JPS6081048A - Glass having thin titanium nitride film and its manufacture - Google Patents
Glass having thin titanium nitride film and its manufactureInfo
- Publication number
- JPS6081048A JPS6081048A JP18812583A JP18812583A JPS6081048A JP S6081048 A JPS6081048 A JP S6081048A JP 18812583 A JP18812583 A JP 18812583A JP 18812583 A JP18812583 A JP 18812583A JP S6081048 A JPS6081048 A JP S6081048A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- titanium nitride
- titanium
- sputtering
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔技術分野〕
本発明は窒化チタン薄膜付きガラスおよびその作製方法
に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a glass with a titanium nitride thin film and a method for producing the same.
本発明の窒化チタン薄膜付きガラスは、ガラスを基体と
した装飾物、例えば自動車の窓ガラスに設ける装飾マー
ク等に用いることができる。The glass with a titanium nitride thin film of the present invention can be used for decorations based on glass, such as decorative marks provided on automobile window glasses.
窒化チタン（Ｔ ｉ Ｎ）は高い高度を有し、光沢のあ
る黄金色を呈し、また比較的電気抵抗が低い等の特性を
具えている。このため、従来は、前記特性を利用して、
鋼等の金属表面に被覆することで、超硬材料、装飾物等
に用いられている。Titanium nitride (T i N) has properties such as high purity, shiny golden color, and relatively low electrical resistance. For this reason, conventionally, using the above characteristics,
By coating the surface of metals such as steel, it is used in carbide materials, decorations, etc.
ところで、窒化チタンは金属であるチタン原子のマトリ
ックス中に窒素原子が侵入した侵入型化合物であり、こ
のため、金属と窒化チタンの密着性は比較的良好である
。Incidentally, titanium nitride is an interstitial compound in which nitrogen atoms have entered a matrix of metal titanium atoms, and therefore the adhesion between the metal and titanium nitride is relatively good.
しかしながら、窒化チタンはガラスとの密着性が十分で
なく、耐久性が要求される部位、例えば自動車の窓ガラ
スの表面に適用するには問題があった。このため、窒化
チタンの優れた特性が、金属基材に対してしか利用でき
ず、ガラスに適用しにくいため、窒化チタンの利用分野
を狭くしていた。However, titanium nitride does not have sufficient adhesion to glass, and there is a problem in applying it to areas where durability is required, such as the surface of an automobile window glass. For this reason, the excellent properties of titanium nitride can only be used for metal substrates and are difficult to apply to glass, which has narrowed the field of application of titanium nitride.
本発明は、上記従来技術の問題を解決するためになされ
たもので、密着性が良好な窒化チタン薄膜付きガラスお
よびその作製方法を提供することを目的とする。The present invention was made to solve the problems of the prior art described above, and an object of the present invention is to provide a glass with a titanium nitride thin film having good adhesion and a method for producing the same.
かかる目的は、本発明によれば、ガラスと、このガラス
の表面に順次形成された酸化チタン（Ｔｉ Ｏ２）層と
、酸化チタンと窒化チタン（Ｔ ｉ Ｎ）の馴染み層と
、窒化チタン層とからなる窒化チタン薄膜付きガラスに
よって達成される。−゛（第１の発明）
また、かかる目的は、本発明によれば、チタン（Ｔｉ）
と酸素（０２）と窒素（Ｎ２）による反応性スパッタリ
ングを用いた窒化チタン薄膜付きガラスの作製方法であ
って、
まずスパッタリング装置内において、陰極側にチタンを
、陽極側にガラスを設置し、続いて、酸素を導入してチ
タンとの反応性スパッタリングによりガラス上に酸化チ
タン層を所定の厚さに設りた後、窒素をスパッタリング
装置内に徐々に導入し、酸素との置換をはかりながら反
応性スパッタリングを行うことにより酸化チタンと窒化
チタンの馴染み層を設け、次いで酸素が０になった状態
で、窒素とチタンの反応性スパッタリングで窒化チタン
層を形成することを特徴とする窒化チタン薄膜付きガラ
スの作製方法によって達成される。This purpose, according to the present invention, consists of a glass, a titanium oxide (TiO2) layer formed sequentially on the surface of the glass, a conforming layer of titanium oxide and titanium nitride (T i N), and a titanium nitride layer. This is achieved by glass with a titanium nitride thin film made of. -゛(First invention) Also, according to the present invention, this object is achieved by using titanium (Ti).
