JPS61194830A - 基板の有機物除去装置 - Google Patents

基板の有機物除去装置

Info

Publication number
JPS61194830A
JPS61194830A JP60034505A JP3450585A JPS61194830A JP S61194830 A JPS61194830 A JP S61194830A JP 60034505 A JP60034505 A JP 60034505A JP 3450585 A JP3450585 A JP 3450585A JP S61194830 A JPS61194830 A JP S61194830A
Authority
JP
Japan
Prior art keywords
substrate
ozone
tube
organic matter
removing organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60034505A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0241897B2 (2
Inventor
Tokuyuki Hayashi
徳幸 林
Masaru Kitagawa
勝 北川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP60034505A priority Critical patent/JPS61194830A/ja
Publication of JPS61194830A publication Critical patent/JPS61194830A/ja
Publication of JPH0241897B2 publication Critical patent/JPH0241897B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP60034505A 1985-02-25 1985-02-25 基板の有機物除去装置 Granted JPS61194830A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60034505A JPS61194830A (ja) 1985-02-25 1985-02-25 基板の有機物除去装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60034505A JPS61194830A (ja) 1985-02-25 1985-02-25 基板の有機物除去装置

Publications (2)

Publication Number Publication Date
JPS61194830A true JPS61194830A (ja) 1986-08-29
JPH0241897B2 JPH0241897B2 (2) 1990-09-19

Family

ID=12416112

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60034505A Granted JPS61194830A (ja) 1985-02-25 1985-02-25 基板の有機物除去装置

Country Status (1)

Country Link
JP (1) JPS61194830A (2)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63202922A (ja) * 1987-02-18 1988-08-22 Nec Kyushu Ltd 半導体基板洗浄装置
JPH0186233U (2) * 1987-11-28 1989-06-07
JPH01189653A (ja) * 1988-01-25 1989-07-28 Dainippon Printing Co Ltd フォトマスクの製造方法
WO2002036259A1 (en) * 2000-11-01 2002-05-10 Shin-Etsu Engineering Co., Ltd. Excimer uv photo reactor
CN1111899C (zh) * 2000-04-11 2003-06-18 北京高力通科技开发公司 紫外光表面清洗机
JP2014027322A (ja) * 2007-03-05 2014-02-06 Semiconductor Energy Lab Co Ltd 配線の作製方法、記憶素子の作製方法
WO2014129259A1 (ja) * 2013-02-22 2014-08-28 東京エレクトロン株式会社 成膜方法、コンピュータ記憶媒体及び成膜システム
JP2016181596A (ja) * 2015-03-24 2016-10-13 ウシオ電機株式会社 光処理装置および光処理方法
WO2017032804A1 (de) * 2015-08-27 2017-03-02 Süss Microtec Photomask Equipment Gmbh & Co. Kg Vorrichtung zum aufbringen eines mit uv-strahlung beaufschlagten flüssigen mediums auf ein substrat

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5220766A (en) * 1975-08-04 1977-02-16 Texas Instruments Inc Method of removing phtoresist layer and processing apparatus thereof
JPS5339228A (en) * 1976-09-22 1978-04-11 Hitachi Ltd Sprayyetching method
JPS5815939A (ja) * 1981-07-07 1983-01-29 ギヤ−ト・ジアンセン サリチル酸ナトリウムの製造方法
JPS58206128A (ja) * 1982-05-25 1983-12-01 Toshiba Corp エツチング装置
JPS5925223A (ja) * 1982-08-02 1984-02-09 Nippon Telegr & Teleph Corp <Ntt> 基板クリ−ニング法及び基板クリ−ニング装置
JPS59193030A (ja) * 1983-04-15 1984-11-01 Hitachi Ltd 処理装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5220766A (en) * 1975-08-04 1977-02-16 Texas Instruments Inc Method of removing phtoresist layer and processing apparatus thereof
JPS5339228A (en) * 1976-09-22 1978-04-11 Hitachi Ltd Sprayyetching method
JPS5815939A (ja) * 1981-07-07 1983-01-29 ギヤ−ト・ジアンセン サリチル酸ナトリウムの製造方法
JPS58206128A (ja) * 1982-05-25 1983-12-01 Toshiba Corp エツチング装置
JPS5925223A (ja) * 1982-08-02 1984-02-09 Nippon Telegr & Teleph Corp <Ntt> 基板クリ−ニング法及び基板クリ−ニング装置
JPS59193030A (ja) * 1983-04-15 1984-11-01 Hitachi Ltd 処理装置

