JPS6122467B2 - - Google Patents
Info
- Publication number
- JPS6122467B2 JPS6122467B2 JP54109965A JP10996579A JPS6122467B2 JP S6122467 B2 JPS6122467 B2 JP S6122467B2 JP 54109965 A JP54109965 A JP 54109965A JP 10996579 A JP10996579 A JP 10996579A JP S6122467 B2 JPS6122467 B2 JP S6122467B2
- Authority
- JP
- Japan
- Prior art keywords
- thermoplastic resin
- resin plate
- depression
- shaped molded
- molded product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
- H10W74/016—Manufacture or treatment using moulds
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/756—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink
Landscapes
- Lining Or Joining Of Plastics Or The Like (AREA)
Description
本発明はダイオードやトランジスターのような
半導体素子や、これら半導体の集積回路(以下半
導体類と称す)を気密収納する為のパツケージ成
形方法、更に詳しくは半導体類を装着したリード
フレームを予め成形された少なくとも1個が半導
体類を収納するための周辺側壁部の厚さが位置に
より異なる窪みを有する二個の熱可塑性樹脂板状
成形品(以下熱可塑性樹脂板状体と称す)により
挟んだ状態で一体密封化することを特徴とする熱
可塑性樹脂製のフラツトパツケージ及びデユアル
インラインパツケージの製法に関するものであ
る。
従来、半導体類のパツケージ方法には金属、セ
ラミツクス及びガラス等で気密シールを行なうパ
ツケージ方式とプラスチツクによるパツケージ方
式とがありチツプの保護技術の進歩による信頼性
の向上により、最近は廉価なプラスチツクパツケ
ージが主流となつている。
現在実用に供せられているプラスチツクパツケ
ージにはその製造方式によりいわゆるモールド法
と注入法の2種類がある
中でも金属との密着性、耐湿性、電気及び機械
的特性などに優れたエポキシ樹脂のトランスフア
ーモールド法によるプラスチツクパツケージが最
も多く用いられている。
このモールド法は第1図に示すようにタブ1上
の半導体類のチツプ2の電極とリード4を金やア
ルミ等の金属細線3により電気的に結合した状態
のリードフレーム5を上型6及び下型7の間に挟
み、図示はしていないがスプルー、ランナー、ゲ
ートを介してトランスフアー成形機より成形樹脂
材料をキヤビテイ8に充填成形する方法である。
この方法の難点はリードフレームの厚みのバラ
ツキ、金型加工の精度及び使用にともなう摩耗、
寸法の狂い等により、金型とリードフレーム間に
隙間が出来、この部分およびその周辺にフラツシ
ユの出る場合が多いことでありこれらリード上の
フラツシユはリードとソケツトとの接触不良や半
田づけ作業の妨げの原因となるため除去作業が必
要となる等の欠点があつた。
更に、この方法では樹脂による封止成形中にチ
ツプが成形樹脂材料と直接接触することにより高
温、高圧の状態におかれるため、場合によつては
半導体機能の信頼性に影響を及ぼすといつた欠点
もあつた。
このような欠点を解決するために第2図および
第3図に示すように予め成形された少なくとも1
個が半導体類を収納するための窪みを有する、2
個の熱可塑性樹脂板状体10,10′をプレス機
能を有する平面金型9,9′に取付け、図には示
されていないが半導体類を装着したリードフレー
ム5と共にヒーター12で合体に必要な温度まで
加熱し溶融樹脂をプレス圧力によつてリードフレ
ームのリード間隙13に流し込み充填することよ
りなる半導体類のパツケージ法が提案されてい
る。
しかしかかる方法においても次のような欠陥が
あつた。
即ち、熱可塑性樹脂板状体の合体面を加熱溶融
した後、リードフレームを挟んでプレスで加圧し
て融合合体する過程は、加熱溶融された熱可塑性
樹脂板状体の合体面へリードフレームのリードが
プレス圧力によつて押込まれる過程()およびリ
ードが押込まれることによつて排除された溶融樹
脂がリード間隙を流れて充填する過程()よりな
つている。()の過程においては溶融樹脂がプレ
ス圧力によつてリード表面を流れることによつて
リード表面と熱可塑性樹脂板状体の合体面との境
界に存在する空気を押出してリード表面を樹脂で
十分濡らすることによつて接着強度を向上させ
る。()の過程においては溶融樹脂がリード間隙
を流れながら存在する空気を排除し樹脂で充填し
