JPS61191515A - 含水珪酸の製造方法 - Google Patents

含水珪酸の製造方法

Info

Publication number: JPS61191515A
Authority: JP; Japan
Prior art keywords: raw material; acid; hydrated; phase; silicic acid
Prior art date: 1985-02-16
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP60028899A

Other languages

English (en)

Japanese (ja)

Other versions

JPH0454618B2 (da

Inventor

Hiroyuki Tamenori

為則　裕之

Akihiko Hattori

明彦服部

Hideyuki Kikuchi

菊地　秀幸

Mitsugi Yoshiyagawa

吉谷川　貢

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nippon Sheet Glass Co Ltd

Original Assignee

Nippon Sheet Glass Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-02-16

Filing date

1985-02-16

Publication date

1986-08-26

1985-02-16 Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd

1985-02-16 Priority to JP60028899A priority Critical patent/JPS61191515A/ja

1986-02-13 Priority to IT19398/86A priority patent/IT1191978B/it

1986-02-14 Priority to DE3604732A priority patent/DE3604732C2/de

1986-02-14 Priority to NO860560A priority patent/NO172229C/no

1986-08-26 Publication of JPS61191515A publication Critical patent/JPS61191515A/ja

1992-08-31 Publication of JPH0454618B2 publication Critical patent/JPH0454618B2/ja

Status Granted legal-status Critical Current

Links

235000012239 silicon dioxide Nutrition 0.000 title claims abstract description 36
RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 title claims abstract description 26
238000004519 manufacturing process Methods 0.000 title claims description 16
239000002994 raw material Substances 0.000 claims abstract description 55
239000002253 acid Substances 0.000 claims abstract description 42
229910052500 inorganic mineral Inorganic materials 0.000 claims abstract description 38
239000011707 mineral Substances 0.000 claims abstract description 38
BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims abstract description 17
239000007788 liquid Substances 0.000 claims abstract description 17
OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims abstract description 8
238000006482 condensation reaction Methods 0.000 claims abstract description 4
125000005372 silanol group Chemical group 0.000 claims abstract description 3
239000007791 liquid phase Substances 0.000 claims description 20
239000012071 phase Substances 0.000 claims description 9
VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 5
229910052710 silicon Inorganic materials 0.000 abstract description 11
235000019353 potassium silicate Nutrition 0.000 abstract description 9
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract description 9
239000007853 buffer solution Substances 0.000 abstract 2
229910021332 silicide Inorganic materials 0.000 abstract 1
FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 abstract 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 32
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 18
239000000377 silicon dioxide Substances 0.000 description 12
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
239000010703 silicon Substances 0.000 description 10
238000000034 method Methods 0.000 description 9
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
239000000741 silica gel Substances 0.000 description 6
229910002027 silica gel Inorganic materials 0.000 description 6
150000007513 acids Chemical class 0.000 description 5
230000005484 gravity Effects 0.000 description 5
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
229910052910 alkali metal silicate Inorganic materials 0.000 description 4
229910017604 nitric acid Inorganic materials 0.000 description 4
239000010410 layer Substances 0.000 description 3
239000002245 particle Substances 0.000 description 3
229910052784 alkaline earth metal Inorganic materials 0.000 description 2
150000001342 alkaline earth metals Chemical class 0.000 description 2
229910052681 coesite Inorganic materials 0.000 description 2
229910052906 cristobalite Inorganic materials 0.000 description 2
238000005516 engineering process Methods 0.000 description 2
239000000835 fiber Substances 0.000 description 2
239000011521 glass Substances 0.000 description 2
239000012535 impurity Substances 0.000 description 2
239000004065 semiconductor Substances 0.000 description 2
229910052682 stishovite Inorganic materials 0.000 description 2
229910052905 tridymite Inorganic materials 0.000 description 2
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
239000004115 Sodium Silicate Substances 0.000 description 1
239000003513 alkali Substances 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
229910052799 carbon Inorganic materials 0.000 description 1
238000004140 cleaning Methods 0.000 description 1
238000011109 contamination Methods 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
238000005260 corrosion Methods 0.000 description 1
230000007797 corrosion Effects 0.000 description 1
239000013078 crystal Substances 0.000 description 1
230000006866 deterioration Effects 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000000706 filtrate Substances 0.000 description 1
239000000499 gel Substances 0.000 description 1
239000008187 granular material Substances 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
238000002844 melting Methods 0.000 description 1
230000008018 melting Effects 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
239000011259 mixed solution Substances 0.000 description 1
239000000203 mixture Substances 0.000 description 1
239000012044 organic layer Substances 0.000 description 1
229910021426 porous silicon Inorganic materials 0.000 description 1
238000010248 power generation Methods 0.000 description 1
239000000047 product Substances 0.000 description 1
230000002250 progressing effect Effects 0.000 description 1
239000010453 quartz Substances 0.000 description 1
150000003839 salts Chemical class 0.000 description 1
239000004576 sand Substances 0.000 description 1
150000004760 silicates Chemical class 0.000 description 1
229910052911 sodium silicate Inorganic materials 0.000 description 1
239000007787 solid Substances 0.000 description 1
239000000243 solution Substances 0.000 description 1
239000002344 surface layer Substances 0.000 description 1
238000003786 synthesis reaction Methods 0.000 description 1
230000009466 transformation Effects 0.000 description 1
ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
239000005052 trichlorosilane Substances 0.000 description 1
238000005406 washing Methods 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/124—Preparation of adsorbing porous silica not in gel form and not finely divided, i.e. silicon skeletons, by acidic treatment of siliceous materials

