JPS6181647A - Testing apparatus for semiconductor wafer - Google Patents
Testing apparatus for semiconductor waferInfo
- Publication number
- JPS6181647A JPS6181647A JP60085841A JP8584185A JPS6181647A JP S6181647 A JPS6181647 A JP S6181647A JP 60085841 A JP60085841 A JP 60085841A JP 8584185 A JP8584185 A JP 8584185A JP S6181647 A JPS6181647 A JP S6181647A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- arm
- operating body
- gap
- space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は半導体ウェハー検査装置にかかり、とくに半導
体ウェハーの不良チップに不良打点マークを付す半導体
ウェハーの不良マーキング装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor wafer inspection apparatus, and more particularly to a semiconductor wafer defect marking apparatus for marking defective dot marks on defective chips on a semiconductor wafer.
現在、エレクトロニクス分野、特にコンピュータ関係で
はデバイスの作動速度の高速化の追求に努力が払われ、
高速で動作するICの研究開発が進められているのが実
情である。この現状に沿って、半導体ウェハー検査装置
においても測定の高速化が要求されるようになってきて
おり、検査装置の測定機構が種々改善され、その一部と
して半導体ウェハーチップの測定部分の間隙が従来に比
べて伏くなりつつある。Currently, in the electronics field, especially in the computer field, efforts are being made to increase the operating speed of devices.
The reality is that research and development of ICs that operate at high speeds is progressing. In line with this current situation, there is a growing demand for faster measurement in semiconductor wafer inspection equipment, and various improvements have been made to the measurement mechanisms of inspection equipment. It is becoming more prone than before.
第1図(イ)、(ロ)は従来の検査装置と最近の検査装
置における測定部間隙を示すものである。すなわち、一
対の支持板1,1間の測定部間隙2内に臨ませてグロー
ブカード3を設置したものである。FIGS. 1(A) and 1(B) show the measurement part gaps in a conventional inspection device and a recent inspection device. That is, the glove card 3 is installed so as to face into the measurement part gap 2 between the pair of support plates 1, 1.
そしてその下に検査される半導体ウェハーを装着するロ
ーディングテーブルが設けられる。第1図(ロ)に示す
最近の検査装置における間隙2の暢12は、第1図(イ
)に示す従来の検査装置における間隙2の幅11よシ大
幅にせばめられ、しかも、間隙2の上方には測定システ
ム装置の一部4(例えばテスター、従来は間隙2の側方
に設置されていたものである。)が設置される。@2図
は従来の半導体ウェハー不良マーキング装置である。こ
のマーキング装置は、本体5と、その先端に備えた針6
と、位置調整部7,7.・・・とからなっており、この
本体5を一方の支持板1上にねじ8で固定し、本体5の
一部を間隙2内に張り出させ、針5を間隙2内 ′に臨
ませる構造のものであった。したがって、この装置を第
1図(イ)に示す従来の検査装置に適用する場合には同
等支障は生じないが、第1図(ロ)に示す最近の検査装
置に適用すると、測定システム装置の一部4が妨げられ
て取付、調整、保守が困難となり、作業に支障をきたす
という問題が生ずる。A loading table on which a semiconductor wafer to be inspected is mounted is provided below. The width 12 of the gap 2 in the recent inspection device shown in FIG. 1(b) is much narrower than the width 11 of the gap 2 in the conventional inspection device shown in FIG. At the top, a part 4 of the measuring system equipment (for example a tester, conventionally placed on the side of the gap 2) is installed. Figure @2 shows a conventional semiconductor wafer defect marking device. This marking device consists of a main body 5 and a needle 6 provided at its tip.
and position adjustment parts 7, 7. The main body 5 is fixed on one support plate 1 with screws 8, and a part of the main body 5 projects into the gap 2, so that the needle 5 faces into the gap 2'. It was a structural thing. Therefore, when this device is applied to the conventional inspection device shown in Figure 1 (a), the same problem does not occur, but when applied to the recent inspection device shown in Figure 1 (b), the measurement system equipment A problem arises in that part 4 is obstructed, making installation, adjustment, and maintenance difficult, which impedes work.
本発明は上記問題点を解消するもので、支持板の上面に
たとえば移動調節可能に取付けられた腕杆をプローブカ
ードを臨ませた測定部間隙およびその下の検査される半
導体ウェハーを装置するローディングテーブルの上方に
延長させ、該腕杆の下面に半導体ウェハーマーキング装
置の動作部本体を設け、該動作部本体を間隙内に嵌合さ
せたことを特徴とするものである。The present invention solves the above-mentioned problems, and includes an arm rod that is movably attached to the upper surface of the support plate, and is used to connect the measuring section gap where the probe card faces and the semiconductor wafer to be inspected therebelow. The device is characterized in that it extends above the table, and that the main body of the operating section of the semiconductor wafer marking device is provided on the lower surface of the arm rod, and the main body of the operating section is fitted into the gap.
以下本発明の実施例を図によって説明する。Embodiments of the present invention will be described below with reference to the drawings.