A method for producing glass with a titanium nitride thin film using reactive sputtering with oxygen (02) and nitrogen (N2), in which titanium is first placed on the cathode side and glass on the anode side in a sputtering apparatus, and then After introducing oxygen and forming a titanium oxide layer on glass to a predetermined thickness by reactive sputtering with titanium, nitrogen is gradually introduced into the sputtering equipment and reacts while replacing it with oxygen. A titanium nitride thin film characterized by forming a compatible layer of titanium oxide and titanium nitride by reactive sputtering, and then forming a titanium nitride layer by reactive sputtering of nitrogen and titanium in a state where oxygen is 0. This is achieved by a method of making glass.
−一〜−−（第２の発明）
更に、かかる目的は、本発明によれば、酸化チタンと窒
化チタンの２元スパッタリングを用いた窒化チタン薄膜
付きガラスの作製方法であって、初めにスパッタリング
装置内において、第１の陰極側に酸化チタンを、第２の
陰極側に窒化チタンを、陽極側にガラスを設置し、まず
酸化チタンを一定量スバッタリングした後、酸化チタン
のスパッタリング投入出力を徐々に下げると同時に、窒
化チタンを参入させて、窒化チタンの投入出力を徐々に
上げ、同時スパツタリングにより酸化チタンと窒化チタ
ンの馴染み屓を設け、最後に酸化チタンの投入を止め、
窒化チタンのみのスパツタリングを行い窒化チタン層を
形成することを特徴とする窒化チタン薄膜付きガラスの
作製方法によって達成される。−一一一・＝（第３の発
明）なお、上記第１の発明が特定発明であり、第２の発
明および第３の発明は、共に第１の発明に対し特許法第
３７条但書第２号の関係にある。-1 to -- (Second Invention) Further, the object of the present invention is to provide a method for producing a glass with a titanium nitride thin film using binary sputtering of titanium oxide and titanium nitride, the method comprising first sputtering. In the device, titanium oxide is installed on the first cathode side, titanium nitride on the second cathode side, and glass on the anode side, and after sputtering a certain amount of titanium oxide, the sputtering input output of titanium oxide is At the same time as titanium nitride was gradually lowered, titanium nitride was introduced, the input output of titanium nitride was gradually increased, and the titanium oxide and titanium nitride became familiar by simultaneous sputtering, and finally the input of titanium oxide was stopped.
This is achieved by a method for producing glass with a titanium nitride thin film, which is characterized in that a titanium nitride layer is formed by sputtering only titanium nitride. -111 = (Third invention) The first invention above is a specified invention, and the second invention and the third invention both meet the proviso of Article 37 of the Patent Act with respect to the first invention. It is related to No. 2.
第１の発明によれば、イオン結合の寄与の大きいガラス
の表面に、同じくイオン結合性の高い酸化チタン（Ｔｉ
０２）が設けられているため、両者の密着性はよい。ま
た、酸化チタン層の上に、酸化チタンと共有結合性の高
い窒化チタンとからなる馴染み層が設けられているため
、酸化チタンと馴染み眉の密着性もよい。更に、その上
に窒化チタンが設けられているが、馴染み層に窒化チタ
ンが含まれているため、窒化チタンと馴染み層の密着性
もよい。従って、第１の発明に係る窒化チタン薄膜付き
ガラスによれば、ガラスから窒化チタンに至るまでが、
イオン結合から共有結合へと連続的に変化するようにな
るため、ガラス上に窒化チタン層を直接設ける場合に比
べ、窒化チタンの密着性が大幅に向上する。According to the first invention, titanium oxide (Ti), which also has high ionic bonding properties, is added to the surface of the glass, which has a large contribution to ionic bonding.
