JPS62245245A - スチレン系共重合体を成分とするレジスト - Google Patents

スチレン系共重合体を成分とするレジスト

Info

Publication number
JPS62245245A
JPS62245245A JP8823386A JP8823386A JPS62245245A JP S62245245 A JPS62245245 A JP S62245245A JP 8823386 A JP8823386 A JP 8823386A JP 8823386 A JP8823386 A JP 8823386A JP S62245245 A JPS62245245 A JP S62245245A
Authority
JP
Japan
Prior art keywords
copolymer
formulas
resist
iii
repeating units
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8823386A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0455502B2 (2
Inventor
Nobufumi Atoda
阿刀田　伸史
Tadashi Niwa
丹羽　正
Masayuki Kato
雅之 加藤
Yoshio Taguchi
田口　芳夫
Kazuhiro Imai
今井　千裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tonen General Sekiyu KK
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Toa Nenryo Kogyyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Toa Nenryo Kogyyo KK filed Critical Agency of Industrial Science and Technology
Priority to JP8823386A priority Critical patent/JPS62245245A/ja
Publication of JPS62245245A publication Critical patent/JPS62245245A/ja
Publication of JPH0455502B2 publication Critical patent/JPH0455502B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP8823386A 1986-04-18 1986-04-18 スチレン系共重合体を成分とするレジスト Granted JPS62245245A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8823386A JPS62245245A (ja) 1986-04-18 1986-04-18 スチレン系共重合体を成分とするレジスト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8823386A JPS62245245A (ja) 1986-04-18 1986-04-18 スチレン系共重合体を成分とするレジスト

Publications (2)

Publication Number Publication Date
JPS62245245A true JPS62245245A (ja) 1987-10-26
JPH0455502B2 JPH0455502B2 (2) 1992-09-03

Family

ID=13937146

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8823386A Granted JPS62245245A (ja) 1986-04-18 1986-04-18 スチレン系共重合体を成分とするレジスト

Country Status (1)

Country Link
JP (1) JPS62245245A (2)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61275746A (ja) * 1985-05-31 1986-12-05 Toa Nenryo Kogyo Kk スチレン系重合体を成分とするレジスト
JPS62209528A (ja) * 1986-03-11 1987-09-14 Asahi Chem Ind Co Ltd 新規なるレジスト材料

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61275746A (ja) * 1985-05-31 1986-12-05 Toa Nenryo Kogyo Kk スチレン系重合体を成分とするレジスト
JPS62209528A (ja) * 1986-03-11 1987-09-14 Asahi Chem Ind Co Ltd 新規なるレジスト材料

Also Published As

Publication number Publication date
JPH0455502B2 (2) 1992-09-03

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term