ていくことによつてリードフレームを抱き込んだ
形で2個の熱可塑性樹脂板状体とリードフレーム
とが合体される。
十分な接着力を得るために必要な圧力を加えた
場合()の過程においてリードの押込まれる量が
多くなり()の過程においてリード間隙を充填し
てなお余剰の溶融樹脂がフラツシユとなつてパツ
ケージの合体部外周辺および内部の窪みへ流れ出
す結果となる。
パツケージ合体部外周辺のフラツシユは、樹脂
モールドの場合と同様にリードとソケツトの接触
不良や半田付け作業の妨げの原因となる場合があ
り、内部の窪み内のフラツシユは窪み内のリード
先端部に設けられた金属細線結合部を破壊する場
合もあるという致命的な問題を生じる。
本発明はこのような点に鑑みてなされたもの
で、以下1実施例を示す第4図〜第6図によりそ
の内容を説明する。
第4図において予め成形された半導体類を収納
するための周辺部薄肉側壁部15,15′と厚肉
側壁部16,16′を有する窪み11,11′およ
び厚肉側壁部に融合合体時に生じる余剰樹脂を溜
めるための溶融樹脂溜め用窪み18,18′のあ
る2個の溶融樹脂溜め用窪み付き熱可塑性樹脂板
状体17,17′および図には示されていない
が、半導体を装着したリードフレーム5を窪み付
き金型14,14′にとりつけ、リードフレーム
および熱可塑性樹脂板状体を所定の温度に加熱し
た後プレスによつて加圧し、該熱可塑性樹脂板状
体を融合合体せしめる。
この際熱可塑性樹脂板状体をとりつける窪み付
金型14,14′には該熱可塑性樹脂板状体を密
着してとりつけることのできる熱可塑性樹脂板状
体とりつけ用窪み19,19′を設けてある。該
窪みの形状は深さt2を熱可塑性樹脂板状体の厚さ
t1より小さくしてある以外は該熱可塑性樹脂板状
体と少なくともその窪み開口部周辺において同一
形状であり、該熱可塑性樹脂板状体の外表面を該
窪みの少なくとも開口部周辺の壁面に密着させる
ことができる形状である。
t1―t2に相当する部分が融合合体時に溶融流動
する樹脂部分であり、この量はリードフレームの
形状によつて決定されるものであるが、t1―t2が
0.1mm以上0.7mm以下好ましくは0.2mm以上0.5mm以
下の場合に有害なフラツシユも認められずまた十
分な気密性が得られた。0.1mm未満の場合には溶
融流動し得る樹脂量が少なく十分な気密性が得ら
れなかつた。また0.7mmを越えた場合熱可塑性樹
脂板状体の合体面と金型との距離が大き過ぎるた
めに金型への放熱が遅れる結果該合体面外周辺の
温度が必要以上に高くなり、溶融樹脂の粘度が低
下して有害なフラツシユの発生が認められた。
該金型は温度調節が可能な構造でありその温度
は熱可塑性樹脂板状体の材料として使用する熱可
塑性樹脂の溶融流動特性、溶融樹脂量によつて異
なるが有害なフラツシユが発生しない温度に保つ
必要がある。
このような熱可塑性樹脂板状体をとりつけ冷却
するための窪みを設けた金型を使用することによ
つてパツケージ外部へのフラツシユを抑えたため
に結果的には窪み11,11′へのフラツシユ量
が多くなるが、本発明では厚肉側壁部に少なくと
も1個以上の窪み18,18′を設けリードと樹
脂の接着に必要十分な加熱加圧を行つた際に生ず
るフラツシユの原因となる溶融樹脂を該窪みへ流
し込むようにすることによつて、半導体類を収納
している窪み11,11′へのフラツシユを極め
て少はくしリード先端部に設けた金属細線の結線
部の破損を皆無にすることができた。
実施例 1
ポリフエニレンサルフアイド(フイリツプス社
製ライトンPPS:R―4)を用いて第5図のよう
な形状の熱可塑性樹脂状体を成形し、半導体集積
回路を装着した厚さ250μの16ピンDIP型リード
フレームと共に第4図に示すように30℃に保つた
加圧合体用の窪み付金型にとりつけ400℃の熱盤
を挟んで5秒間加熱した後、熱盤を取り去つて圧
力30mg/cm3で加圧合体した。合体後パツケージ内
外のフラツシユの観線、I.C.テスターによる断線
の確認、オートタレーブ中で5ft/cm2加圧下にお
ける赤色アルコール溶液浸漬試験による気密性の
確認を行つた。結果は第1表に示した通りいずれ
も良好であつた。
実施例 2
窪み付金型の温度を60℃に保つた以外は実施例
1と同じ方法で合体した。得られた半導体パツケ
ージは第1表に示した通り良好な結果であつた。
実施例 3
加熱方法を450℃の熱風で10秒間加熱する方法
を用いた以外は実施例1と同じ方法で合体した。
得られた半導体パツケージは第1表に示した通り
良好な結果であつた。
実施例 4
加熱方法を800℃のヒーターからの輻射熱で30
秒間加熱する方法を用いた以外は実施例1と同じ
方法で合体した。得られた半導体パツケージは第
1表に示した通り良好な結果であつた。
比較例 1
合体用金型の温度を100℃に保つた以外は実施
例1と同じ方法で合体した。得られた半導体パツ
ケージは表1に示した通り欠陥が認められた。
比較例 2
熱可塑性樹脂板状体として第5図における窪み
18,18′を設けないものを用いた以外は実施
例1と同じ方法で合体した。得られた半導体パツ
