JPS61193155A - Manufacture of dry offset printing plate - Google Patents

Manufacture of dry offset printing plate

Info

Publication number
JPS61193155A
JPS61193155A JP60033963A JP3396385A JPS61193155A JP S61193155 A JPS61193155 A JP S61193155A JP 60033963 A JP60033963 A JP 60033963A JP 3396385 A JP3396385 A JP 3396385A JP S61193155 A JPS61193155 A JP S61193155A
Authority
JP
Japan
Prior art keywords
capsules
contents
support
microcapsules
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60033963A
Other languages
Japanese (ja)
Inventor
Shunichi Ishikawa
俊一 石川
Fumiaki Shinozaki
文明 篠崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP60033963A priority Critical patent/JPS61193155A/en
Priority to DE19863605120 priority patent/DE3605120A1/en
Publication of JPS61193155A publication Critical patent/JPS61193155A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To obtain an offset plate requiring no dampening water by coating a support with microcapsules contg. a photopolymerizable monomer, imagewise exposing the coated support to harden the exposed capsules, overlaying a base plate having a surface coated with a silicone resin layer on said support, and pressing them to transfer the contents of the unexposed capsules to the base plate. CONSTITUTION:The support is coated with the microcapsules contg. the photopolymerizable monomer, and imagewise exposed to harden the exposed capsules, and the silicone resin layer formed on the base plate is overlaid on the support and pressed to transfer the contents of the unexposed capsules to the base plate, and then, this plate is uniformly exposed. The microcapsules can be controlled in pressure collapsibility by light irradiation, and when the contents are wanted to be taken out, the contents can be released by applying the external force or the like to the capsules to break the outer shells like ordinary capsules.

Description

【発明の詳細な説明】 「産業上の利用分野」 本発明は湿し水を用いない、いわゆゐ乾式オフセット印
刷版の製造法に関するものであシ、特に乾式処11によ
る印刷版の製造方法に関するものである。
Detailed Description of the Invention "Industrial Application Field" The present invention relates to a method for producing a so-called dry offset printing plate without using dampening water, and in particular, a method for producing a printing plate using a dry process 11. It is related to.

「従来の技術」 軽印刷として知られている分野では種々の印刷法が用い
られているが、画像品質、耐刷性等の面で優れているオ
フセット印刷方式が広く用いられるようになってtまた
。従来オフセット印刷では湿し水と油性インキを版面に
交互に供給して、親水性の非画線部には湿し水を、′t
た親油性の画線部にはインキを供給して印刷を行ってい
る。この方法では湿し水が印刷中に流れるのを抑える等
、その制御に高度の熟練を要する。
``Prior art'' Various printing methods are used in the field known as light printing, but offset printing, which is superior in terms of image quality and printing durability, has become widely used. Also. Conventionally, in offset printing, dampening water and oil-based ink are alternately supplied to the plate surface, and the dampening water is applied to the hydrophilic non-image areas.
Printing is performed by supplying ink to the lipophilic image area. This method requires a high level of skill to control dampening water, such as suppressing the flow of dampening water during printing.

上記の欠点を克服することを目的に、特開昭!!−32
参14、特開昭11−/10コ参り号公報等に種々の湿
し水不要オフセット印刷版が提案されているが、それら
の多くは湿式の現像処理を伴うものであシ、機器の大盤
化、現像液の管理が面倒など、好ましくない点を含む。
Aiming to overcome the above drawbacks, Tokukai Sho! ! -32
Various offset printing plates that do not require dampening water have been proposed in Reference 14 and Japanese Patent Application Laid-open No. 11-10, etc., but most of them involve wet development processing and require large-scale equipment. It has some undesirable points, such as problems such as oxidation and troublesome developer management.