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63202922A (ja) * 1987-02-18 1988-08-22 Nec Kyushu Ltd 半導体基板洗浄装置
JPH0186233U (2) * 1987-11-28 1989-06-07
JPH01189653A (ja) * 1988-01-25 1989-07-28 Dainippon Printing Co Ltd フォトマスクの製造方法
CN1111899C (zh) * 2000-04-11 2003-06-18 北京高力通科技开发公司 紫外光表面清洗机
WO2002036259A1 (en) * 2000-11-01 2002-05-10 Shin-Etsu Engineering Co., Ltd. Excimer uv photo reactor
KR100733803B1 (ko) 2000-11-01 2007-07-02 신에츠 엔지니어링 가부시키가이샤 엑시머 자외선 포토 리액터
JP2014027322A (ja) * 2007-03-05 2014-02-06 Semiconductor Energy Lab Co Ltd 配線の作製方法、記憶素子の作製方法
WO2014129259A1 (ja) * 2013-02-22 2014-08-28 東京エレクトロン株式会社 成膜方法、コンピュータ記憶媒体及び成膜システム
JP2014165252A (ja) * 2013-02-22 2014-09-08 Tokyo Electron Ltd 成膜方法、プログラム、コンピュータ記憶媒体及び成膜システム
CN105074883A (zh) * 2013-02-22 2015-11-18 东京毅力科创株式会社 成膜方法、计算机存储介质和成膜系统
US9741559B2 (en) 2013-02-22 2017-08-22 Tokyo Electron Limited Film forming method, computer storage medium, and film forming system
JP2016181596A (ja) * 2015-03-24 2016-10-13 ウシオ電機株式会社 光処理装置および光処理方法
WO2017032804A1 (de) * 2015-08-27 2017-03-02 Süss Microtec Photomask Equipment Gmbh & Co. Kg Vorrichtung zum aufbringen eines mit uv-strahlung beaufschlagten flüssigen mediums auf ein substrat
US10843235B2 (en) 2015-08-27 2020-11-24 Suss Micro Tec Photomask Equipment Gmbh & Co Kg Device for applying a liquid medium which is exposed to UV radiation to a substrate

Also Published As

Publication number Publication date
JPH0241897B2 (2) 1990-09-19

Similar Documents

Publication Publication Date Title
KR100677661B1 (ko) 자외광 조사장치 및 방법
KR100335845B1 (ko) 표면처리장치및표면처리방법
US4756047A (en) Apparatus for removing organic substance from substrate
KR910007110B1 (ko) 표면처리장치
CN100521097C (zh) 紫外线洗涤装置及洗涤方法
JPS61194830A (ja) 基板の有機物除去装置
JP2001137800A (ja) 基板処理装置及び処理方法
KR100385581B1 (ko) 회로 기판의 표면 처리 방법 및 장치
JP3964131B2 (ja) ドライ洗浄装置
JP2003159571A (ja) 紫外線照射装置
JPS6235811B2 (2)
JP2001219053A (ja) 誘電体バリア放電を使った酸化方法、および酸化処理装置
JP2588511B2 (ja) 処理装置
JP3992894B2 (ja) 洗浄装置
JP2004162124A (ja) 基板の処理装置及び処理方法
JPH0612766B2 (ja) 光照射装置
JP2588508B2 (ja) 処理装置
JP4211271B2 (ja) 清浄基板の製造方法、および製造装置
JP3511728B2 (ja) 紫外線処理装置
JP2702697B2 (ja) 処理装置および処理方法
JPH07319080A (ja) 光照射装置
JP2000225337A (ja) 紫外線処理方法
JP2702699B2 (ja) 処理装置
JPH09120950A (ja) 紫外線洗浄装置
JPH08236492A (ja) 光洗浄方法