第3図において、半導体ウェハーマーキング装置11は
、動作部本体12と、腕杆13とからなり、腕杆13の
両端末には長孔14を備えた座部15を有し、該腕杆1
3の中央下面に針16を備えた動作部本体12を設置し
たものである。この腕杆13の両座部15,15の支持
板1.1の上面に着座させ、長孔14内に係合させた止
めねじ17を支持板1に固定する。なお、長孔14の暢
は止めねじ17の直径より大きくなっており、止めねじ
17に対し、腕杆13を移動調節して所定の位置で締付
は固定する。この取付けにより、動作部本体12は、支
持板lの測定部間隙2内に献合し、針16はプローブカ
ード3と向き合される。このグローブカードの下にはロ
ーティ/グチ−プルに装着された半導体ウェハーが位置
している。第4図において、支持板1の上面には、腕杆
13による僅かな立上り部分が形成されるのみで測定シ
ステム装置の一部4はマーキング装置11に妨げられる
ことなく、間隙2の上方に設置できる。なお、腕杆13
の座部15の上方が、測定システム装置の一部4で覆わ
れるときにはさらに長い腕杆13を用いてその座部15
を支持板1に取付ければよいO
以上実施例では、腕杆13の両端を支持板上に固定した
場合の例について説明したが、あるいは、第5図に示す
ように片持式としてもよい。要は、支持板より間隙上方
に同けて張り出させた腕杆の下面にマーヤング装置の動
作部本体を設置し、これを間隙内に嵌合させればよいも
のである。In FIG. 3, the semiconductor wafer marking device 11 consists of an operating section main body 12 and an arm rod 13. The arm rod 13 has a seat portion 15 with a long hole 14 at both ends thereof.
3, an operating part main body 12 equipped with a needle 16 is installed on the lower center surface of the main body 3. Both seats 15, 15 of this arm rod 13 are seated on the upper surface of the support plate 1.1, and the setscrews 17 engaged in the elongated holes 14 are fixed to the support plate 1. The length of the elongated hole 14 is larger than the diameter of the set screw 17, and the arm rod 13 is moved and adjusted relative to the set screw 17 to be tightened at a predetermined position. By this attachment, the operating part main body 12 is dedicated within the measuring part gap 2 of the support plate l, and the needle 16 is faced to the probe card 3. A semiconductor wafer mounted on a rotary/groove pulley is located below the glove card. In FIG. 4, only a slight rising part is formed by the arm rod 13 on the upper surface of the support plate 1, and a part 4 of the measuring system device is installed above the gap 2 without being obstructed by the marking device 11. can. In addition, armrest 13
When the upper part of the seat 15 of
In the above embodiments, an example in which both ends of the arm rod 13 are fixed on the support plate 1 is explained, but alternatively, it may be a cantilever type as shown in Fig. 5. . In short, it is sufficient to install the main body of the operating section of the Mah-Young device on the lower surface of the arm rod that extends above the gap above the support plate, and to fit this into the gap.
したがって本発明によれば、測定部の間隙内に半導体ウ
ェハーマーキング装置の動作部本体を収容し、測定部外
で動作部本体の位置を調整できるため、その、取付、調
整、保守作業を容易に行なうことができ、作業の高速化
を図ることができる効果を有するものである。Therefore, according to the present invention, the main body of the operating section of the semiconductor wafer marking device is accommodated within the gap of the measuring section, and the position of the main body of the operating section can be adjusted outside the measuring section, so that installation, adjustment, and maintenance work thereof can be facilitated. This has the effect of speeding up the work.
第1図(イ)は従来の検査装置における測定部間隙を示
す断面図、第1図(ロ)は本発明の装置における検査装
置の測定部間隙を示す断面図、第2図は従来の半導体ウ
ェハーマーキング装置の斜視図、第3図は本発明の一実
施例を示す斜視図、第4図は本発明の装置の設置状況を
示す断面図、第5図は本発明の他の実施例を示す斜視図
である。
1・・・・・・支持板、2・・・・・r測定部間隙、3
・・・・・・グローブカード、11・・・・・・半導体
ウェハーマーキング装置、12・・・・・・動作部本体
。
第1図
(ロ)
第2図
第3図FIG. 1(A) is a cross-sectional view showing the measurement part gap in a conventional inspection device, FIG. 1(B) is a cross-sectional view showing the measurement part gap in the test device of the present invention, and FIG. FIG. 3 is a perspective view of a wafer marking device, FIG. 3 is a perspective view showing one embodiment of the present invention, FIG. 4 is a sectional view showing the installation situation of the device of the present invention, and FIG. 5 is a perspective view of another embodiment of the present invention. FIG. 1...Support plate, 2...r measurement part gap, 3
. . . Globe card, 11 . . . Semiconductor wafer marking device, 12 . . . Operating unit main body. Figure 1 (b) Figure 2 Figure 3
Claims (1)
つ該間隙上に突出せる腕杆と、該間隙下に半導体ウェハ
ーを装置する手段と、該腕杆からぶらさがる態様をもっ
て該間隙内に位置せる不良マーキング装置とを具備する
ことを特徴とする半導体ウェハー検査装置。a support plate having a predetermined gap; an arm rod attached to the support plate and projecting above the gap; means for installing a semiconductor wafer under the gap; 1. A semiconductor wafer inspection device comprising: a defect marking device for detecting defects.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60085841A JPS6181647A (en) | 1985-04-22 | 1985-04-22 | Testing apparatus for semiconductor wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60085841A JPS6181647A (en) | 1985-04-22 | 1985-04-22 | Testing apparatus for semiconductor wafer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6181647A true JPS6181647A (en) | 1986-04-25 |
| JPS633454B2 JPS633454B2 (en) | 1988-01-23 |
Family
ID=13870086
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60085841A Granted JPS6181647A (en) | 1985-04-22 | 1985-04-22 | Testing apparatus for semiconductor wafer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6181647A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5041470A (en) * | 1973-08-17 | 1975-04-15 | ||
| JPS50134581A (en) * | 1974-04-10 | 1975-10-24 |
-
1985
- 1985-04-22 JP JP60085841A patent/JPS6181647A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5041470A (en) * | 1973-08-17 | 1975-04-15 | ||
| JPS50134581A (en) * | 1974-04-10 | 1975-10-24 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS633454B2 (en) | 1988-01-23 |
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