JPS6145824B2 - - Google Patents

Info

Publication number
JPS6145824B2
JPS6145824B2 JP54052830A JP5283079A JPS6145824B2 JP S6145824 B2 JPS6145824 B2 JP S6145824B2 JP 54052830 A JP54052830 A JP 54052830A JP 5283079 A JP5283079 A JP 5283079A JP S6145824 B2 JPS6145824 B2 JP S6145824B2
Authority
JP
Japan
Prior art keywords
quartz glass
mask substrate
ultraviolet light
photomask
transmittance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54052830A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55144243A (en
Inventor
Toshiro Kagami
Hideo Koide
Hirohiko Yaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP5283079A priority Critical patent/JPS55144243A/ja
Publication of JPS55144243A publication Critical patent/JPS55144243A/ja
Publication of JPS6145824B2 publication Critical patent/JPS6145824B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Glass Compositions (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP5283079A 1979-04-28 1979-04-28 Photomask Granted JPS55144243A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5283079A JPS55144243A (en) 1979-04-28 1979-04-28 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5283079A JPS55144243A (en) 1979-04-28 1979-04-28 Photomask

Publications (2)

Publication Number Publication Date
JPS55144243A JPS55144243A (en) 1980-11-11
JPS6145824B2 true JPS6145824B2 (ko) 1986-10-09

Family

ID=12925754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5283079A Granted JPS55144243A (en) 1979-04-28 1979-04-28 Photomask

Country Status (1)

Country Link
JP (1) JPS55144243A (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020090143A1 (ja) 2018-10-30 2020-05-07 エンネット株式会社 電流パルス法による電池診断装置及び電池診断方法
WO2020204584A1 (ko) * 2019-04-05 2020-10-08 주식회사 엘지화학 배터리 관리 장치 및 방법

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5977438A (ja) * 1982-10-25 1984-05-02 Mitsubishi Electric Corp 色分解フイルタ用ゼラチンパタ−ンの形成方法
US4641033A (en) * 1984-12-19 1987-02-03 Fusion Systems Corporation Apparatus and method preventing radiation induced degradation of optical elements
AU9763998A (en) * 1997-11-11 1999-05-31 Nikon Corporation Photomask, aberration correcting plate, exposure device and method of producing microdevice

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4886918A (ko) * 1972-02-22 1973-11-16

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020090143A1 (ja) 2018-10-30 2020-05-07 エンネット株式会社 電流パルス法による電池診断装置及び電池診断方法
WO2020204584A1 (ko) * 2019-04-05 2020-10-08 주식회사 엘지화학 배터리 관리 장치 및 방법

Also Published As

Publication number Publication date
JPS55144243A (en) 1980-11-11

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