02), the adhesion between the two is good. Furthermore, since a conforming layer made of titanium oxide and titanium nitride, which has a high covalent bond, is provided on the titanium oxide layer, the adhesion between the titanium oxide and the conforming eyebrows is good. Further, titanium nitride is provided thereon, and since the conforming layer contains titanium nitride, the adhesion between the titanium nitride and the conforming layer is good. Therefore, according to the glass with a titanium nitride thin film according to the first invention, from the glass to the titanium nitride,
Since the ionic bond changes continuously to the covalent bond, the adhesion of the titanium nitride is greatly improved compared to the case where the titanium nitride layer is directly provided on the glass.
第２の発明によれば、ガラス上に酸化チタン層を形成し
た後、酸素と窒素の割合を徐々に窒素が多くなるように
変化させることにより、酸化チタンから窒化チタンへと
変わる極めて連続的な馴染み層が形成される。According to the second invention, after forming a titanium oxide layer on glass, by gradually changing the ratio of oxygen and nitrogen so that the amount of nitrogen increases, titanium oxide is transformed into titanium nitride in an extremely continuous manner. A familiarization layer is formed.
第３の発明によれば、ガラス上に酸化チタン層を形成し
た後、酸化チタンと窒化チタンの割合を、徐々に窒化チ
タンが多くなるように変化させることにより、酸化チタ
ンから窒化チタンへと変わる極めて連続的な馴染み層が
形成される。According to the third invention, after forming a titanium oxide layer on glass, the ratio of titanium oxide and titanium nitride is gradually changed so that titanium nitride increases, thereby changing from titanium oxide to titanium nitride. A very continuous run-in layer is formed.
以上より、本発明によれば、以下の効果を奏する。 As described above, according to the present invention, the following effects are achieved.
（イ）窒化チタン薄膜とガラスとの密着性が極めて良い
。このため、耐久性が必要な部位にも使用でき、通用範
囲が大幅に広がる。(a) Extremely good adhesion between the titanium nitride thin film and glass. Therefore, it can be used in areas that require durability, greatly expanding its range of applications.
（ロ）従来公知のスパッタリング装置をそのまま用いる
ことができるため、極めて容易に実施ができる。(b) Since a conventionally known sputtering apparatus can be used as is, implementation is extremely easy.
以下、本発明の詳細な説明する。 The present invention will be explained in detail below.
（第１実施例）
反応性スパンクリングにより窒化チタン薄膜付きガラス
を作製した。(First Example) Glass with a titanium nitride thin film was produced by reactive spanking.
まず、ガラスを所定の形状に切断し、十分に洗浄、乾燥
した後、スパッタリング装置内の陽極側にこのガラスを
設置した。同時に、陰極側にチタンを設置した。続いて
、スパッタリング装置内を２ Ｘ １０−５ｔｏｒｒの
真空度とした後、アルゴンガスを導入しＩ Ｘ Ｌ Ｏ
’−” ｔｏｒｒとした。この状態で、酸素を導入し、
３ｋＶのスパッタ電圧をかけた。一定時間経過後、酸素
の導入を止め、抽気を続けて所定圧に保ちながら、窒素
を徐々に導入し、酸素と順次置換した。完全に窒素に置
換した後、一定時間反応性スパッタリングを継続した。First, glass was cut into a predetermined shape, thoroughly washed and dried, and then the glass was placed on the anode side of a sputtering device. At the same time, titanium was placed on the cathode side. Subsequently, after setting the inside of the sputtering apparatus to a vacuum level of 2 X 10-5 torr, argon gas was introduced and I X L O
'-' torr.In this state, oxygen was introduced,
A sputtering voltage of 3 kV was applied. After a certain period of time had passed, the introduction of oxygen was stopped, and nitrogen was gradually introduced while continuing to bleed air to maintain a predetermined pressure to sequentially replace oxygen. After the atmosphere was completely replaced with nitrogen, reactive sputtering was continued for a certain period of time.