ケージは表1に示した通り欠陥が認められた。
比較例 3
合体用金型として第6図の窪み19,19′を
設けない平面金型を用いた以外は実施例1と同じ
方法で合体した。得られた半導体パツケージは第
1表に示した通り欠陥が認められた。
比較例 4
合体用金型は30℃に保つた平面金型を用い熱可
塑性樹脂板状体としては第5図の窪み18,1
8′のないものを使用し、合体圧力を15ft/cm3と
した以外は実施例1と同じ方法で合体した。得ら
れれた半導体パツケージは第1表に示した通り欠
陥が認められた。
The present invention relates to a package forming method for airtightly housing semiconductor elements such as diodes and transistors, and integrated circuits of these semiconductors (hereinafter referred to as semiconductors). At least one of the pieces is sandwiched between two thermoplastic resin plate-shaped molded products (hereinafter referred to as thermoplastic resin plate-shaped bodies) each having a recess whose peripheral side wall portion has a thickness that varies depending on the position for storing semiconductors. The present invention relates to a method for manufacturing a thermoplastic resin flat package and dual in-line package, which are characterized by being integrally sealed. Traditionally, there have been two packaging methods for semiconductors: one that uses metal, ceramics, glass, etc. for airtight sealing, and the other that uses plastic. Recently, inexpensive plastic packaging has become popular due to improvements in reliability due to advances in chip protection technology. It has become mainstream. There are two types of plastic packages currently in practical use, the so-called molding method and the injection method, depending on the manufacturing method. Among them, epoxy resin transfer resin has excellent adhesion to metals, moisture resistance, electrical and mechanical properties, etc. Plastic packaging made by the Armold method is most commonly used. In this molding method, as shown in FIG. 1, a lead frame 5 in which electrodes of a semiconductor chip 2 on a tab 1 and leads 4 are electrically connected by thin metal wires 3 made of gold, aluminum, etc. is attached to an upper mold 6 and In this method, the cavity 8 is filled with molding resin material by a transfer molding machine, which is sandwiched between the lower molds 7 and through sprues, runners, and gates (not shown). The disadvantages of this method are variations in the thickness of the lead frame, precision of mold processing, and wear due to use.