また湿し水不要のオフセット印刷版に関するものではな
いが湿式処理の複雑な工程を廃止する方法として光硬化
盤カプセルを用いる方法が特開昭I!−−−事7!コ号
公報に開示されている。この方法は光硬化型マイクロカ
プセルを含有する層を塗布し、この塗層面にパターン露
光を施し友のち加圧し、再び露光するととkよってオフ
セット印刷版を得るものであり湿式処理を伴わない。し
かしこの方法はマイクロカプセル壁膜の親水性と光硬化
型樹脂の親油性を利用し次ものであり、印刷に際しては
湿し水が必要であるし、マイクロカプセル壁膜が親水性
である必要がある。従ってマイクロカプセルの壁材を選
択するうえで制約を受ける。ま九マイクロカプセルの壁
膜が親水性であっても、光硬化型樹脂の親油性の性質が
近い場合は、印刷の際湿し水と油性インキが混シあって
印刷画像が不鮮明になることがらゐ。
In addition, although it is not related to offset printing plates that do not require dampening water, JP-A-Sho I! published a method using photocuring disk capsules as a method to eliminate the complicated process of wet processing. ---Thing 7! It is disclosed in Publication No. This method involves coating a layer containing photocurable microcapsules, subjecting the coated layer to pattern exposure, applying pressure, and exposing it again to obtain an offset printing plate, and does not involve wet processing. However, this method utilizes the hydrophilicity of the microcapsule wall and the lipophilicity of the photocurable resin, and dampening water is required for printing, and the microcapsule wall needs to be hydrophilic. be. Therefore, there are restrictions in selecting the wall material for the microcapsules. Even if the wall of Maku microcapsules is hydrophilic, if the lipophilic properties of the photocurable resin are similar, dampening water and oil-based ink may mix during printing, making the printed image unclear. Garai.

「発明が解決しようとする問題点」 従って、解決すべき問題点は乾式処理による部品な工程
で、湿し水を用いない乾式オフセット印刷版を製造する
方法を提供することである。
``Problem to be Solved by the Invention'' Therefore, the problem to be solved is to provide a method for producing a dry offset printing plate in a component process using dry processing without using dampening water.

「問題点を解決する几めの手段」 本発明は上述の問題点を解決できる乾式オフセット印刷
版の製造法に関するものであシ、そのステップは、支持
体上に光重合性モノマーを含有するマイクロカプセルを
塗布し、該塗層面に画像露光を施し、露光部のカプセル
を硬化後、表面にシリコーン樹脂層を有する基板と重ね
て加圧し、未露光部のカプセルの内容物を該基板に転写
し、転写され九基板を全面露光することよシなる。
"Elaborate Means for Solving the Problems" The present invention relates to a method for producing a dry offset printing plate that can solve the above-mentioned problems. A capsule is applied, image exposure is performed on the coated layer surface, and after the exposed part of the capsule is cured, it is overlapped with a substrate having a silicone resin layer on the surface and pressurized, and the contents of the capsule in the unexposed part are transferred to the substrate. This makes it easier to expose the entire surface of the transferred substrate.

本発明に用いる光重合性モノマー含有マイクロカプセル
は、光によって圧力破壊が制御できるマイクロカプセル
で、内容物をとシ出したい時は、通常のマイクロカプセ
ルと同様に外部よ〕圧力等を加えることによりマイクロ
カプセル壁を破壊し、内容物を放出させることができる
。17t、内容物をそのままマイクロカプセル内に包み
込んでおき九い時は、マイクロカプセルに光を当て、必
要ならば加熱その他の工程を経て内容物を硬化させる。
The photopolymerizable monomer-containing microcapsules used in the present invention are microcapsules whose pressure rupture can be controlled by light, and when it is desired to expel the contents, pressure can be applied from the outside in the same way as with ordinary microcapsules. The microcapsule wall can be ruptured and the contents released. 17t. When the contents are encapsulated in the microcapsules as they are, the microcapsules are exposed to light, and if necessary, the contents are hardened through heating or other steps.

従って光硬化後のマイクロカプセルは通常の圧力では破
壊されず、内容物の放出は起こらない。このような感光
性マイクロカプセルを支持体に塗布し、画像露光を施し
、露光部のカプセルを硬化後、表面にシリコーン樹脂層
を有する基板と重ねて加圧すると未露光部のカプセルの
内容物が該基板に転写される。ついで転写され次基板に
全面露光を施すと、撥油性のシリコーン樹脂表面を有す
る基板上に重合性モノマーが光重合して親油性の画像が
得られ、この基板を乾式オフセット印刷版として使うこ
とができる。
Therefore, the microcapsules after photocuring are not destroyed by normal pressure, and no release of the contents occurs. Such photosensitive microcapsules are coated on a support, subjected to image exposure, and after curing the capsules in the exposed areas, they are stacked on a substrate having a silicone resin layer on the surface and pressurized to release the contents of the capsules in the unexposed areas. transferred to the substrate. When the image is then transferred and the entire surface of the substrate is exposed to light, the polymerizable monomer is photopolymerized onto the substrate having an oil-repellent silicone resin surface, resulting in an oleophilic image that can be used as a dry offset printing plate. can.