この結果、図にその概要を示す窒化チタン薄膜付きガラ
スが作製された。図は、本発明の第１実施例に係る窒化
チタン薄膜付きガラスの断面図である。図において、１
はガラスであり、このガラス１の上に酸化チタン層２、
酸化チタンと窒化チタンの馴染み層３、窒化チタン層４
がこの順に積層されている。ここで、酸化チタン層２、
馴染み層３、窒化チタン屓４の膜厚は、それぞれ８００
人、１２００人、１０００人であった。As a result, a glass with a titanium nitride thin film, the outline of which is shown in the figure, was produced. The figure is a sectional view of a glass with a titanium nitride thin film according to a first embodiment of the present invention. In the figure, 1
is glass, and on top of this glass 1 there is a titanium oxide layer 2,
Familiar layer 3 of titanium oxide and titanium nitride, titanium nitride layer 4
are stacked in this order. Here, titanium oxide layer 2,
The film thickness of the conforming layer 3 and the titanium nitride layer 4 is 800 mm each.
There were 1,200 and 1,000 people.
この窒化チタン薄膜付きガラスの密着性を調べたところ
、本実施例の窒化チタン薄膜付きガラスは、ガラス上に
直接窒化チタン層を設ける従来のものに比べ、約３倍密
着性が向上しているのが確かめられた。When the adhesion of this glass with a titanium nitride thin film was investigated, it was found that the adhesion of the glass with a titanium nitride thin film of this example was improved by about 3 times compared to the conventional glass with a titanium nitride layer directly on the glass. It was confirmed that
（第２実施例）
２元スパッタリングにより窒化チタン薄膜付きガラスを
作製した。(Second Example) A glass with a titanium nitride thin film was produced by binary sputtering.
まず、ガラスを所定の形状に切断し、十分に洗浄、乾燥
した後、スパッタリング装置内の陽極側にこのガラスを
設置した。同時に、２つの陰極のうし、第１の陰極に酸
化チタンを、第２の陰極に窒化チタンを設置した。続い
て、スパッタリング装置内を２ Ｘ １０−” ｔｏｒ
ｒの真空度とした後、アルゴンガスを導入しＩ Ｘ １
０−’ ｔｏｒｒとした。次いで、４ｋＶのスパッタ電
圧を第１の陰極と陽極間に印加し、一定時間スパッタリ
ングした後、酸化チタンのスパッタ電圧を徐々に下げ、
これと同時に第２の陰極と陽極間に電圧を印加し、徐々
に上げていった。その後、酸化チタンのスパッタ電圧が
Ｏとなり窒化チタンのスパッタ電圧が４ｋＶとなったと
ころから、一定時間窒化チタンのみのスバ・ツタリング
を行った。First, glass was cut into a predetermined shape, thoroughly washed and dried, and then the glass was placed on the anode side of a sputtering device. At the same time, two cathodes were installed: titanium oxide was placed on the first cathode, and titanium nitride was placed on the second cathode. Next, the inside of the sputtering equipment was heated to 2×10-” tor.
After setting the degree of vacuum to r, argon gas was introduced and I
It was set to 0-' torr. Next, a sputtering voltage of 4 kV was applied between the first cathode and the anode, and after sputtering for a certain period of time, the sputtering voltage of titanium oxide was gradually lowered.
At the same time, a voltage was applied between the second cathode and the anode and gradually increased. Thereafter, when the sputtering voltage of titanium oxide became O and the sputtering voltage of titanium nitride became 4 kV, sputtering of only titanium nitride was performed for a certain period of time.
この結果、第１実施例と同様な窒化チタン薄膜付きガラ
スが形成された。このとき、酸化チタン層２、馴染み層
３、窒化チタンｒｇ４の膜厚ば、それぞれ８００人、１
２００人、１０００人であった。この第２実施例に係る
窒化チタン薄膜付きガラスも、第１実施例と同様良好な
密着性を示した。As a result, a glass with a titanium nitride thin film similar to that of the first example was formed. At this time, the film thicknesses of titanium oxide layer 2, conforming layer 3, and titanium nitride rg4 are 800 and 1, respectively.
There were 200 and 1000 people. The glass with the titanium nitride thin film according to the second example also showed good adhesion as in the first example.