Due to dimensional errors, etc., a gap is created between the mold and the lead frame, and flashes often appear in and around this area.These flashes on the leads are caused by poor contact between the lead and the socket, or due to soldering work. There were drawbacks such as the need for removal work as it caused obstruction. Furthermore, in this method, the chip is subjected to high temperature and high pressure conditions due to direct contact with the molding resin material during encapsulation molding with resin, which may affect the reliability of the semiconductor function in some cases. There were also drawbacks. In order to solve such drawbacks, at least one pre-formed material as shown in FIG. 2 and FIG.
2. The piece has a recess for storing semiconductors.
The thermoplastic resin plate-like bodies 10, 10' are attached to flat molds 9, 9' having a press function, and are necessary for combining with the lead frame 5 equipped with semiconductors (not shown in the figure) using a heater 12. A packaging method for semiconductors has been proposed in which the lead frame is heated to a certain temperature and molten resin is poured into the lead gap 13 of the lead frame using press pressure to fill the gap. However, this method also had the following drawbacks. In other words, the process of heating and melting the joining surfaces of the thermoplastic resin plates and then applying pressure with a press with the lead frame in between is a process in which the lead frame is placed on the joining surface of the heated and melted thermoplastic resin plates. This process consists of a process in which the leads are pushed in by press pressure () and a process in which the molten resin removed by the pushing of the leads flows into the lead gap and fills it. In the process (), the molten resin flows over the lead surface due to press pressure, pushing out the air existing at the boundary between the lead surface and the combined surface of the thermoplastic resin plate, and the lead surface is covered with resin. Wetting improves adhesive strength. In the process of (), the molten resin flows through the lead gap, eliminating the existing air and filling the lead frame with the lead frame. are combined. When the pressure necessary to obtain sufficient adhesion is applied, the amount of lead pushed in increases in the process of (), and the excess molten resin becomes a flash even after filling the gap between the leads in the process of (). This results in water flowing out around the outside of the combined part of the package and into the recesses inside. As with resin molds, flashes around the outside of the package assembly may cause poor contact between the leads and sockets and hinder soldering work. This poses a fatal problem in that it may destroy the metal thin wire joints provided. The present invention has been made in view of these points, and its contents will be explained below with reference to FIGS. 4 to 6 showing one embodiment. In FIG. 4, depressions 11, 11' having peripheral thin side walls 15, 15' and thick side walls 16, 16' for storing preformed semiconductors and the thick side walls formed when fused together. Two thermoplastic resin plates 17, 17' with molten resin reservoir depressions 18, 18' for collecting excess resin, and a semiconductor mounted thereon (not shown in the figure). The lead frame 5 is attached to the molds 14 and 14' with depressions, and the lead frame and the thermoplastic resin plate are heated to a predetermined temperature and then pressurized by a press to fuse the thermoplastic resin plate. . At this time, the recessed molds 14 and 14' to which the thermoplastic resin plate is attached are provided with recesses 19 and 19' for attaching the thermoplastic resin plate to which the thermoplastic resin plate can be closely attached. There is. The shape of the depression is such that the depth t2 is the thickness of the thermoplastic resin plate.
