JPS62128917A - Production of fine spherical porous silica - Google Patents
Production of fine spherical porous silicaInfo
- Publication number
- JPS62128917A JPS62128917A JP27029685A JP27029685A JPS62128917A JP S62128917 A JPS62128917 A JP S62128917A JP 27029685 A JP27029685 A JP 27029685A JP 27029685 A JP27029685 A JP 27029685A JP S62128917 A JPS62128917 A JP S62128917A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- fine spherical
- particles
- porous silica
- spherical porous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 46
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000002245 particle Substances 0.000 claims abstract description 14
- 239000002253 acid Substances 0.000 claims abstract description 13
- 239000012798 spherical particle Substances 0.000 claims abstract description 11
- 238000001694 spray drying Methods 0.000 claims abstract description 7
- 238000001035 drying Methods 0.000 claims abstract description 5
- 238000005406 washing Methods 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 12
- 238000010306 acid treatment Methods 0.000 claims description 9
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 239000011148 porous material Substances 0.000 abstract description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 6
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 abstract description 5
- 239000007921 spray Substances 0.000 abstract description 5
- 238000003756 stirring Methods 0.000 abstract description 5
- 239000004115 Sodium Silicate Substances 0.000 abstract description 2
- 229910052911 sodium silicate Inorganic materials 0.000 abstract description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract description 2
- 239000003513 alkali Substances 0.000 abstract 2
- 239000007864 aqueous solution Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は微細球状多孔質シリカの製造法に関するしので
あり、詳しくは、比表面積及び慣孔容積の大きい球状多
孔質シワ力のM 造法に関するものて・ある。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for producing fine spherical porous silica, and more specifically, a method for manufacturing spherical porous silica with a large specific surface area and a large common pore volume. There is something about it.
[従 宋 1支 術 ]
微細球状の多孔質シリカは種々の用途に利用されるが、
その用途に応じて、比表面積及び網孔容積の大きいもの
が要求される場合がある。従来、球状多孔質シリカの製
造法として、例えば、アルカリ金属ケイ酸塩を噴霧乾燥
することにより微細球状粒子を10、次いで、この粒子
を酸α狸して゛型造する方法が知られている。この方法
によれば、噴霧乾燥によって球状粒子を(りるので、ス
プレードライヤーの条件、例えばディスク方式ではディ
スクの回転数、ノズル方式ではlIF!霧圧力低圧力変
化させることにより、所望の粒径のものを(9ることが
でき好ましい方法である。[Confucian Song Dynasty 1] Fine spherical porous silica is used for various purposes,
Depending on the application, a material with a large specific surface area and a large network pore volume may be required. Conventionally, as a method for producing spherical porous silica, for example, a method is known in which fine spherical particles are formed by spray-drying an alkali metal silicate, and then the particles are formed into a mold by adding an acid to the silica. According to this method, spherical particles are produced by spray drying, so by changing the conditions of the spray dryer, for example, the rotation speed of the disk in the case of a disk method, and the low pressure of the mist in the case of a nozzle method, the desired particle size can be obtained. This is the preferred method.
しかしながら、この方法では、一般的にj9られる球状
多孔質シリカの比表面積および期孔容清が小さいと言う
問題点がある。例えば、原料となるアルカリ金属ケイ酸
塩として、1弓ケイ酸カリウムを用いた場合には、比表
面積の大ぎいちのが(9られるがその場合でし、比表面
積は約400 nr 7′9程度のものが限度であった
。However, this method has the problem that the specific surface area and initial pore volume of the spherical porous silica, which is generally referred to as j9, are small. For example, when potassium silicate is used as the raw material alkali metal silicate, the specific surface area is approximately 400 nr 7'9. was the limit.
[発明の課題と解決手段]
本発明者は上記実情に鑑み、アルカリ金属ケイ酸塩の水
溶液を噴霧乾燥して得た球状粒子を酸処理して球状多孔
質シリカを製造する際に、比表面積および細孔容積の大
きい多孔質シリカを1qる方法につき種々検討した結果
、ある特定の条件下で酸処理を行なうことにより、本発
明の目的が達成されることを見い出し本発明を完成する
に至った。[Problems to be solved by the invention and means for solving the problem] In view of the above-mentioned circumstances, the present inventor has developed a method for producing spherical porous silica by acid-treating spherical particles obtained by spray-drying an aqueous solution of an alkali metal silicate. As a result of various studies on methods for preparing 1 q of porous silica having a large pore volume, the present inventors discovered that the object of the present invention can be achieved by acid treatment under certain specific conditions, leading to the completion of the present invention. Ta.
