JPS6177844A - 新規な光重合性積層体 - Google Patents

新規な光重合性積層体

Info

Publication number
JPS6177844A
JPS6177844A JP19945284A JP19945284A JPS6177844A JP S6177844 A JPS6177844 A JP S6177844A JP 19945284 A JP19945284 A JP 19945284A JP 19945284 A JP19945284 A JP 19945284A JP S6177844 A JPS6177844 A JP S6177844A
Authority
JP
Japan
Prior art keywords
formulas
tables
photopolymerizable
mathematical
integer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19945284A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0550737B2 (de
Inventor
Hideo Ai
愛　英夫
Akihiko Ikeda
章彦 池田
Jiro Sato
次郎 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP19945284A priority Critical patent/JPS6177844A/ja
Publication of JPS6177844A publication Critical patent/JPS6177844A/ja
Publication of JPH0550737B2 publication Critical patent/JPH0550737B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP19945284A 1984-09-26 1984-09-26 新規な光重合性積層体 Granted JPS6177844A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19945284A JPS6177844A (ja) 1984-09-26 1984-09-26 新規な光重合性積層体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19945284A JPS6177844A (ja) 1984-09-26 1984-09-26 新規な光重合性積層体

Publications (2)

Publication Number Publication Date
JPS6177844A true JPS6177844A (ja) 1986-04-21
JPH0550737B2 JPH0550737B2 (de) 1993-07-29

Family

ID=16408046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19945284A Granted JPS6177844A (ja) 1984-09-26 1984-09-26 新規な光重合性積層体

Country Status (1)

Country Link
JP (1) JPS6177844A (de)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0261639A (ja) * 1988-08-27 1990-03-01 Ibiden Co Ltd 多層プリント配線板
JPH07248623A (ja) * 1994-03-11 1995-09-26 Asahi Chem Ind Co Ltd 光硬化性樹脂積層体及びそれを用いるプリント配線板の製造方法
US6004725A (en) * 1997-12-01 1999-12-21 Morton International, Inc. Photoimageable compositions
JP2001290267A (ja) * 2000-02-01 2001-10-19 Mitsubishi Chemicals Corp 光重合性組成物、感光性平版印刷版及び印刷版の製版方法
JP2005037830A (ja) * 2003-07-18 2005-02-10 Asahi Kasei Electronics Co Ltd サンドブラスト用感光性樹脂積層体
JP2007098347A (ja) * 2005-10-07 2007-04-19 Kawamura Inst Of Chem Res マイクロ流体デバイス用重合性組成物、及びマイクロ流体デバイス
JPWO2015125518A1 (ja) * 2014-02-24 2017-03-30 株式会社スリーボンド 光硬化性組成物

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54153624A (en) * 1978-05-20 1979-12-04 Hoechst Ag Photopolymerization compound and photosensitive transfer material containing same compound
JPS5755914A (en) * 1980-09-19 1982-04-03 Hitachi Chem Co Ltd Photopolymer composition and photosensitive element

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54153624A (en) * 1978-05-20 1979-12-04 Hoechst Ag Photopolymerization compound and photosensitive transfer material containing same compound
JPS5755914A (en) * 1980-09-19 1982-04-03 Hitachi Chem Co Ltd Photopolymer composition and photosensitive element

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0261639A (ja) * 1988-08-27 1990-03-01 Ibiden Co Ltd 多層プリント配線板
JPH07248623A (ja) * 1994-03-11 1995-09-26 Asahi Chem Ind Co Ltd 光硬化性樹脂積層体及びそれを用いるプリント配線板の製造方法
US6004725A (en) * 1997-12-01 1999-12-21 Morton International, Inc. Photoimageable compositions
JP2001290267A (ja) * 2000-02-01 2001-10-19 Mitsubishi Chemicals Corp 光重合性組成物、感光性平版印刷版及び印刷版の製版方法
JP2005037830A (ja) * 2003-07-18 2005-02-10 Asahi Kasei Electronics Co Ltd サンドブラスト用感光性樹脂積層体
JP2007098347A (ja) * 2005-10-07 2007-04-19 Kawamura Inst Of Chem Res マイクロ流体デバイス用重合性組成物、及びマイクロ流体デバイス
JPWO2015125518A1 (ja) * 2014-02-24 2017-03-30 株式会社スリーボンド 光硬化性組成物

Also Published As

Publication number Publication date
JPH0550737B2 (de) 1993-07-29

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees