルム1、フィンガ
ーリード2〜3の折り曲げ強度を保つためのものである
。そして、この種のものが外部電子部品(たとえば時計
用モジユールに使用され、ゼブラコネクタを介したLC
D等)に接続される場合には、オーミツクコンタクト性
を良くするために、露出せるフインガーリード2に金め
つき層8が施されている。そのため、この種の金めつき
層8は、フインガーリード2の銅箔表面に直接フラツシ
ユ金めつきを行なつて形成したものであるため、金めつ
き層8の耐熱性や表面接触抵抗の信頼性が悪い欠点があ
る。
Note that 7 is a solder resist or an overlay film for protecting wiring, which is used to maintain the bending strength of the polyimide film 1 and the finger leads 2 and 3. And this kind of thing is used in external electronic components (e.g. watch module, LC via zebra connector)
D, etc.), the exposed finger leads 2 are coated with a gold plating layer 8 in order to improve ohmic contact. Therefore, this type of gold plating layer 8 is formed by flash gold plating directly on the copper foil surface of the finger lead 2, so the heat resistance and surface contact resistance of the gold plating layer 8 are low. It has the drawback of poor reliability.

これは、銅箔2の上に直接金めつきを施したものであり
、CU−AU2重層が合金を作りやすいためであると考
えられる。そこで、本発明は、上述する従来の諸欠点を
解消することを目的とするもので、耐熱性およびオーミ
ツクコンタクト性にすぐれたテープキヤリア方式の電子
部品を提供することにある。
This is thought to be because gold plating is applied directly onto the copper foil 2, and the CU-AU double layer makes it easy to form an alloy. SUMMARY OF THE INVENTION An object of the present invention is to overcome the above-mentioned conventional drawbacks, and to provide a tape carrier type electronic component with excellent heat resistance and ohmic contact properties.

以下、本発明の好適な実施例を用いて本発明を具体的に
詳述する。
Hereinafter, the present invention will be specifically described in detail using preferred embodiments of the present invention.

第3図〜第4図は、本発明の一実施例であるICを示す
図で、第3図は平面図、第4図は第3図の一部拡大品矢
視縦断面図てある。
3 and 4 are diagrams showing an IC that is an embodiment of the present invention, with FIG. 3 being a plan view and FIG. 4 being a partially enlarged vertical cross-sectional view taken in the direction of the arrows in FIG. 3.

同図に示すように、本発明にかかるICは、ポリイミド
フイルム1にラミネートされた面側のフインガーリード
(銅箔2を基材とし、その表面に錫めつき膜3を設けた
もの)表面にICチツプ4におけるパツド電極5を1回
で同時多点接合し、それらを樹脂6によつて封止したも
のである。
As shown in the figure, the IC according to the present invention has a finger lead (copper foil 2 as a base material and a tinned film 3 provided on the surface) surface side laminated on a polyimide film 1. The pad electrodes 5 of the IC chip 4 are bonded at multiple points simultaneously at one time, and then they are sealed with a resin 6.

7は、ソルダーレジストあるいは配線保護用オーバレイ
フイルムで、ポリイミドフイルム1、フインガーリード
2〜3の折り曲げ強度を保つためのものである。
7 is a solder resist or an overlay film for protecting wiring, which is used to maintain the bending strength of the polyimide film 1 and the finger leads 2 and 3.

そして、本発明にかかるフインガーリード2〜3におけ
る外部電子部品と接続される部分は、フインガーリード
2〜3における錫めつき膜3が取り除かれており、基材
である銅箔2表面にニツケルめつき膜9を設けたのち、
その表面に金めつき層10が設けられておるものである
The tinned film 3 of the finger leads 2 to 3 is removed from the portions of the finger leads 2 to 3 according to the present invention that are connected to external electronic components, and the surface of the copper foil 2 that is the base material is After providing the nickel plating film 9,
A gold plating layer 10 is provided on its surface.

上述したように、本発明にかかるテープキヤリア方式の
ICは、外部電子部品と接続されるフインガーリードが
、銅箔2を基材とし、その表面にニツケルめつき膜9と
金めつき層10との二重層膜を設けたものであることに
特徴がある。
As described above, in the tape carrier type IC according to the present invention, the finger leads connected to external electronic components are made of copper foil 2 as a base material, and have a nickel plating film 9 and a gold plating layer 10 on the surface thereof. It is characterized by having a double layer membrane.

この種のフインガーリード部は、耐熱性およびオーミツ
クコンタクト性のすぐれたものであり、Cu−Ni一A
uの3重層構造は耐熱構造でかつ各層間の接着強度の強
いものでオーミツクコンタクト性や表面接触抵抗の極め
て小さなものである。この種フインガーリード部として
は、銅箔を基材とし、その表面の錫めつき膜をはくりし
た状態で、厚膜の錫めつき膜を施こしたもの、はんだめ
つき膜あるいは銀めつき膜等を設けたものであつても、
耐熱性およびオーミツクコンタクト性にすぐれた構造の
ものとすることができる。
This type of finger lead part has excellent heat resistance and ohmic contact properties, and is made of Cu-Ni-A.
The three-layer structure of U is a heat-resistant structure with strong adhesive strength between each layer, and has extremely low ohmic contact properties and surface contact resistance. This type of finger lead part is made of copper foil as a base material, with the tin plating film on the surface removed and a thick tin plating film applied, a solder plating film, or a silver plated film. Even if it has a plating film etc.
It can have a structure with excellent heat resistance and ohmic contact properties.

