JPS61115073A - 2,2’−メチレンビス(4−置換−6−ベンゾトリアゾリルフェノ−ル)の製造方法 - Google Patents
2,2’−メチレンビス(4−置換−6−ベンゾトリアゾリルフェノ−ル)の製造方法Info
- Publication number
- JPS61115073A JPS61115073A JP23629084A JP23629084A JPS61115073A JP S61115073 A JPS61115073 A JP S61115073A JP 23629084 A JP23629084 A JP 23629084A JP 23629084 A JP23629084 A JP 23629084A JP S61115073 A JPS61115073 A JP S61115073A
- Authority
- JP
- Japan
- Prior art keywords
- general formula
- benzotriazolylphenol
- formula
- mannich base
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23629084A JPS61115073A (ja) | 1984-11-09 | 1984-11-09 | 2,2’−メチレンビス(4−置換−6−ベンゾトリアゾリルフェノ−ル)の製造方法 |
| EP85114203A EP0180993B1 (en) | 1984-11-09 | 1985-11-07 | Process for preparing 2,2'-methylene-bis-(4-hydrocarbyl-6-benzo-triazolylphenols) |
| DE8585114203T DE3581884D1 (de) | 1984-11-09 | 1985-11-07 | Verfahren zur herstellung von 2,2'-methylen-bis-(4-hydrocarbyl-6-benzotriazolyl(phenolen). |
| US07/138,998 US4937348A (en) | 1984-11-09 | 1987-12-29 | Process for preparing 2,2'-methylene-bis-(4-hydrocarbyl-6-benzotriazolylphenols) |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23629084A JPS61115073A (ja) | 1984-11-09 | 1984-11-09 | 2,2’−メチレンビス(4−置換−6−ベンゾトリアゾリルフェノ−ル)の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61115073A true JPS61115073A (ja) | 1986-06-02 |
| JPH0458468B2 JPH0458468B2 (2) | 1992-09-17 |
Family
ID=16998596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23629084A Granted JPS61115073A (ja) | 1984-11-09 | 1984-11-09 | 2,2’−メチレンビス(4−置換−6−ベンゾトリアゾリルフェノ−ル)の製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0180993B1 (2) |
| JP (1) | JPS61115073A (2) |
| DE (1) | DE3581884D1 (2) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05341509A (ja) * | 1992-06-04 | 1993-12-24 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
| WO2025164408A1 (ja) * | 2024-01-31 | 2025-08-07 | Jsr株式会社 | 半導体基板の製造方法、レジスト下層膜形成用組成物及び窒素含有化合物の製造方法 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3739765A1 (de) * | 1987-11-24 | 1989-06-08 | Bayer Ag | Beschichtete formkoerper und ein verfahren zu ihrer herstellung |
| US4859726A (en) * | 1988-10-24 | 1989-08-22 | Eastman Kodak Company | Bis-benzotriazolyl compounds and polymeric materials stabilized therewith |
| DE59103040D1 (de) * | 1990-12-11 | 1994-10-27 | Ciba Geigy Ag | Verfahren zur Herstellung von symmetrischen 2,2'-Methylen-bis-benztriazolylphenolen. |
| DE4118545C2 (de) * | 1991-06-06 | 1994-12-08 | Bayer Ag | Verfahren zur Herstellung von Derivaten des Bis-[2-hydroxy-phenyl-3(2H)-benztriazol]methans |
| US5292890A (en) * | 1993-05-05 | 1994-03-08 | Fairmount Chemical Company, Inc. | Asymmetrical benzotriazolylphenols |
| JP4162274B2 (ja) * | 1996-07-31 | 2008-10-08 | 城北化学工業株式会社 | ビス(2−ヒドロキシフェニル−3−ベンゾトリアゾール)メタン類の製造方法 |
| JP4155606B2 (ja) * | 1996-12-12 | 2008-09-24 | 城北化学工業株式会社 | ベンゾトリアゾリル−アルキレンビスフェノール化合物、その製造方法およびそれを含有する安定化有機材料 |
| WO2010060698A2 (de) * | 2008-11-03 | 2010-06-03 | Basf Se | Pigmentzusammensetzungen |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1670951A1 (de) * | 1967-11-21 | 1971-02-18 | Bayer Ag | Alkylen-bis-(benztriazolyl-phenole) |
| JPS61113667A (ja) * | 1984-11-07 | 1986-05-31 | Adeka Argus Chem Co Ltd | 耐光性の改善された熱硬化性合成樹脂塗料組成物 |
| JPS61113649A (ja) * | 1984-11-07 | 1986-05-31 | Adeka Argus Chem Co Ltd | 耐光性の改善された高分子材料組成物 |
-
1984
- 1984-11-09 JP JP23629084A patent/JPS61115073A/ja active Granted
-
1985
- 1985-11-07 DE DE8585114203T patent/DE3581884D1/de not_active Expired - Lifetime
- 1985-11-07 EP EP85114203A patent/EP0180993B1/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05341509A (ja) * | 1992-06-04 | 1993-12-24 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
| WO2025164408A1 (ja) * | 2024-01-31 | 2025-08-07 | Jsr株式会社 | 半導体基板の製造方法、レジスト下層膜形成用組成物及び窒素含有化合物の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0180993B1 (en) | 1991-02-27 |
| JPH0458468B2 (2) | 1992-09-17 |
| EP0180993A2 (en) | 1986-05-14 |
| EP0180993A3 (en) | 1987-03-25 |
| DE3581884D1 (de) | 1991-04-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |