JPS60943A - Continuous vacuum treatment device - Google Patents
Continuous vacuum treatment deviceInfo
- Publication number
- JPS60943A JPS60943A JP10787283A JP10787283A JPS60943A JP S60943 A JPS60943 A JP S60943A JP 10787283 A JP10787283 A JP 10787283A JP 10787283 A JP10787283 A JP 10787283A JP S60943 A JPS60943 A JP S60943A
- Authority
- JP
- Japan
- Prior art keywords
- ripple
- vacuum
- elastic body
- preliminary
- seal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
（発明の利用分野〕
本発明はプラスチック成形品、たとえば、塩化ビニール
系樹脂フィルムを連続的に真空状態でプラズマ処理する
真空連続処理装置６に関するものであシ、上述のプラス
チック成形品とはグラスチックフィルム、プラスチック
シート、するいはプラスチック被稜電線などを指す。DETAILED DESCRIPTION OF THE INVENTION (Field of Application of the Invention) The present invention relates to a vacuum continuous processing apparatus 6 for continuously plasma-treating plastic molded products, such as vinyl chloride resin films, in a vacuum state. Plastic molded products refer to glass films, plastic sheets, plastic-covered electric wires, etc.
（発明の背景〕
この種の真空連続処理装置は、本願１１（Ｍ’、人によ
シすでに特許出願されている。この特許はプラスチック
成形品など可撓性の被処理物を真空処理室内で連続的に
プラズマ処理するものである。ぞしてこの真空処理室の
前後側には少なくとも１個の予備真空室が段階的に真空
度を下げるために設けられており、この予備真空室は、
上下方向に対接し、被処理物の搬送方向に並置する一対
のシールロールと、このシールロールの一部に軸方向に
宿って連続的に対応するリップル部材と、シールロール
の両端向に対接するサイドピースなどｆ （〕ｉｉ＋え
ている。(Background of the Invention) A patent application has already been filed for this type of continuous vacuum processing apparatus. Plasma processing is carried out continuously.Therefore, at least one preliminary vacuum chamber is provided on the front and rear sides of this vacuum processing chamber in order to lower the degree of vacuum in stages, and this preliminary vacuum chamber is
A pair of seal rolls facing each other in the vertical direction and juxtaposed in the conveying direction of the processed material, a ripple member that resides in a part of the seal roll in the axial direction and corresponds continuously, and a ripple member that faces both ends of the seal roll. Side pieces, etc.
ところで、前記リップル部材としては、ニトリルゴム、
ウレタンゴムなどを用したものや、リップル部材に補強
金具を埋めこんだものもめる。By the way, as the ripple member, nitrile rubber,
Items using urethane rubber, etc., and items with reinforcing metal fittings embedded in the ripple member are also available.
しかしながら、リップル部４〕に加わる圧力差が犬なる
ときには、リップル部材の先端側の変形が大きくなり、
シール性が低下する。また、鼓形を防止するために、シ
ールロールに対する押圧力を大きくすると、リップル部
材とシールロールとの摩耗が激しいという問題があった
。However, when the pressure difference applied to the ripple part 4 becomes large, the deformation of the tip side of the ripple member increases,
Seal performance deteriorates. Furthermore, if the pressing force against the seal roll is increased in order to prevent the drum shape, there is a problem in that the ripple member and the seal roll are subject to severe wear.
［発明の目的〕
本発明の目的は、リップル部材に加わる差圧が犬なると
きでも良好なシール性を得るようにした真空連続処理装
置を提供することにある。[Object of the Invention] An object of the present invention is to provide a vacuum continuous processing apparatus that can obtain good sealing performance even when the differential pressure applied to the ripple member is large.
本発明の％徴とするところは、リップル部材の先端側を
弾性体により支持するようにしたものである。The feature of the present invention is that the tip side of the ripple member is supported by an elastic body.
以下本発明の一実施例を図面により説明する。 An embodiment of the present invention will be described below with reference to the drawings.
第１図および第２図において、１はプラスチックフィル
ム例えば塩化ビニール系樹脂フィルムのように可撓性の
被処理物Ｆｉ真空状態で連続的にプラズマ処理する真空
処理室、２は真空処理室１の前方側に複数個配置される
予備真空室、３は真空処理室１の後方側に複数個配置さ
れる予備真空室で、前記真空処理室１内はこれに接わ“
Ｃする真空ポンプ４によシ１０−２１−−ル程度の真空
圧力に保持するように排気管５を介して真空排気される
。1 and 2, 1 is a vacuum processing chamber in which a flexible workpiece, such as a plastic film, for example, a vinyl chloride resin film, is continuously plasma-treated in a vacuum state; 2 is a vacuum processing chamber 1; A plurality of preliminary vacuum chambers 3 are arranged on the front side, and a plurality of preliminary vacuum chambers 3 are arranged on the rear side of the vacuum processing chamber 1, and the inside of the vacuum processing chamber 1 is in contact with this.
