JPS62104445U - - Google Patents
Info
- Publication number
- JPS62104445U JPS62104445U JP1985198117U JP19811785U JPS62104445U JP S62104445 U JPS62104445 U JP S62104445U JP 1985198117 U JP1985198117 U JP 1985198117U JP 19811785 U JP19811785 U JP 19811785U JP S62104445 U JPS62104445 U JP S62104445U
- Authority
- JP
- Japan
- Prior art keywords
- film
- silicon
- film provided
- semiconductor device
- gate electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Local Oxidation Of Silicon (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985198117U JPS62104445U (cs) | 1985-12-23 | 1985-12-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985198117U JPS62104445U (cs) | 1985-12-23 | 1985-12-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62104445U true JPS62104445U (cs) | 1987-07-03 |
Family
ID=31158510
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985198117U Pending JPS62104445U (cs) | 1985-12-23 | 1985-12-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62104445U (cs) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60116137A (ja) * | 1983-11-29 | 1985-06-22 | Seiko Instr & Electronics Ltd | 半導体装置用多層膜 |
| JPS60167355A (ja) * | 1984-02-09 | 1985-08-30 | Matsushita Electronics Corp | 半導体装置の製造方法 |
-
1985
- 1985-12-23 JP JP1985198117U patent/JPS62104445U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60116137A (ja) * | 1983-11-29 | 1985-06-22 | Seiko Instr & Electronics Ltd | 半導体装置用多層膜 |
| JPS60167355A (ja) * | 1984-02-09 | 1985-08-30 | Matsushita Electronics Corp | 半導体装置の製造方法 |
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