この種テープキヤリア方式のICの製作にあたつては、
従来と同じくICチツプ4をテープキヤリアにボンドし
たのち樹脂封止を行ない、その後、封止樹脂6とソルダ
ーレジストあるいは配線保護用オーバレイフイルム7を
マスクとして、表面が露出するフインガーリード部にお
ける錫めつ”き膜3をエツチング除去したのち、ニツケ
ルめつきと金めつき(無電解めつき法あるいは電解めつ
き法)を順次行なつて製作することができる。
When manufacturing this kind of tape carrier type IC,
As in the conventional case, the IC chip 4 is bonded to the tape carrier and then resin-sealed. Then, using the sealing resin 6 and solder resist or overlay film 7 for wiring protection as a mask, tin is applied to the finger leads where the surface is exposed. After removing the coating film 3 by etching, it can be manufactured by sequentially performing nickel plating and gold plating (electroless plating method or electrolytic plating method).

なお、金めつきを電解めつき法にて行なう際には、各フ
インガーリードを相互接続して行なう必要があるが、無
電解めつき法に比して厚膜の金めつき層10を形成する
ことができる。
Note that when gold plating is performed by electrolytic plating, it is necessary to interconnect each finger lead, but compared to electroless plating, it is necessary to form a thick gold plating layer 10. can be formed.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のテープキヤリア方式のICを示す平面図
、第2図は第1図の一部拡大AA矢視縦・断面図、第3
図は本発明の一実施例であるテープキヤリア方式のIC
を示す平面図、第4図は第3図の一部拡大品矢視縦断面
図である。 1・・・・・ポリイミド(樹脂)フイルム、2・・・・
・・フインガーリードの基材である銅箔、3・・・・・
・錫めつき膜、4・・・・・・ICチツプ、5・・・・
・・パツド電極、6・・・・封止樹脂、7・・・・・・
ソルダーレジストあるいは配線保護用オーバレイフイル
ム、8・・・・・・金めつき層、9・・・・・ニツケル
めつき膜、10・・・・・・金めつき層。
Fig. 1 is a plan view showing a conventional tape carrier type IC, Fig. 2 is a partially enlarged longitudinal/sectional view taken along arrow AA in Fig. 1, and Fig.
The figure shows a tape carrier type IC that is an embodiment of the present invention.
FIG. 4 is a partially enlarged vertical sectional view taken in the direction of arrows in FIG. 3. 1...Polyimide (resin) film, 2...
...Copper foil, which is the base material of finger leads, 3...
・Tin plating film, 4...IC chip, 5...
...Pad electrode, 6...Sealing resin, 7...
Solder resist or overlay film for wiring protection, 8...Gold plating layer, 9...Nickel plating film, 10...Gold plating layer.

Claims (1)

【特許請求の範囲】[Claims] 1 テープキャリアのリードである銅箔を基材とし、そ
の表面に錫薄膜をもつ個所にて素子チップのパッド電極
が接続されており、それが樹脂封止されてなり、前記樹
脂から露出され、外部電気導体が接続される個所である
前記リードの部分は、銅箔を基材とし、その表面にニッ
ケル薄膜の下層と金薄膜の上層との二重層膜が設けられ
ていることを特徴とする電子部品。
1. The copper foil that is the lead of the tape carrier is used as a base material, and the pad electrode of the element chip is connected at a place with a thin tin film on the surface, which is sealed with a resin and exposed from the resin, The portion of the lead to which the external electrical conductor is connected is made of copper foil as a base material, and the surface thereof is provided with a double-layer film consisting of a lower layer of a thin nickel film and an upper layer of a thin gold film. electronic components.
JP52114581A 1977-09-26 1977-09-26 electronic components Expired JPS6044827B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52114581A JPS6044827B2 (en) 1977-09-26 1977-09-26 electronic components

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52114581A JPS6044827B2 (en) 1977-09-26 1977-09-26 electronic components

Publications (2)

Publication Number Publication Date
JPS5448166A JPS5448166A (en) 1979-04-16
JPS6044827B2 true JPS6044827B2 (en) 1985-10-05

Family

ID=14641417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52114581A Expired JPS6044827B2 (en) 1977-09-26 1977-09-26 electronic components

Country Status (1)

Country Link
JP (1) JPS6044827B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6329722B1 (en) * 1999-07-01 2001-12-11 Texas Instruments Incorporated Bonding pads for integrated circuits having copper interconnect metallization

Also Published As

Publication number Publication date
JPS5448166A (en) 1979-04-16

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