JPS62177972A - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JPS62177972A JPS62177972A JP61018208A JP1820886A JPS62177972A JP S62177972 A JPS62177972 A JP S62177972A JP 61018208 A JP61018208 A JP 61018208A JP 1820886 A JP1820886 A JP 1820886A JP S62177972 A JPS62177972 A JP S62177972A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- gaas
- substrate
- gate electrode
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
- H10D30/6737—Thin-film transistors [TFT] characterised by the electrodes characterised by the electrode materials
- H10D30/6738—Schottky barrier electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/202—FETs having static field-induced regions, e.g. static-induction transistors [SIT] or permeable base transistors [PBT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/675—Group III-V materials, Group II-VI materials, Group IV-VI materials, selenium or tellurium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/64—Electrodes comprising a Schottky barrier to a semiconductor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/85—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
Landscapes
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61018208A JPS62177972A (ja) | 1986-01-31 | 1986-01-31 | 半導体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61018208A JPS62177972A (ja) | 1986-01-31 | 1986-01-31 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62177972A true JPS62177972A (ja) | 1987-08-04 |
| JPH0325030B2 JPH0325030B2 (2) | 1991-04-04 |
Family
ID=11965228
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61018208A Granted JPS62177972A (ja) | 1986-01-31 | 1986-01-31 | 半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62177972A (2) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006186336A (ja) * | 2004-11-30 | 2006-07-13 | Matsushita Electric Ind Co Ltd | 電界効果トランジスタ及びその製造方法 |
-
1986
- 1986-01-31 JP JP61018208A patent/JPS62177972A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006186336A (ja) * | 2004-11-30 | 2006-07-13 | Matsushita Electric Ind Co Ltd | 電界効果トランジスタ及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0325030B2 (2) | 1991-04-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3380313B2 (ja) | ダイヤモンド電界効果トランジスタ | |
| US5144409A (en) | Isotopically enriched semiconductor devices | |
| US6270573B1 (en) | Silicon carbide substrate, and method for producing the substrate, and semiconductor device utilizing the substrate | |
| JPH076950A (ja) | 電子、電光および光学的な構成要素に対する構造部品を作製する方法 | |
| US5030580A (en) | Method for producing a silicon carbide semiconductor device | |
| JP5542087B2 (ja) | ダイヤモンド半導体素子およびその製造方法 | |
| US5523588A (en) | Diamond film field effect transistor with self aligned source and drain regions | |
| US12278270B2 (en) | Methods of manufacturing semiconductor devices | |
| US5142350A (en) | Transistor having cubic boron nitride layer | |
| US5232862A (en) | Method of fabricating a transistor having a cubic boron nitride layer | |
| US4550031A (en) | Control of Si doping in GaAs, (Al,Ga)As and other compound semiconductors during MBE growth | |
| JPH0770695B2 (ja) | 炭化珪素半導体装置の製造方法 | |
| US5081053A (en) | Method for forming a transistor having cubic boron nitride layer | |
| JP2793837B2 (ja) | 半導体装置の製造方法およびヘテロ接合バイポーラトランジスタ | |
| JPH08316164A (ja) | 半導体素子の作成方法 | |
| JP3438116B2 (ja) | 化合物半導体装置及びその製造方法 | |
| JPS59188978A (ja) | シヨツトキゲ−ト型fetの製造方法 | |
| JP3269510B2 (ja) | 半導体素子 | |
| JPH05117088A (ja) | ダイヤモンドのn型及びp型の形成方法 | |
| JPH0325030B2 (2) | ||
| JP2615406B2 (ja) | 炭化珪素埋め込み層を有するシリコン基板の製造方法 | |
| JPH0573353B2 (2) | ||
| JPS6339110B2 (2) | ||
| JPH02219244A (ja) | 電界効果トランジスタ及びその製造方法 | |
| JPH05343322A (ja) | 化合物半導体結晶層形成法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |