JPS6229785B2 - - Google Patents

Info

Publication number: JPS6229785B2
Authority: JP; Japan
Prior art keywords: exposure; deep ultraviolet; light source; lamp; irradiation
Prior art date: 1979-12-05
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

JP54157687A

Other languages

English (en)

Japanese (ja)

Other versions

JPS5680043A (en

Inventor

Hitoshi Ito

Katsumi Mori

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

NEC Corp

Original Assignee

Nippon Electric Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1979-12-05

Filing date

1979-12-05

Publication date

1987-06-29

1979-12-05 Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd

1979-12-05 Priority to JP15768779A priority Critical patent/JPS5680043A/ja

1981-07-01 Publication of JPS5680043A publication Critical patent/JPS5680043A/ja

1987-06-29 Publication of JPS6229785B2 publication Critical patent/JPS6229785B2/ja

Status Granted legal-status Critical Current

Links

238000000034 method Methods 0.000 claims description 14
229910052724 xenon Inorganic materials 0.000 claims description 13
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 12
238000009826 distribution Methods 0.000 description 7
230000003595 spectral effect Effects 0.000 description 7
229920003229 poly(methyl methacrylate) Polymers 0.000 description 6
239000004926 polymethyl methacrylate Substances 0.000 description 6
YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 4
238000001816 cooling Methods 0.000 description 4
229910052805 deuterium Inorganic materials 0.000 description 4
230000018109 developmental process Effects 0.000 description 4
238000010894 electron beam technology Methods 0.000 description 4
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
-1 PMIPK Substances 0.000 description 2
238000010586 diagram Methods 0.000 description 2
230000000694 effects Effects 0.000 description 2
239000007789 gas Substances 0.000 description 2
238000005520 cutting process Methods 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
230000001678 irradiating effect Effects 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
229910052753 mercury Inorganic materials 0.000 description 1
239000011259 mixed solution Substances 0.000 description 1
239000012299 nitrogen atmosphere Substances 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
229920002189 poly(glycerol 1-O-monomethacrylate) polymer Polymers 0.000 description 1
239000010453 quartz Substances 0.000 description 1
230000005855 radiation Effects 0.000 description 1
230000007261 regionalization Effects 0.000 description 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
150000003736 xenon Chemical class 0.000 description 1

Landscapes

Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

JP15768779A 1979-12-05 1979-12-05 Far ultraviolet exposing method Granted JPS5680043A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP15768779A JPS5680043A (en)	1979-12-05	1979-12-05	Far ultraviolet exposing method

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP15768779A JPS5680043A (en)	1979-12-05	1979-12-05	Far ultraviolet exposing method

Publications (2)

Publication Number	Publication Date
JPS5680043A JPS5680043A (en)	1981-07-01
JPS6229785B2 true JPS6229785B2 (fr)	1987-06-29

Family

ID=15655186

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP15768779A Granted JPS5680043A (en)	1979-12-05	1979-12-05	Far ultraviolet exposing method

Country Status (1)

Country	Link
JP (1)	JPS5680043A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH01160359A (ja) *	1987-12-16	1989-06-23	Fuji Electric Co Ltd	直流・直流変換装置の制御方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH09193249A (ja) *	1995-08-15	1997-07-29	Dainippon Ink & Chem Inc	ディスクの貼り合わせ方法及び装置

1979
- 1979-12-05 JP JP15768779A patent/JPS5680043A/ja active Granted

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH01160359A (ja) *	1987-12-16	1989-06-23	Fuji Electric Co Ltd	直流・直流変換装置の制御方法

Also Published As

Publication number	Publication date
JPS5680043A (en)	1981-07-01

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