本発明に用いらnる光重合性モノマーは例えば、アクリ
ロイル基、メタクリロイル基、ビニル基、アリル基、不
飽和ポリエステル基、ビニルオキシ基、アクリルアミド
基、マレイン酸残基などを有する化合物があげられる。
Examples of the photopolymerizable monomer used in the present invention include compounds having an acryloyl group, a methacryloyl group, a vinyl group, an allyl group, an unsaturated polyester group, a vinyloxy group, an acrylamide group, a maleic acid residue, and the like.

最も代表的なものは、ポリオール、ポリアミン又はアミ
ノアルコール等と不飽和カルボン酸との反応物、ヒドロ
キシル基をもつアクリレート又はメタクリレートとポリ
イソシアネートとの反応物などである。
The most typical examples include reaction products of polyols, polyamines, amino alcohols, etc. and unsaturated carboxylic acids, and reaction products of acrylates or methacrylates having hydroxyl groups and polyisocyanates.

これらのモノマーは、通常Joanm以下の紫外部に吸
収を有するので、紫外〜可視光源に対し感光性を付与す
るために紫外〜可視光を吸収し、七ツマ−を重分させる
ような感光性物質を併用するのが望ましい。その例とし
ては一般に光重合開始剤として知られているものかあり
、例えば芳香族ケトン、キノン化合物、ヘキサアリール
ビイミタソール等が挙げられる。特に特願昭jターlコ
1431号明細書く記載した光重合開始剤は感度が高く
好ましい。
These monomers usually have absorption in the ultraviolet region below Joanm, so in order to impart photosensitivity to ultraviolet to visible light sources, a photosensitive material that absorbs ultraviolet to visible light and superimposes seven monomers is used. It is desirable to use them together. Examples thereof include those generally known as photopolymerization initiators, such as aromatic ketones, quinone compounds, hexaarylbiimitasole, and the like. In particular, the photopolymerization initiators described in Japanese Patent Application No. 1431 are preferred because of their high sensitivity.

また、モノマー重合体のシリコーン樹脂層への接着を強
固にする九め、接着剤を併用して4良い。
Additionally, an adhesive may be used in combination to strengthen the adhesion of the monomer polymer to the silicone resin layer.

その例としては接着用シリフーン樹脂、酢酸ビニルある
いはその共重合体、アクリル樹脂、ゴム系物質等がある
Examples include adhesive silicone resins, vinyl acetate or copolymers thereof, acrylic resins, rubber materials, and the like.

その他、公知の熱重合防止剤や、特願昭zy−/2/l
Jr号明細書く記載した発色反応を起こス成分をマイク
ロカプセル中に含有することができる。
In addition, known thermal polymerization inhibitors, patent application Shozy-/2/L
The components that cause the color-forming reaction described in the specification of No. Jr. can be contained in the microcapsules.

以上のエチレン性不飽和化合物、光重合開始剤等をカプ
セル化するに際しては、溶剤を併用することができる。
When encapsulating the above ethylenically unsaturated compound, photopolymerization initiator, etc., a solvent can be used in combination.

溶剤としては、天然または合成油を単独ま几は併用して
用いることができる。溶剤の例としては、綿実油、灯油
、脂肪族ケトンJ脂肪族エステル、/lラフイン、ナフ
テン油、アルキル化ビフェニル、アルキル化ターフェニ
ル、塩素化パラフィン、アルキル化ナフタレン、および
!−フェニル−7−キシリルエタン、l−フェニル−/
−D−エチルフェニルエタン、/、/’−ジトリルエタ
ン等のごときジアリールエタンなどを挙げることができ
る。
As the solvent, natural or synthetic oils can be used alone or in combination. Examples of solvents include cottonseed oil, kerosene, aliphatic ketone J aliphatic esters, loughine, naphthenic oils, alkylated biphenyls, alkylated terphenyls, chlorinated paraffins, alkylated naphthalenes, and! -phenyl-7-xylylethane, l-phenyl-/
Examples include diarylethanes such as -D-ethylphenylethane and /,/'-ditolylethane.