図は本発明の第１実施例により作製した窒化チタン薄膜
付きガラスの概要を示す断面図である。
１−−−−−−ガラス
２−−−−一酸化チタン層
３− 酸化チタンと窒化チタンの馴染み層４−・−窒化
チタン層（窒化チタン薄膜）出願人 トヨタ自動車イ朱
曳会社The figure is a cross-sectional view schematically showing a glass with a titanium nitride thin film manufactured according to the first embodiment of the present invention. 1------Glass 2---Titanium monoxide layer 3---Familiar layer of titanium oxide and titanium nitride 4---Titanium nitride layer (titanium nitride thin film) Applicant: Toyota Motor Corporation
Claims (3)
化チタン（ＴｉＯ２）Ｆｆと、酸化チタンと窒化チタン
（Ｔ ｉ Ｎ）の馴染み層と、窒化チタン層とからなる
窒化チタン薄膜イ］きガラス。(1) A titanium nitride thin film consisting of glass, titanium oxide (TiO2) Ff sequentially formed on the surface of this glass, a conforming layer of titanium oxide and titanium nitride (T i N), and a titanium nitride layer. glass.
よる反応性スパッタリングを用いた窒化チタン薄膜付ガ
ラスの作製方法であって、まずスパッタリング装置内に
おいて、陰極側にチタンを、陽極側にガラスを設置し、
続いて、酸素を導入してチタンとの反応性スパタリング
によりガラス上に酸化チタン層を所定の厚さに設けた後
、窒素をスパッタリング装置内に徐々に導入し、酸素と
の置換をはかりながら反応性スパッタリングを行うこと
により酸化チタンと窒化チタンの馴染み層を設け、次い
で酸素が０になった状態で、窒素とチタンの反応性スパ
ッタリングで窒化チタン層を形成することを特徴とする
窒化チタン薄膜付ガラスの作製方法。(2) A method for producing glass with a titanium nitride thin film using reactive sputtering using titanium (Ti), oxygen (O2), and nitrogen (N2), in which titanium is first deposited on the cathode side and then on the anode side in a sputtering device. Install the glass in the
Next, after introducing oxygen and forming a titanium oxide layer on the glass to a predetermined thickness by reactive sputtering with titanium, nitrogen is gradually introduced into the sputtering equipment and reacts while replacing it with oxygen. With a titanium nitride thin film characterized by forming a compatible layer of titanium oxide and titanium nitride by reactive sputtering, and then forming a titanium nitride layer by reactive sputtering of nitrogen and titanium in a state where oxygen is 0. How to make glass.
用いた窒化チタン薄膜付きガラスの作製方法であって、 初めにスパッタリング装置内において、第１の陰極側に
酸化チタンを、第２の陰極側に窒化チタンを、陽極側に
ガラスを設置し、まず酸化チタンを一定量スパッタリン
グした後、酸化チタンのスパッタリング投入出力を徐々
に下げると同時に、窒化チタンを参入させて、窒化チタ
ンの投入出力を徐々に上げ、同時スパッタリングにより
酸化チタンと窒化チタンの馴染み層を設け、最後に酸化
チタンの投入を止め、窒化チタンのみのスパッタリング
を行い窒化チタン層を形成することを特徴とする窒化チ
タン薄膜付きガラスの作製方法。(3) A method for producing glass with a titanium nitride thin film using binary sputtering of titanium oxide and titanium nitride, in which titanium oxide is first applied to the first cathode side and titanium oxide is applied to the second cathode side in a sputtering apparatus. After installing titanium nitride and glass on the anode side and sputtering a certain amount of titanium oxide, the sputtering output of titanium oxide is gradually lowered, and at the same time, titanium nitride is introduced, and the input output of titanium nitride is gradually reduced. production of glass with a titanium nitride thin film, which is characterized by forming a conformal layer of titanium oxide and titanium nitride by simultaneous sputtering, and finally stopping the addition of titanium oxide and sputtering only titanium nitride to form a titanium nitride layer. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18812583A JPS6081048A (en) | 1983-10-06 | 1983-10-06 | Glass having thin titanium nitride film and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18812583A JPS6081048A (en) | 1983-10-06 | 1983-10-06 | Glass having thin titanium nitride film and its manufacture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6081048A true JPS6081048A (en) | 1985-05-09 |
| JPH0158134B2 JPH0158134B2 (en) | 1989-12-08 |
Family