The thermoplastic resin plate has the same shape as the thermoplastic resin plate at least around the opening of the recess except that it is smaller than t 1 , and the outer surface of the thermoplastic resin plate is attached to the wall surface of the recess at least around the opening. The shape allows for close contact. The part corresponding to t 1 - t 2 is the resin part that melts and flows during fusion, and this amount is determined by the shape of the lead frame, but t 1 - t 2 is
No harmful flash was observed when the diameter was 0.1 mm or more and 0.7 mm or less, preferably 0.2 mm or more and 0.5 mm or less, and sufficient airtightness was obtained. When the thickness was less than 0.1 mm, the amount of resin that could melt and flow was small, and sufficient airtightness could not be obtained. In addition, if the distance exceeds 0.7 mm, the distance between the joining surface of the thermoplastic resin plate and the mold is too large, and as a result, the heat dissipation to the mold is delayed, and the temperature around the outside of the joining surface becomes higher than necessary, causing melting. The viscosity of the resin decreased and the occurrence of harmful flash was observed. The mold has a temperature controllable structure, and the temperature varies depending on the melt flow characteristics of the thermoplastic resin used as the material for the thermoplastic resin plate and the amount of molten resin, but it is kept at a temperature that does not cause harmful flashing. need to be kept. By using a mold with depressions for mounting and cooling such a thermoplastic resin plate, flashing to the outside of the package was suppressed, and as a result, the amount of flashing to the depressions 11 and 11' was reduced. However, in the present invention, at least one or more depressions 18, 18' are provided in the thick side wall to prevent the molten resin from causing flashing when heating and pressurizing the leads and the resin to an extent necessary and sufficient for adhesion. By pouring the lead into the recess, flashing to the recesses 11 and 11' storing semiconductors is minimized and damage to the connecting part of the thin metal wire provided at the tip of the lead is completely eliminated. was completed. Example 1 A thermoplastic resin body having a shape as shown in Fig. 5 was molded using polyphenylene sulfide (Ryton PPS: R-4, manufactured by Philips Corporation), and a 250μ thick 16mm body was mounted with a semiconductor integrated circuit. As shown in Figure 4, the pin DIP type lead frame was attached to a concave mold for pressurization and combination kept at 30°C, heated for 5 seconds with a 400°C heating platen in between, and then the heating platen was removed and pressure was applied. They were combined under pressure at 30 mg/cm 3 . After assembly, the flash inside and outside of the package was inspected, any breakage was confirmed using an IC tester, and the airtightness was confirmed using a red alcohol solution immersion test under pressure of 5 ft/cm 2 in an autotale. As shown in Table 1, the results were all good. Example 2 Combining was carried out in the same manner as in Example 1, except that the temperature of the recessed mold was kept at 60°C. The obtained semiconductor package had good results as shown in Table 1. Example 3 Coalescence was carried out in the same manner as in Example 1, except that the heating method was heating with hot air at 450° C. for 10 seconds.
The obtained semiconductor package had good results as shown in Table 1. Example 4 The heating method was 30℃ using radiant heat from a heater at 800℃.
Coalescence was carried out in the same manner as in Example 1 except that the second heating method was used. The obtained semiconductor package had good results as shown in Table 1. Comparative Example 1 Combination was carried out in the same manner as in Example 1, except that the temperature of the mold for combination was kept at 100°C. The resulting semiconductor package had defects as shown in Table 1. Comparative Example 2 The thermoplastic resin plates were assembled in the same manner as in Example 1, except that the thermoplastic resin plates were not provided with the depressions 18 and 18' shown in FIG. The resulting semiconductor package had defects as shown in Table 1. Comparative Example 3 Combination was carried out in the same manner as in Example 1, except that a flat mold without the recesses 19 and 19' shown in FIG. 6 was used as the mold for combination. The resulting semiconductor package had defects as shown in Table 1. Comparative Example 4 The joining mold was a flat mold kept at 30°C, and the thermoplastic resin plate-like body had depressions 18 and 1 in Fig. 5.
Coalescence was carried out in the same manner as in Example 1, except that one without 8' was used and the coalescence pressure was 15 ft/cm 3 . The resulting semiconductor package had defects as shown in Table 1.