これらの化合物をカプセル化する方法としては、公知の
カプセル化法が適用できる。例えばカプセルの製造方法
としては、米国特許コ、too、tj7号、同コ、10
0 、嬰sr号にみられるコアセルベーションを利用し
た方法、英国特許タタ0゜4A4A3号、米国特許3.
−17,118号にみられる界面重合法による方法、米
国特許J、A/I。
Any known encapsulation method can be used to encapsulate these compounds. For example, as a method for manufacturing capsules, US Pat.
0, a method using coacervation found in YSR, British patent Tata 0゜4A4A3, US patent 3.
17,118, U.S. Patent J, A/I.

210号、同!、440.JO棋号にみられるポリマー
の析出による方法、米国特許!、72t。
No. 210, same! , 440. US patent for polymer precipitation method seen in JO Gogo! , 72t.

10亭号、米国特許7.7PJ、472号にみられる油
滴内部からのりアクタントの重合等がある。
There is polymerization of glue actant from inside the oil droplet as seen in No. 10 Tei and US Pat. No. 7.7PJ, No. 472.

41にポリマーの析出による方法及び油滴内部からのり
アクタントの重合によるカプセル化法を使用し几場合、
その効果が大きい。即ち、短時間に1均一な粒径をもつ
感光材料として好ましいカプセルを得ることができる。
41, when a method by polymer precipitation and an encapsulation method by polymerization of actant from inside the oil droplet are used.
The effect is great. That is, capsules suitable for use as a photosensitive material having a uniform particle size can be obtained in a short time.

カプセルの粒径は20μ以下特に保存時の取〕扱い性の
点から7θμ以下が好しい。
The particle size of the capsules is preferably 20μ or less, particularly 7θμ or less from the viewpoint of handling during storage.

支持体としては、プラスチックフィルム、合成紙、アル
ミもしくは鉄等の金属、紙あるいはこnらの複合体など
が使用される。
As the support, a plastic film, synthetic paper, metal such as aluminum or iron, paper, or a composite of these can be used.

支持体に塗布するに際しては、PVA又はラテックスの
如きバインダーデンプンの如き保護剤などが用いらnる
。又、従来よシ記録系に用いられる種々の添加剤、バイ
ンダー、酸化防止剤、スマツジ防止剤、界面活性剤や塗
布方法、使用方法等についてはよく知られてお夛、米国
特許λ、71/、37!、同J、4コ!、73遥、英国
特許l。
When coating the support, a protective agent such as a binder starch such as PVA or latex is used. Further, various additives, binders, antioxidants, anti-smearing agents, surfactants, coating methods, usage methods, etc. conventionally used in recording systems are well known, and are disclosed in U.S. Patent λ, 71/ , 37! , Same J, 4! , 73 Haruka, British Patent l.

コ3コ、Jg7、特開昭J−04!4!、0/λ号、同
!θ−10,11コ号、同10−/コア、71遥号、同
!0−J0.4/!号、米国特許J、IJt、313号
、同J、Ir4L4.JJ/号などに開示があシ、それ
らの手法を利用できる。
Ko3ko, Jg7, Tokukai Sho J-04!4! , 0/λ issue, same! θ-10, 11 Ko, 10-/core, 71 Haruka, same! 0-J0.4/! No., U.S. Patent J, IJt, 313, Ir4L4. There are disclosures in JJ/ issues, etc., and those methods can be used.

本発明に用いるシリコーン樹脂層を有する基板としては
、例えば特開昭!コーコデ30j号、特開昭J−4−4
ココ!3号会報に記載されているにオルガノポリシロキ
サン含有層を基板上に設ければよく、通常オルガノポリ
シロキサンとして末端水酸基を有するものを用い、アル
コキシシラン等の橋かけ剤を存在させて、塗布乾燥後熱
処理によシ橋かけし、シリコーン樹脂層を形成する。
As a substrate having a silicone resin layer used in the present invention, for example, JP-A-Sho! Kokode No. 30j, JP-A-Sho J-4-4
Here! It is sufficient to form an organopolysiloxane-containing layer on a substrate as described in the 3rd bulletin, and usually an organopolysiloxane having a terminal hydroxyl group is used, a cross-linking agent such as alkoxysilane is present, and the layer is coated and dried. Cross-linking is performed by post-heat treatment to form a silicone resin layer.