し発明の要旨〕
すなわち、本発明の要旨は、アルカリ金属ケイ酸塩水溶
液を噴霧乾燥することにより微細球状粒子をIn、次い
で、この粒子を酸処理した後、水洗。[Summary of the Invention] That is, the gist of the present invention is to spray dry an aqueous alkali metal silicate solution to obtain fine spherical particles with In, then to acid-treat the particles, and then to wash with water.
乾燥して球状多孔質シリカを製造する方法において、酸
処理を30℃以上の温度で実施することを特徴とする微
細球状多孔質シリカの製造法に存する。The present invention relates to a method for producing fine spherical porous silica by drying, characterized in that acid treatment is carried out at a temperature of 30° C. or higher.
[発明の構成] 以下、本発明の詳細な説明する。[Structure of the invention] The present invention will be explained in detail below.
本発明では先ず、アルカリ金属ケイ酸塩の水溶液を噴霧
乾燥するが、ここで対象となるアルカリ金属ケイ酸塩と
しては、通常、Si O2/Na 2Oモル比が4.8
以下、好ましくは2〜4.5のモル比10以下、好まし
くは3〜8のケイ酸リチウムが挙げられる。例えば、1
号〜4号ケイ酸す1ヘリウムどしてのJ■S規格品等が
利用できる。In the present invention, first, an aqueous solution of an alkali metal silicate is spray-dried, and the alkali metal silicate used here usually has a SiO2/Na2O molar ratio of 4.8.
Hereinafter, lithium silicate preferably has a molar ratio of 2 to 4.5 and 10 or less, preferably 3 to 8. For example, 1
J■S standard products such as No. 4 to No. 4 silicate 1 helium can be used.
このケイ酸塩の水溶液濃度は通常、5〜60重攪%に調
節される。噴霧乾燥は通常、常法に従って、回転ディス
ク方式及びノズル式の噴霧乾燥機を用い、ケイ酸塩水溶
液を入口温度100〜300℃、出口温度40〜200
’Cの温度においてスプレーすることにより実施される
。この乾燥98浬により、例えば、1〜500μm程度
に造粒された球状粒子を1qることができる。The concentration of this silicate aqueous solution is usually adjusted to 5 to 60% by weight. Spray drying is usually carried out using a rotating disk type and nozzle type spray dryer according to a conventional method, and the silicate aqueous solution is heated at an inlet temperature of 100 to 300°C and an outlet temperature of 40 to 200°C.
It is carried out by spraying at a temperature of 'C. By drying for 98 hours, it is possible to obtain, for example, 1 q of spherical particles granulated to a size of about 1 to 500 μm.
このようにして冑た球状粒子を次いで、酸処理するが、
ここで用いる酸としては、硫酸、塩酸。The thus deflated spherical particles are then treated with acid.
The acids used here include sulfuric acid and hydrochloric acid.
硝酸、リン酸などの無機酸及び、酢酸、シュウ酸などの
有は酸が挙げられる。この酸の濃度は通常、5〜30重
最%、好ましくは8〜20重量%の範囲が好適に用いら
れる。この酸処理は通常、酸水溶液に上述の球状粒子を
混合し、例えば、0.5〜5時間程度、撹拌処理するこ
とにより実施される。酸水溶液の使用借は当然のことな
がら、少なくとも処理する球状ケイ酸塩粒子中に含有さ
れるアルカリ成分の中和に要する化学量論以上、好まし
くは1.5倍以上が用いられる。Examples include inorganic acids such as nitric acid and phosphoric acid, and organic acids such as acetic acid and oxalic acid. The concentration of this acid is usually 5 to 30% by weight, preferably 8 to 20% by weight. This acid treatment is usually carried out by mixing the above-mentioned spherical particles in an acid aqueous solution and stirring the mixture for, for example, about 0.5 to 5 hours. Naturally, the acid aqueous solution used is at least 1.5 times the stoichiometric amount required to neutralize the alkaline component contained in the spherical silicate particles to be treated.