The vacuum pump 4 is evacuated through the exhaust pipe 5 so as to maintain a vacuum pressure of approximately 10-21--.
前記予備真空室２，３内はこれに接続する真空ポンプ６
によシ前記真空処理室１内の真空圧力より若干尚＜、か
つ大気圧よシ段階的に減じる真空圧力に保持するように
排気管７を介して真空排気される。Inside the preliminary vacuum chambers 2 and 3 is a vacuum pump 6 connected thereto.
Then, the vacuum processing chamber 1 is evacuated through the exhaust pipe 7 so as to maintain a vacuum pressure that is slightly lower than the vacuum pressure in the vacuum processing chamber 1 and gradually decreases from atmospheric pressure.
処理される被処理物Ｆは巻出装置８より前方側の予備真
空室２を経て真空処理室１へ送られ、そこでプラズマ処
理された後、さらに後方側の予１７ｉｉ＋真空室３を経
て巻取装置９で巻取られる。１０１−Ｊ、駆動用モータ
で、この駆動用モータ１０−、ラインシャフト１１およ
び無段変速機１２，１３．１４゜１５を介して真壁処理
室ｌ、予備真空室２，３、巻取装置９へ駆動力を伝達し
、真空処理室１、予備真空室２，３および巻取装置９の
各駆動系の回転速度は前記無段変速機１２，１３，１４
．１５により適宜調整される。The workpiece F to be processed is sent from the unwinding device 8 to the vacuum processing chamber 1 via the preparatory vacuum chamber 2 on the front side, where it is plasma treated, and then further passed through the preparatory vacuum chamber 3 on the rear side and wound up. It is wound up by device 9. 101-J, a driving motor, which connects the Makabe processing chamber l, preliminary vacuum chambers 2, 3, and winding device 9 via this driving motor 10-, line shaft 11, and continuously variable transmission 12, 13, 14° 15. The rotational speed of each drive system of the vacuum processing chamber 1, preliminary vacuum chambers 2, 3, and winding device 9 is controlled by the continuously variable transmissions 12, 13, 14.
．． 15 as appropriate.
前記前方および後方予備真空室２，３は第３図および第
４図に示す如く、上下一対のシールロール１す、１７、
上下ケース１８，１９および上下リップル部材２０．２
１などから構成されておシ、以下にその詳細を説明する
。As shown in FIGS. 3 and 4, the front and rear preliminary vacuum chambers 2, 3 are provided with a pair of upper and lower seal rolls 1, 17,
Upper and lower cases 18, 19 and upper and lower ripple members 20.2
The details are explained below.
第３図および第４図において、２０は上ケース１８に固
定され、かつ上シールロール１６０表面の一部と軸方向
に沿って連続的に対接するリップル部材で、このリップ
ル部材２０はウレタンゴムなどのような耐摩耗性の犬な
るものを使用する。3 and 4, reference numeral 20 denotes a ripple member fixed to the upper case 18 and continuously in contact with a part of the surface of the upper seal roll 160 along the axial direction, and this ripple member 20 is made of urethane rubber or the like. Use a hard-wearing dog material like.
２１Ｖｉ下ケース１９に固定され、がっ下シールロール
１７の表面の一部と軸方向に沿って連続的に対接するリ
ップル部材で、このリップル部材２１も上記リップル部
拐２０と同様にウレタンゴムなどを使用する。これらリ
ップル部材２０．２１の断面形状は第５図に示す如く上
下シールロール１６．１７と対接する先端側が弾力性を
有するように折れ曲っている。そして、リップル部材２
゜は全体をニドリムゴムなどにより形成する。２２はリ
ップル部材２０の先端側に設けられる弾性体の例えば板
ばねで、この板ばねはリップル部拐２１）に加わる圧力
差が大なるときに発生するリップル部材の先端側の変形
を防止する。この板ばねはリップル部材２０の成形時に
一体に成形してもよく、あるいは別々に成形した後一体
向に取（ｚＪけてもよい。また補強体２３を埋め込むこ
とによりリッフル部材２０全体の変形奮防止することが
できる。21Vi is a ripple member fixed to the lower case 19 and continuously in contact with a part of the surface of the lower seal roll 17 along the axial direction, and this ripple member 21 is also made of urethane rubber or the like like the ripple part 20 described above. use. As shown in FIG. 5, the cross-sectional shape of these ripple members 20, 21 is bent so that the tip sides facing the upper and lower seal rolls 16, 17 have elasticity. And ripple member 2
゜ is made entirely of Nidorim rubber or the like. Reference numeral 22 denotes an elastic body such as a leaf spring provided on the tip side of the ripple member 20, and this plate spring prevents deformation of the tip side of the ripple member that occurs when the pressure difference applied to the ripple member 21) becomes large. These leaf springs may be integrally molded when molding the ripple member 20, or they may be molded separately and then attached to one another.Furthermore, by embedding the reinforcing body 23, the deformation of the ripple member 20 as a whole is stimulated. It can be prevented.