【表】
以上説明したように本発明においては次の効果
が達成される。
1 少なくとも1個が半導体類を収納するための
窪みを有する熱可塑性樹脂板状体を使用するこ
とにより半導体類とリード間の結線損傷が皆無
となると共に半導体類、金属細線、リード先端
の結線部が樹脂と接触していないためにイオン
性不純物が接触し難い等の理由により半導体機
能の信頼性が向上する。
2 従来の熱可塑性樹脂によるモールド封止法に
比べ融合合体時の樹脂粘度が高い上に金型を冷
却することによつて合体面の外周辺部だけ更に
高粘度に保ち得るために融合合体時のフラツシ
ユの発生がほとんど認められず工程の軽減が計
れる。[Table] As explained above, the following effects are achieved in the present invention. 1. By using a thermoplastic resin plate, at least one of which has a recess for accommodating semiconductors, there will be no damage to the connections between the semiconductors and the leads, and the connections between the semiconductors, thin metal wires, and the tips of the leads will be eliminated. The reliability of the semiconductor function is improved because it is difficult for ionic impurities to come into contact with the resin because it is not in contact with the resin. 2 Compared to the conventional mold sealing method using thermoplastic resin, the resin viscosity is higher during fusion and coalescence, and by cooling the mold, only the outer periphery of the merging surface can be kept at an even higher viscosity. Since almost no flashing occurs, the process can be reduced.
第1図はモールド法による半導体類のパツケー
ジ成形方法を示す断面図、第2図、第3図は熱可
塑性樹脂体を用いる場合の一般的なパツケージ成
形方法を示す断面図、第4図は本発明の一実施例
を示す断面図、第5図は本発明に使用する熱可塑
性樹脂板状の合体面形状の一例を示す平面図、第
6図は本発明に使用する金型の断面形状の一例と
熱可塑性樹脂板状体とのとり合いを示した図であ
る。
符号の説明、1……タブ、2……半導体類のチ
ツプ、3……金属細線、4……リード、5……リ
ードフレーム、6……上型、7……下型、8……
キヤビテイ、9,9′……平面金型、10,1
0′……熱可塑性樹脂板状体、11,11′……窪
み、12……ヒーター、13……リード間隙、1
4,14′……窪み付金型、15,15′……薄肉
側壁部、16,16′……厚肉側壁部、17,1
7′……溶融樹脂溜め用窪みつき熱可塑性樹脂板
状体、18,18′……溶融樹脂溜め用窪み、1
9,19′……熱可塑性樹脂板状体取付用窪み。
Figure 1 is a cross-sectional view showing a method for forming packages for semiconductors using a molding method, Figures 2 and 3 are cross-sectional views showing a general method for forming packages using thermoplastic resin, and Figure 4 is a cross-sectional view showing a method for forming packages for semiconductors using a molding method. FIG. 5 is a plan view showing an example of the combined surface shape of the thermoplastic resin plate used in the present invention, and FIG. 6 is a cross-sectional view of the mold used in the present invention. It is a figure which showed an example and the connection with a thermoplastic resin plate-shaped body. Explanation of symbols, 1...Tab, 2...Semiconductor chip, 3...Metal thin wire, 4...Lead, 5...Lead frame, 6...Upper die, 7...Lower die, 8...
Cavity, 9,9'...Flat mold, 10,1
0'... Thermoplastic resin plate, 11, 11'... Hollow, 12... Heater, 13... Lead gap, 1
4,14'...Mold with recess, 15,15'...Thin side wall part, 16,16'...Thick side wall part, 17,1
7'... Thermoplastic resin plate-shaped body with depression for molten resin reservoir, 18, 18'... depression for molten resin reservoir, 1
9, 19'... Recess for mounting thermoplastic resin plate.