本発明においては、この酸処理の温度を30℃以上、好
ましくは40℃〜100℃、特に好ましくは50〜90
℃の温度で実施することを必須の要件とするものである
。すなわら、上記温度範囲にて実施することより、比表
面積及び細孔容積の大ぎい球状多孔質シリカを1qるこ
とができるのである。In the present invention, the temperature of this acid treatment is 30°C or higher, preferably 40°C to 100°C, particularly preferably 50 to 90°C.
It is an essential requirement that the test be carried out at a temperature of °C. In other words, by carrying out the process in the above temperature range, it is possible to produce 1q of spherical porous silica with a large specific surface area and pore volume.
酸処理を終えた混合物は例えば、フィルタープルス又は
遠心分l1lIlなどの手段により固液分離し、生成し
た微細球状多孔質シリカを分離する。分離した多孔質シ
リカは常法により、水洗及び乾燥して例えば、1〜50
0μmの粒径を有(る球状の離などの手段で付着する酸
や生成塩が除去されるよう実施され、また、乾燥は通常
、100〜200℃の湿度で数時間程度実施される。一
方、濾液は冷却晶析により、生成塩を析出回収すること
もできる。After the acid treatment, the mixture is subjected to solid-liquid separation using, for example, filter purus or centrifugation, and the resulting fine spherical porous silica is separated. The separated porous silica is washed with water and dried by a conventional method to give a
It is carried out to remove adhering acids and formed salts by means such as spherical separation with a particle size of 0 μm, and drying is usually carried out at a humidity of 100 to 200°C for several hours. The filtrate can also be subjected to cooling crystallization to precipitate and recover the produced salt.
[発明の効果1
本発明によれば、酸処理温度を高めるど苫う園めて簡単
な手段によって、比表面積および細孔容積の大きい微細
球状多孔質シリカを1qることができる。また、本発明
で19られる多孔質シリカ(:L、BET細孔径分布に
おいで、その細孔径の大半が50△以下と言う微細なし
のである。この球状多孔質シリカは例えば、クロマ1−
充填剤を始めとし、触媒担体、プラスチック充填剤、化
駐用品原料などとして、広い分野で利用することができ
る。[Effect of the Invention 1] According to the present invention, 1 q of fine spherical porous silica having a large specific surface area and a large pore volume can be produced by a simple method such as increasing the acid treatment temperature. In addition, in the present invention, the porous silica (:L) has a BET pore size distribution in which most of its pore diameters are 50△ or less.
It can be used in a wide range of fields, including fillers, catalyst carriers, plastic fillers, and raw materials for chemical parking products.
[実施例]
次に、本発明を実施例により更に詳細に説明するが、本
発明はその要旨を超えない限り、以下の実施例の記述に
限定されるものでない。[Examples] Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to the description of the following Examples unless it exceeds the gist thereof.
実施例1
3号ケイ酸ソーダの39.9wt%(MR3,10、粘
度225)水溶液を調製し、これを回転ディスク型噴霧
乾燥機において、乾燥することにより、平均粒径100
μmの粒子を1!P1次いで、この粒子500gを第1
表に示す温度において、10wt%rfl酸水溶液15
00m文中に撹拌下に混合し、引き続き同湿度で3時間
、撹拌することにより酸処理を行なった。Example 1 A 39.9 wt % (MR 3.10, viscosity 225) aqueous solution of No. 3 sodium silicate was prepared, and this was dried in a rotating disk type spray dryer to reduce the average particle size to 100.
1 μm particle! P1 Next, 500g of these particles were
At the temperature shown in the table, a 10 wt% rfl acid aqueous solution 15
The acid treatment was carried out by mixing the mixture under stirring for 3 hours at the same humidity and then stirring for 3 hours at the same humidity.
