JPS6157805U - - Google Patents

Info

Publication number
JPS6157805U
JPS6157805U JP1984142398U JP14239884U JPS6157805U JP S6157805 U JPS6157805 U JP S6157805U JP 1984142398 U JP1984142398 U JP 1984142398U JP 14239884 U JP14239884 U JP 14239884U JP S6157805 U JPS6157805 U JP S6157805U
Authority
JP
Japan
Prior art keywords
optical system
light
film thickness
thin film
measuring device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1984142398U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1984142398U priority Critical patent/JPS6157805U/ja
Priority to US06/723,567 priority patent/US4673294A/en
Publication of JPS6157805U publication Critical patent/JPS6157805U/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Description

【図面の簡単な説明】
第１図は本考案の膜厚測定装置の斜視ず、第２
図は本考案を示す構成図、第３図は従来の膜厚測
定装置の斜視図である。 ２０…膜厚測定装置、２６…測定光学系、２８
…投影光学系、３２…被測定試料、３３…薄膜面
、３６…第１の光学系、４２…分光器、４９…第
２の光学系、６９…第３の光学系、７９…ビユー
ワー。

Claims (1)

    【実用新案登録請求の範囲】
  1. 照射光線を発生する第１の光源と、この照射光
    を集光する第１の光学系と、この第１の光学系に
    よつて集光された光束を入射させ単色光に分光す
    る分光器と、この単色光を入射させ被測定試料の
    薄膜面に照射する第２の光学系と、この薄膜面か
    らの反射光を入射させ反射光量に比例した光電流
    を出力する光電子増倍管と、からなり前記被測定
    試料の膜厚を測定する膜厚測定装置において、前
    記第２の光学系の光路中に挿脱自在に介在される
    第３の光学系と、この第３の光学系を介して前記
    薄膜面に光を照射させる第２の光源と、この膜厚
    面から反射光を拡大投影させるビユーワーと、か
    らなる投影光学系を備えたことを特徴とする膜厚
    測定装置。
JP1984142398U 1984-09-20 1984-09-20 Pending JPS6157805U (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1984142398U JPS6157805U (ja) 1984-09-20 1984-09-20
US06/723,567 US4673294A (en) 1984-09-20 1985-04-15 Film thickness measuring apparatus employing microprojector of spectral reflection measurement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1984142398U JPS6157805U (ja) 1984-09-20 1984-09-20

Publications (1)

Publication Number Publication Date
JPS6157805U true JPS6157805U (ja) 1986-04-18

Family

ID=15314424

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1984142398U Pending JPS6157805U (ja) 1984-09-20 1984-09-20

Country Status (2)

Country Link
US (1) US4673294A (ja)
JP (1) JPS6157805U (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118776473A (zh) * 2024-07-15 2024-10-15 睿励科学仪器（上海）有限公司 一种膜厚测量装置及方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2672387A1 (fr) * 1991-02-01 1992-08-07 Thomson Csf Systeme de reglage de gravure d'un composant.
US5436725A (en) * 1993-10-12 1995-07-25 Hughes Aircraft Company Cofocal optical system for thickness measurements of patterned wafers
CN104236470A (zh) * 2014-09-28 2014-12-24 江苏普世祥光电技术有限公司 一种可以加工ф60以内绝对等厚平面的加工工艺
CN105737747B (zh) * 2016-05-09 2018-08-21 中国石油大学(北京) 往复式膜厚测量仪
CN107525474A (zh) * 2016-06-22 2017-12-29 上海宝钢工业技术服务有限公司 彩涂板涂层膜厚的在线检测系统

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5694350A (en) * 1979-12-28 1981-07-30 Hitachi Ltd Method for correcting white spot defect of photomask

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3851949A (en) * 1970-06-18 1974-12-03 Leitz Ernst Gmbh Microscope having a photometer
US3827811A (en) * 1972-03-15 1974-08-06 Nippon Kogaku Kk Optical measuring device employing a diaphragm with reflecting surfaces
US3869211A (en) * 1972-06-29 1975-03-04 Canon Kk Instrument for measuring thickness of thin film
US4355903A (en) * 1980-02-08 1982-10-26 Rca Corporation Thin film thickness monitor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5694350A (en) * 1979-12-28 1981-07-30 Hitachi Ltd Method for correcting white spot defect of photomask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118776473A (zh) * 2024-07-15 2024-10-15 睿励科学仪器（上海）有限公司 一种膜厚测量装置及方法

Also Published As

Publication number Publication date
US4673294A (en) 1987-06-16

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