Claims (1)
周辺側壁部の厚さが位置により異なる窪みを有す
る、2個の熱可塑性樹脂板状成形品により、半導
体類を装着したリードフレームを挟み、加熱加圧
して熱可塑性樹脂板状成形品を融合合体せしめる
半導体類のパツケージ成形方法において、窪みに
より形成される熱可塑性樹脂板状成形品の薄肉側
壁部の合体面を除いた厚肉側壁部の合体面、およ
び窪みを有しない熱可塑性樹脂板状成形品の場合
には融合合体時に窪みを有する熱可塑性樹脂板状
成形品の厚肉側壁部に対応する合体面のいずれか
一方もしくは双方の少なくとも1箇所以上に溶融
樹脂溜め用の窪みを少なくとも1個以上有する熱
可塑性樹脂板状成形品と、融合合体時に該熱可塑
性樹脂板状成形品を固定冷却するための窪み付金
型を用いることを特徴とする半導体類のパツケー
ジ成形方法。 2 加熱方法が熱盤に接触させる方法である特許
請求の範囲第1項記載の半導体類のパツケージ成
形方法。 3 加熱方法が熱風である特許請求の範囲第1項
記載の半導体類のパツケージ成形方法。 4 加熱方法が輻射である特許請求の範囲第1項
記載の半導体類のパツケージ成形方法。 5 半導体類のパツケージとして有害なフラツシ
ユを発生させない温度に金型を温調する特許請求
の範囲第1項ないし第4項のいずれかに記載の半
導体類のパツケージ成形方法。 6 熱可塑樹脂板状成形品をとりつけるための金
型の窪みは、その深さt2と該熱可塑性樹脂板状成
形品の厚みt1の差t1―t2が0.1mm以上0.7mm以下であ
り窪みの壁面と該熱可塑性樹脂板状成形品の合体
面を除く外表面が少なくとも該窪みの開口部周辺
において密着できる形状の窪みである特許請求の
範囲第1項ないし第5項のいずれかに記載の半導
体類のパツケージ成形方法。[Scope of Claims] 1. A lead on which semiconductors are mounted, which is made of two thermoplastic resin plate-shaped molded products, at least one of which has a recess for accommodating the semiconductor, the peripheral side wall of which has a different thickness depending on the position. In a package molding method for semiconductors in which thermoplastic resin plate-shaped molded products are fused together by sandwiching a frame and heating and pressurizing, the thickness of the thin side wall portion of the thermoplastic resin plate-shaped molded product formed by the depression, excluding the merging surface. Either the joining surface of the thick side wall part, or, in the case of a thermoplastic resin plate-shaped molded product without a depression, the joining surface corresponding to the thick side wall part of the thermoplastic resin plate-shaped molded product that has a depression when fused and combined. Or a thermoplastic resin plate-shaped molded product having at least one depression for storing molten resin at at least one location on both sides, and a mold with a depression for fixing and cooling the thermoplastic resin plate-shaped molded product during fusion. A method for molding packages for semiconductors, characterized by using. 2. A method for molding a package of semiconductors according to claim 1, wherein the heating method is a method of contacting with a hot platen. 3. A method for molding a semiconductor package according to claim 1, wherein the heating method is hot air. 4. A method for molding a semiconductor package according to claim 1, wherein the heating method is radiation. 5. A method for molding a package for semiconductors according to any one of claims 1 to 4, wherein the temperature of the mold is adjusted to a temperature that does not cause flashing that is harmful to semiconductor packages. 6 The depression of the mold for attaching the thermoplastic resin plate-shaped molded product shall have a difference between its depth t 2 and the thickness t 1 of the thermoplastic resin plate-shaped molded product, t 1 - t 2 of 0.1 mm or more and 0.7 mm or less. Any one of claims 1 to 5, wherein the depression has a shape that allows the wall surface of the depression and the outer surface of the thermoplastic resin plate-shaped molded product, excluding the combined surface, to be in close contact with each other at least around the opening of the depression. A method for forming packages for semiconductors as described in the above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10996579A JPS5633847A (en) | 1979-08-28 | 1979-08-28 | Package molding for semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10996579A JPS5633847A (en) | 1979-08-28 | 1979-08-28 | Package molding for semiconductor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5633847A JPS5633847A (en) | 1981-04-04 |
| JPS6122467B2 true JPS6122467B2 (en) | 1986-05-31 |
Family
ID=14523633
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10996579A Granted JPS5633847A (en) | 1979-08-28 | 1979-08-28 | Package molding for semiconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5633847A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6313352A (en) * | 1986-07-04 | 1988-01-20 | Sumitomo Bakelite Co Ltd | Sealing method of semiconductor and the like |
-
1979
- 1979-08-28 JP JP10996579A patent/JPS5633847A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5633847A (en) | 1981-04-04 |
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