JPS61161712A - 半導体製造装置 - Google Patents

半導体製造装置

Info

Publication number
JPS61161712A
JPS61161712A JP60002928A JP292885A JPS61161712A JP S61161712 A JPS61161712 A JP S61161712A JP 60002928 A JP60002928 A JP 60002928A JP 292885 A JP292885 A JP 292885A JP S61161712 A JPS61161712 A JP S61161712A
Authority
JP
Japan
Prior art keywords
heating furnace
reaction tube
reaction pipe
semiconductor manufacturing
rotated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60002928A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0311088B2 (2
Inventor
Isao Hishikari
功 菱刈
Yasushi Sakaino
境野　靖
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chino Corp
Original Assignee
Chino Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chino Works Ltd filed Critical Chino Works Ltd
Priority to JP60002928A priority Critical patent/JPS61161712A/ja
Publication of JPS61161712A publication Critical patent/JPS61161712A/ja
Publication of JPH0311088B2 publication Critical patent/JPH0311088B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
JP60002928A 1985-01-11 1985-01-11 半導体製造装置 Granted JPS61161712A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60002928A JPS61161712A (ja) 1985-01-11 1985-01-11 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60002928A JPS61161712A (ja) 1985-01-11 1985-01-11 半導体製造装置

Publications (2)

Publication Number Publication Date
JPS61161712A true JPS61161712A (ja) 1986-07-22
JPH0311088B2 JPH0311088B2 (2) 1991-02-15

Family

ID=11543000

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60002928A Granted JPS61161712A (ja) 1985-01-11 1985-01-11 半導体製造装置

Country Status (1)

Country Link
JP (1) JPS61161712A (2)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01280312A (ja) * 1987-09-29 1989-11-10 Tel Sagami Ltd 熱処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01280312A (ja) * 1987-09-29 1989-11-10 Tel Sagami Ltd 熱処理装置

Also Published As

Publication number Publication date
JPH0311088B2 (2) 1991-02-15

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