JPS6217851B2 - - Google Patents
Info
- Publication number
- JPS6217851B2 JPS6217851B2 JP56006685A JP668581A JPS6217851B2 JP S6217851 B2 JPS6217851 B2 JP S6217851B2 JP 56006685 A JP56006685 A JP 56006685A JP 668581 A JP668581 A JP 668581A JP S6217851 B2 JPS6217851 B2 JP S6217851B2
- Authority
- JP
- Japan
- Prior art keywords
- spinner
- glass substrate
- photoresist
- resist coating
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56006685A JPS57121227A (en) | 1981-01-20 | 1981-01-20 | Resist applying device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56006685A JPS57121227A (en) | 1981-01-20 | 1981-01-20 | Resist applying device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57121227A JPS57121227A (en) | 1982-07-28 |
| JPS6217851B2 true JPS6217851B2 (2) | 1987-04-20 |
Family
ID=11645205
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56006685A Granted JPS57121227A (en) | 1981-01-20 | 1981-01-20 | Resist applying device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57121227A (2) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6467135A (en) * | 1987-08-03 | 1989-03-13 | Rubbermaid Inc | Automatic water-supply planter |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4674724A (en) * | 1982-08-03 | 1987-06-23 | Future Apparatus Corporation | Collapsible stand especially for books |
| JPH02249225A (ja) * | 1989-03-22 | 1990-10-05 | Fujitsu Ltd | レジスト塗布装置 |
| DE4024642A1 (de) * | 1990-08-03 | 1992-02-06 | Ibm | Schleuderteller fuer substrate |
| JP2649219B2 (ja) * | 1995-05-01 | 1997-09-03 | ホーヤ株式会社 | スピンチャックおよび処理液塗布方法 |
| CN108996468B (zh) * | 2018-06-29 | 2020-10-09 | 中国石油天然气股份有限公司 | 微米级玻璃刻蚀模型的封装方法及设备 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS584587B2 (ja) * | 1977-06-14 | 1983-01-27 | 松下電器産業株式会社 | 回転式粘性剤塗布方法およびその装置 |
| JPS5472973A (en) * | 1977-11-24 | 1979-06-11 | Hitachi Ltd | Rotary applying unit |
-
1981
- 1981-01-20 JP JP56006685A patent/JPS57121227A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6467135A (en) * | 1987-08-03 | 1989-03-13 | Rubbermaid Inc | Automatic water-supply planter |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57121227A (en) | 1982-07-28 |
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