さらに第６図に示すようにリップル部拐２０のシールロ
ールに対する押付力を過度に太きくしないようにスポン
ジ、あるいはシリコーンシーラントのようなリップル部
材２０の材質よシも−やｔ：１、ｆりかいもので形成す
る。Furthermore, as shown in FIG. 6, the material of the ripple member 20 such as sponge or silicone sealant may be changed to prevent the pressing force of the ripple member 20 against the seal roll from being excessively large. Form with a shell.
本発明によれば、リップルｔ’９１Ｓ祠にかかる差圧が
大なる時でも、良好なシール性が得られ、またリップル
部材を過度にロールに対して押しつけないため、シール
ロールとリップル部側の耐久性全確保することができる
。According to the present invention, even when the differential pressure applied to the ripple t'91S shrine is large, good sealing properties can be obtained, and the ripple member is not excessively pressed against the roll, so that the seal roll and the ripple part side Durability can be ensured at all.
第１図および第２図は本発明の真空連続処」Ｌ＋＞ ４
’′：置の一実施例を示すもので、第１図は正面図、第
２図は第１図の平面図、第３図は本発明装置における予
備真空室の４１部を示す拡大図、第４図は第３図の４−
４線矢視図、第５図および第６図は本発明装置における
リップル部材を説明するための図である。
１・・・真空処理室、２，３・・・予備真壁室、２０゜
２１・・・リッ７゛ル部材。
第１頁の続き
０発 明 者 平石信行
土浦市神立町６０３番地株式会社
日立製作所土浦工場内
■出 願 人 信越化学工業株式会社
東京都千代田区大手町二丁目６
番１号Figures 1 and 2 show the vacuum continuous process of the present invention"L+>4
'': shows one embodiment of the device, in which Fig. 1 is a front view, Fig. 2 is a plan view of Fig. 1, and Fig. 3 is an enlarged view showing part 41 of the preliminary vacuum chamber in the device of the present invention. Figure 4 is 4- of Figure 3.
The 4-line arrow view, FIGS. 5 and 6 are diagrams for explaining the ripple member in the device of the present invention. 1... Vacuum processing chamber, 2, 3... Preliminary wall chamber, 20°21... Ribbon member. Continued from page 1 0 Inventor: Nobuyuki Hiraishi, 603 Kandatecho, Tsuchiura City, Tsuchiura Factory, Hitachi, Ltd. Applicant: Shin-Etsu Chemical Co., Ltd., 2-6-1 Otemachi, Chiyoda-ku, Tokyo
Claims (1)
置される予備真空室を有し、この予備真空室が、上下方
向に対接し、かつ可撓性の被処理物の搬送方向に並置さ
れた一対のシールロールと、このシールロールの一部に
軸方向に沿って連続的に対接する複数個のリップル部材
と、前記シールロールの両端面に対接するサイドピース
などがら成る真空連続処理装置において、前記リップル
部材のシールロールとの接触近傍を弾性体により支持し
たこと全特徴とする真空連続処理装置。1. At least one preliminary vacuum chamber is provided at the front and rear sides of the vacuum processing chamber, and the preliminary vacuum chambers are vertically opposed to each other and arranged in parallel in the direction of conveyance of the flexible workpiece. In a vacuum continuous processing device comprising a pair of seal rolls, a plurality of ripple members that continuously contact a part of the seal rolls along the axial direction, and side pieces that contact both end surfaces of the seal rolls, etc. . A continuous vacuum processing apparatus, characterized in that the ripple member is supported by an elastic body in the vicinity of its contact with the seal roll.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10787283A JPS60943A (en) | 1983-06-17 | 1983-06-17 | Continuous vacuum treatment device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10787283A JPS60943A (en) | 1983-06-17 | 1983-06-17 | Continuous vacuum treatment device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60943A true JPS60943A (en) | 1985-01-07 |
| JPH0455213B2 JPH0455213B2 (en) | 1992-09-02 |
Family
ID=14470221
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10787283A Granted JPS60943A (en) | 1983-06-17 | 1983-06-17 | Continuous vacuum treatment device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60943A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3339291A1 (en) * | 1982-10-30 | 1984-05-03 | Osaka Soda Co. Ltd., Osaka | DIALLYLTEREPHTHALATE COPOLYMERES |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57195740A (en) * | 1981-05-29 | 1982-12-01 | Shin Etsu Chem Co Ltd | Continuous vacuum treatment apparatus |
-
1983
- 1983-06-17 JP JP10787283A patent/JPS60943A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57195740A (en) * | 1981-05-29 | 1982-12-01 | Shin Etsu Chem Co Ltd | Continuous vacuum treatment apparatus |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3339291A1 (en) * | 1982-10-30 | 1984-05-03 | Osaka Soda Co. Ltd., Osaka | DIALLYLTEREPHTHALATE COPOLYMERES |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0455213B2 (en) | 1992-09-02 |
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