基板は、紙、プラスチックフィルム、金属シート、合成
紙、ゴム状シートおよびこれらの材料の複合体等である
Substrates include paper, plastic films, metal sheets, synthetic papers, rubber-like sheets, and composites of these materials.

シリコン樹脂層の転属の厚さはionμ以下、好ましく
は0.1,10μである、熱処理の温度は室温ないし3
10°C以下の範囲で、好ましくは!0,100°C%
さらに好ましくは100〜コj0°Cである。
The thickness of the silicone resin layer is less than ionμ, preferably 0.1.10μ, and the heat treatment temperature is room temperature to 3.
Preferably within a range of 10°C or less! 0,100°C%
More preferably, the temperature is 100 to 0°C.

ま比熱処理の時間は0.1〜10分、好ましくは7〜3
0分である。
The specific heat treatment time is 0.1 to 10 minutes, preferably 7 to 3 minutes.
It is 0 minutes.

本発明のオフセット印刷版の製造方法は、マイクロカプ
セルの含有層に1タングステンランプ、ハロゲンランプ
、キセノンランプ、水銀灯等の光源を用いて画偉露光し
、次にマイクロカプセルの含有層とシリコーン樹脂層を
接触させてロール等で加圧し、更にシリコーン樹脂層に
対して、タングステンランプ、ハロゲンランプ、キセノ
ンランプ、水銀灯の光源を用いて全面露光すればよい。
The method for producing an offset printing plate of the present invention includes exposing a layer containing microcapsules to light using a light source such as a tungsten lamp, a halogen lamp, a xenon lamp, or a mercury lamp, and then forming a layer containing microcapsules and a silicone resin layer. The silicone resin layer may be exposed to light using a light source such as a tungsten lamp, a halogen lamp, a xenon lamp, or a mercury lamp.

「実施例」 以下本発明の実施例を示すが、本発明はこnに限定され
るものではない。
"Example" Examples of the present invention will be shown below, but the present invention is not limited thereto.

実施例1 (1)感光性マイクロカプセルを以下の如く作製した。Example 1 (1) Photosensitive microcapsules were produced as follows.

トリメチロールプロ/Rントリアクリレートー!tへ4
C、4c/−ビス(ジエチルアミノ)ベンゾフェノンo
、ztおよびコーメルカプトー!−メチルチオ−/、!
、4A−チアジアゾール0.!fを溶解させる。またλ
、J′−ビス(0−クロ6フエニル1−g、l  、z
、z’−テトラフェニルビイミダゾール1.Ifを11
の塩化メチレンに溶解し、先のモノマーに混合し、オイ
ル相とし比。
Trimethylolpro/R triacrylate! 4 to t
C, 4c/-bis(diethylamino)benzophenone o
, zt and Cormel Capto! -Methylthio-/,!
, 4A-thiadiazole 0. ! Dissolve f. Also λ
, J'-bis(0-chloro6 phenyl 1-g, l, z
, z'-tetraphenylbiimidazole1. If 11
Dissolve in methylene chloride and mix with the above monomer, and then mix into the oil phase.

一方70%アラビアガム水溶液17.If%lコーイソ
プチレン/無水マレイン酸水溶液lr。
On the other hand, 70% gum arabic aqueous solution 17. If % l co-isobutylene/maleic anhydride aqueous solution lr.

If、蒸留水−A、tfの混合物を、硫酸でpH3、!
に調整し、更に尿素1.≦t、レゾルシンo、ttt−
加え、この溶液に先のオイル相を乳化分散した。ついで
JA%ホルマリンlコ、りf5f加え攪拌しつつto’
cまで昇温し、1時間後に!チ硫酸アンモニウム水溶液
2ft−加え、更KA0°C1C保ちつつ1時間攪拌後
冷却し友。その後Na0HVcよCpHを2.Oとし友
If, distilled water-A, tf mixture to pH 3 with sulfuric acid,!
and further add urea 1. ≦t, resorcinol, ttt-
In addition, the previous oil phase was emulsified and dispersed in this solution. Next, add JA% formalin and add 5f while stirring.
Raise the temperature to c and 1 hour later! Add 2 ft of ammonium thiosulfate aqueous solution, stir for 1 hour while maintaining the temperature at 0°C, and then cool. Then change Na0HVc to CpH to 2. O Toshitomo.