ID=16218148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18812583A Granted JPS6081048A (en) | 1983-10-06 | 1983-10-06 | Glass having thin titanium nitride film and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6081048A (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62200011U (en) * | 1986-06-12 | 1987-12-19 | ||
| JPS63262454A (en) * | 1987-03-26 | 1988-10-28 | ピーピージー インダストリーズ，インコーポレーテツド | Titanium oxynitride coated article and manufacturing method thereof |
| JPH02177601A (en) * | 1988-09-01 | 1990-07-10 | Asahi Glass Co Ltd | Window glass for automobile |
| US5464683A (en) * | 1991-12-13 | 1995-11-07 | Balzers Aktiengesellschaft | Coated transparent substrate |
| US6466124B1 (en) | 1999-04-08 | 2002-10-15 | Nec Corporation | Thin film resistor and method for forming the same |
| WO2005063646A1 (en) * | 2003-12-22 | 2005-07-14 | Cardinal Cg Company | Graded photocatalytic coatings |
| EP1743876A3 (en) * | 2003-12-22 | 2007-07-25 | Cardinal CG Company | Graded photocatalytic coatings |
| US7604865B2 (en) | 2004-07-12 | 2009-10-20 | Cardinal Cg Company | Low-maintenance coatings |
| JP2010280941A (en) * | 2009-06-03 | 2010-12-16 | Nikon Corp | Film-formed product and method for producing film-formed product |
| US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
| US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
| US9738967B2 (en) | 2006-07-12 | 2017-08-22 | Cardinal Cg Company | Sputtering apparatus including target mounting and control |
| US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5059299A (en) * | 1973-09-28 | 1975-05-22 |
-
1983
- 1983-10-06 JP JP18812583A patent/JPS6081048A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5059299A (en) * | 1973-09-28 | 1975-05-22 |
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62200011U (en) * | 1986-06-12 | 1987-12-19 | ||
| JPS63262454A (en) * | 1987-03-26 | 1988-10-28 | ピーピージー インダストリーズ，インコーポレーテツド | Titanium oxynitride coated article and manufacturing method thereof |
| JPH02177601A (en) * | 1988-09-01 | 1990-07-10 | Asahi Glass Co Ltd | Window glass for automobile |
| US5464683A (en) * | 1991-12-13 | 1995-11-07 | Balzers Aktiengesellschaft | Coated transparent substrate |
| US5473468A (en) * | 1991-12-13 | 1995-12-05 | Balzers Aktiengesellschaft | Coated transparent substrate |
| US6466124B1 (en) | 1999-04-08 | 2002-10-15 | Nec Corporation | Thin film resistor and method for forming the same |
| US7294404B2 (en) | 2003-12-22 | 2007-11-13 | Cardinal Cg Company | Graded photocatalytic coatings |
| EP1743876A3 (en) * | 2003-12-22 | 2007-07-25 | Cardinal CG Company | Graded photocatalytic coatings |
| WO2005063646A1 (en) * | 2003-12-22 | 2005-07-14 | Cardinal Cg Company | Graded photocatalytic coatings |
| US7604865B2 (en) | 2004-07-12 | 2009-10-20 | Cardinal Cg Company | Low-maintenance coatings |
| US7713632B2 (en) | 2004-07-12 | 2010-05-11 | Cardinal Cg Company | Low-maintenance coatings |
| USRE43817E1 (en) | 2004-07-12 | 2012-11-20 | Cardinal Cg Company | Low-maintenance coatings |
| USRE44155E1 (en) | 2004-07-12 | 2013-04-16 | Cardinal Cg Company | Low-maintenance coatings |
| US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
| US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
| US9738967B2 (en) | 2006-07-12 | 2017-08-22 | Cardinal Cg Company | Sputtering apparatus including target mounting and control |
| JP2010280941A (en) * | 2009-06-03 | 2010-12-16 | Nikon Corp | Film-formed product and method for producing film-formed product |
| US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
| US11325859B2 (en) | 2016-11-17 | 2022-05-10 | Cardinal Cg Company | Static-dissipative coating technology |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0158134B2 (en) | 1989-12-08 |
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