JPS6140769Y2 - - Google Patents
Info
- Publication number
- JPS6140769Y2 JPS6140769Y2 JP58782U JP58782U JPS6140769Y2 JP S6140769 Y2 JPS6140769 Y2 JP S6140769Y2 JP 58782 U JP58782 U JP 58782U JP 58782 U JP58782 U JP 58782U JP S6140769 Y2 JPS6140769 Y2 JP S6140769Y2
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- rotor
- deposition tank
- reaction
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58782U JPS58105473U (ja) | 1982-01-08 | 1982-01-08 | 光反応蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58782U JPS58105473U (ja) | 1982-01-08 | 1982-01-08 | 光反応蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58105473U JPS58105473U (ja) | 1983-07-18 |
| JPS6140769Y2 true JPS6140769Y2 (2) | 1986-11-20 |
Family
ID=30013653
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58782U Granted JPS58105473U (ja) | 1982-01-08 | 1982-01-08 | 光反応蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58105473U (2) |
-
1982
- 1982-01-08 JP JP58782U patent/JPS58105473U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58105473U (ja) | 1983-07-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Clark et al. | A new application of UV− ozone treatment in the preparation of substrate-supported, mesoporous thin films | |
| JP2008121103A (ja) | 真空蒸着装置 | |
| JPS59159167A (ja) | アモルフアスシリコン膜の形成方法 | |
| KR20170069013A (ko) | 기판의 자전을 검출할 수 있는 기판처리장치 | |
| JPS6140769Y2 (2) | ||
| JPH0428860A (ja) | イオンプレーティング装置用回転テーブル | |
| JP2000282234A (ja) | スパッタリング装置 | |
| JPH09162128A (ja) | 気相成長方法及び気相成長装置用基板保持装置 | |
| JPH0338586B2 (2) | ||
| JP2657531B2 (ja) | アモルファスシリコン膜の形成方法 | |
| CN109490343A (zh) | 一种串行晶体学样品输运装置及方法 | |
| JPS5849841B2 (ja) | フレネルゾ−ンプレ−トの製造方法 | |
| JPS6043488A (ja) | 薄膜製造装置 | |
| JP7158065B2 (ja) | 成膜装置 | |
| JPS60219724A (ja) | 回転サセプタ支持装置 | |
| CN221501228U (zh) | 真空镀膜装置 | |
| JPS627684A (ja) | 被膜形成黒鉛材の製造法及び製造装置 | |
| JPH0438449B2 (2) | ||
| JPS5837952Y2 (ja) | 真空蒸着装置 | |
| JP2554867B2 (ja) | マイクロ波プラズマｃｖｄ法による機能性堆積膜形成装置 | |
| JPH03626B2 (2) | ||
| JPS60104242A (ja) | 固体高分解能核磁気共鳴装置用スピンナ | |
| JPS5875828A (ja) | 被膜形成方法 | |
| JPH01153597A (ja) | 気相成長装置 | |
| JPH1053500A (ja) | 成膜装置及び成膜方法 |