(2)こうして得tカプセル液jfVc/1%PVA水
溶液1.jJf、蒸留水!、4A7f、−1::んぶん
0.j7fを加え塗布液とした。これをコーティングロ
ッド#1O1−用いてアート紙に塗布し、/DO°Cで
2分間乾燥させ、感光シートを得友。
(2) Thus obtained capsule liquid jfVc/1% PVA aqueous solution 1. jJf, distilled water! , 4A7f, -1:: 0. j7f was added to prepare a coating liquid. This was applied to art paper using coating rod #1O1 and dried for 2 minutes at /DO°C to obtain a photosensitive sheet.

(3)/r0W超高圧水銀灯、レンズ、ミラーよシなる
露光装置にニジ、反射原稿の像を上述の感光シートに焼
き付けt後、表面に東しシリコーンf3p、JOtjを
塗布乾燥してなるアルミニウム板と、カプセル塗層側と
シリコーン樹脂側が対向するように重ねて加圧ローツー
に通した。未露光部のカプセルは破壊され、その内容物
が転写された。
(3) An aluminum plate made by applying silicone F3P and JOtj to the surface and drying it after printing the image of the reflective original onto the above-mentioned photosensitive sheet using an exposure device consisting of a /r0W ultra-high pressure mercury lamp, lens, and mirror. Then, the capsules were stacked so that the coating layer side and the silicone resin side were facing each other, and passed through a pressure roller. The unexposed portion of the capsule was destroyed and its contents were transferred.

ついで全面露光を施して乾式オフセット印刷l[を得九
Then, the entire surface was exposed to light to obtain dry offset printing.

(4)  このようにして得らt′L次乾式オフセット
印刷版を用い、水なし平版用インキ(東洋インキ製)を
用いて印刷した結果、鮮明な画像を得几。また耐刷性も
s、ooo枚以上であつ几。
(4) Using the t'L dry offset printing plate thus obtained, a clear image was obtained as a result of printing with waterless lithographic ink (manufactured by Toyo Ink). Also, the printing durability is more than s, ooo sheets.

Claims (1)

【特許請求の範囲】[Claims] 支持体上に光重合性モノマーを含有するマイクロカプセ
ルを塗布し、該塗層面に画像露光を施し、露光部のカプ
セルを硬化後、表面にシリコーン樹脂層を有する基板と
重ねて加圧し、未露光部のカプセルの内容物を該基板に
転写し、転写された基板を全面露光することによりなる
乾式オフセット印刷版の製造法。
Microcapsules containing a photopolymerizable monomer are coated on a support, image exposure is performed on the coated layer surface, and after the exposed portions of the capsules are cured, they are stacked with a substrate having a silicone resin layer on the surface and pressurized. A method for producing a dry offset printing plate, which comprises transferring the contents of a capsule in an exposure area onto the substrate and exposing the entire surface of the transferred substrate.
JP60033963A 1985-02-19 1985-02-22 Manufacture of dry offset printing plate Pending JPS61193155A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60033963A JPS61193155A (en) 1985-02-22 1985-02-22 Manufacture of dry offset printing plate
DE19863605120 DE3605120A1 (en) 1985-02-19 1986-02-18 Method of producing offset printing plates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60033963A JPS61193155A (en) 1985-02-22 1985-02-22 Manufacture of dry offset printing plate

Publications (1)

Publication Number Publication Date
JPS61193155A true JPS61193155A (en) 1986-08-27

Family

ID=12401144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60033963A Pending JPS61193155A (en) 1985-02-19 1985-02-22 Manufacture of dry offset printing plate

Country Status (1)

Country Link
JP (1) JPS61193155A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02176663A (en) * 1988-09-05 1990-07-09 Fuji Photo Film Co Ltd Picture forming method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02176663A (en) * 1988-09-05 1990-07-09 Fuji Photo Film Co Ltd Picture forming method

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