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Dispersion Chemistry (AREA)
Inorganic Chemistry (AREA)
Silicon Compounds (AREA)

JP60028899A 1985-02-16 1985-02-16 含水珪酸の製造方法 Granted JPS61191515A (ja)

Priority Applications (4)

Application Number	Priority Date	Filing Date	Title
JP60028899A JPS61191515A (ja)	1985-02-16	1985-02-16	含水珪酸の製造方法
IT19398/86A IT1191978B (it)	1985-02-16	1986-02-13	Procedimento per produrre acido silicico idrato
DE3604732A DE3604732C2 (de)	1985-02-16	1986-02-14	Verfahren zur Herstellung von wasserhaltiger Kieselsäure
NO860560A NO172229C (no)	1985-02-16	1986-02-14	Fremgangsmaate ved fremstilling av vannholdig kiselsyre

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP60028899A JPS61191515A (ja)	1985-02-16	1985-02-16	含水珪酸の製造方法

Publications (2)

Publication Number	Publication Date
JPS61191515A true JPS61191515A (ja)	1986-08-26
JPH0454618B2 JPH0454618B2 (da)	1992-08-31

Family

ID=12261251

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP60028899A Granted JPS61191515A (ja)	1985-02-16	1985-02-16	含水珪酸の製造方法

Country Status (4)

Country	Link
JP (1)	JPS61191515A (da)
DE (1)	DE3604732C2 (da)
IT (1)	IT1191978B (da)
NO (1)	NO172229C (da)

1985
- 1985-02-16 JP JP60028899A patent/JPS61191515A/ja active Granted
1986
- 1986-02-13 IT IT19398/86A patent/IT1191978B/it active
- 1986-02-14 DE DE3604732A patent/DE3604732C2/de not_active Expired - Fee Related
- 1986-02-14 NO NO860560A patent/NO172229C/no unknown

Also Published As

Publication number	Publication date
NO172229B (no)	1993-03-15
NO172229C (no)	1993-06-23
IT1191978B (it)	1988-03-31
NO860560L (no)	1986-08-18
IT8619398A0 (it)	1986-02-13
JPH0454618B2 (da)	1992-08-31
DE3604732C2 (de)	1994-07-28
DE3604732A1 (de)	1986-08-21
IT8619398A1 (it)	1987-08-13

Legal Events

Date	Code	Title	Description
2004-08-31	LAPS	Cancellation because of no payment of annual fees

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