酸処・連接の混合物を濾過し、微細粒子を回収した後、
これを水洗し、更に、180℃の温度で2時間、電気乾
燥機で乾燥することにより、平均粒径100μmの微細
球状多孔質シリカを得た。After filtering the acid treatment/concatenation mixture and collecting fine particles,
This was washed with water and further dried in an electric dryer at a temperature of 180° C. for 2 hours to obtain fine spherical porous silica with an average particle size of 100 μm.
この多孔質シリカにつき、比表面積及び細孔容積を測定
したところ、第1表に示す通りの結果であった。When the specific surface area and pore volume of this porous silica were measured, the results were as shown in Table 1.
第 1 表
実施例2〜7
実施例1の方法において、第2表に示すケイ正塩を用い
、噴霧乾燥により得た球状粒子1309を第2表に示ず
10wt%硫酸の使用最及び撹拌時間で酸処理し、その
他は同様に処理した場合の結果を第2表に示す。Table 1 Examples 2 to 7 Spherical particles 1309 obtained by spray drying using the siliceous salt shown in Table 2 in the method of Example 1 were prepared using 10 wt% sulfuric acid and stirring time not shown in Table 2. Table 2 shows the results when the sample was treated with acid and the other treatments were carried out in the same manner.
Claims (2)
により微細球状粒子を得、次いで、この粒子を酸処理し
た後、水洗、乾燥して球状多孔質シリカを製造する方法
において、酸処理を30℃以上の温度で実施することを
特徴とする微細球状多孔質シリカの製造法。(1) A method for producing spherical porous silica by spray drying an aqueous alkali metal silicate solution to obtain fine spherical particles, then treating the particles with an acid, washing with water, and drying. A method for producing fine spherical porous silica, characterized in that it is carried out at a temperature of ℃ or higher.
特徴とする特許請求の範囲第(1)項記載の方法。(2) The method according to claim (1), characterized in that the acid treatment is carried out at a temperature of 40 to 100°C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27029685A JPS62128917A (en) | 1985-11-29 | 1985-11-29 | Production of fine spherical porous silica |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27029685A JPS62128917A (en) | 1985-11-29 | 1985-11-29 | Production of fine spherical porous silica |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62128917A true JPS62128917A (en) | 1987-06-11 |
| JPH053413B2 JPH053413B2 (en) | 1993-01-14 |
Family
ID=17484284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27029685A Granted JPS62128917A (en) | 1985-11-29 | 1985-11-29 | Production of fine spherical porous silica |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62128917A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006199566A (en) * | 2004-12-24 | 2006-08-03 | Fuji Kagaku Kk | Method for manufacturing soluble component-containing silica, soluble component-containing silicate and porous silica |
| JP2008184354A (en) * | 2007-01-30 | 2008-08-14 | New Industry Research Organization | Method of producing spherical silica gel particle |
| JP2011256098A (en) * | 2010-05-11 | 2011-12-22 | Jgc Catalysts & Chemicals Ltd | Method for producing silica-based particle, silica-based particle and application of the silica-based particle |
| JP2013095797A (en) * | 2011-10-28 | 2013-05-20 | Jgc Catalysts & Chemicals Ltd | Method for producing dye-including silica-based particle, dye-including silica-based particle, and use of the particle |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5031119A (en) * | 1973-07-23 | 1975-03-27 |
-
1985
- 1985-11-29 JP JP27029685A patent/JPS62128917A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5031119A (en) * | 1973-07-23 | 1975-03-27 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006199566A (en) * | 2004-12-24 | 2006-08-03 | Fuji Kagaku Kk | Method for manufacturing soluble component-containing silica, soluble component-containing silicate and porous silica |
| JP2008184354A (en) * | 2007-01-30 | 2008-08-14 | New Industry Research Organization | Method of producing spherical silica gel particle |
| JP2011256098A (en) * | 2010-05-11 | 2011-12-22 | Jgc Catalysts & Chemicals Ltd | Method for producing silica-based particle, silica-based particle and application of the silica-based particle |
| JP2013095797A (en) * | 2011-10-28 | 2013-05-20 | Jgc Catalysts & Chemicals Ltd | Method for producing dye-including silica-based particle, dye-including silica-based particle, and use of the particle |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH053413B2 (en) | 1993-01-14 |
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