JPS6233320Y2 - - Google Patents

Info

Publication number
JPS6233320Y2
JPS6233320Y2 JP10692482U JP10692482U JPS6233320Y2 JP S6233320 Y2 JPS6233320 Y2 JP S6233320Y2 JP 10692482 U JP10692482 U JP 10692482U JP 10692482 U JP10692482 U JP 10692482U JP S6233320 Y2 JPS6233320 Y2 JP S6233320Y2
Authority
JP
Japan
Prior art keywords
valve plate
sealing valve
wafer
arm
airtight container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10692482U
Other languages
Japanese (ja)
Other versions
JPS5911445U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10692482U priority Critical patent/JPS5911445U/en
Publication of JPS5911445U publication Critical patent/JPS5911445U/en
Application granted granted Critical
Publication of JPS6233320Y2 publication Critical patent/JPS6233320Y2/ja
Granted legal-status Critical Current

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  • Drying Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Description

【考案の詳細な説明】 本考案は気密容器を使用する半導体気相成長装
置、エツチング装置、拡散装置等の半導体製造装
置に係り、特に気密容器のウエーハ導入用開口を
開閉する密閉用弁板と、気密容器内、外部にそれ
ぞれ設けられ、密閉用弁板の開時に、ウエーハを
ウエーハ導入用開口を通して搬送するための内、
外部ウエーハ搬送機構とを備えた半導体製造装置
に関する。
[Detailed description of the invention] The present invention relates to semiconductor manufacturing equipment such as semiconductor vapor phase growth equipment, etching equipment, and diffusion equipment that uses an airtight container, and particularly relates to a sealing valve plate that opens and closes the wafer introduction opening of the airtight container. , provided inside and outside the airtight container, respectively, for transporting the wafer through the wafer introduction opening when the sealing valve plate is opened;
The present invention relates to a semiconductor manufacturing apparatus equipped with an external wafer transport mechanism.

従来のこのような半導体製造装置においては、
密閉用弁板の開閉時に、弁板とウエーハ搬送機構
との機械的干渉による部品の破損を避けるため、
一方のウエーハ搬送機構を逃がしておき、逃げた
ことを確認してから弁板を動作させるように構成
していたが、このような構成では弁板用とウエー
ハ搬送機構用の二系統の駆動源を必要とし、又、
自動化の場合、センサーも又二系統必要であり、
両者間のインターロツク機構も必要であるなど複
雑であり、一方の駆動源やセンサーが不良である
場合には部品を破損させる恐れがあり、信頼性に
欠ける欠点があつた。
In such conventional semiconductor manufacturing equipment,
To avoid damage to parts due to mechanical interference between the valve plate and the wafer transport mechanism when opening and closing the sealing valve plate,
The configuration was such that one of the wafer transport mechanisms was released, and the valve plate was operated only after confirming that the wafer transport mechanism had escaped, but in this configuration, two drive sources were used, one for the valve plate and one for the wafer transport mechanism. and also,
In the case of automation, two systems of sensors are also required,
It is complicated and requires an interlock mechanism between the two, and if one of the drive sources or sensors is defective, there is a risk of damage to the parts, resulting in a lack of reliability.

本考案は前記の欠点を解消するためになされた
ものであつて、弁板とウエーハ搬送機構を1つの
駆動源のみで作動させ、機械的干渉による部品の
破損を防止するとともに、センサーを一系統と
し、自動化も容易に達成できるようにした半導体
製造装置を提供することを目的とする。
The present invention was developed to eliminate the above-mentioned drawbacks, and it operates the valve plate and wafer transport mechanism with only one drive source, prevents damage to parts due to mechanical interference, and integrates a single system of sensors. The purpose of the present invention is to provide a semiconductor manufacturing equipment that can be easily automated.

以下上記の目的を達成する本考案を図面に示す
一実施例について説明する。
An embodiment of the present invention that achieves the above object will be described below, as shown in the drawings.

図面は本考案の一実施例の要部を示す側断面図
で、まずその構成を説明すると、1は気密容器、
11はそのウエーハ導入用開口、7はこのウエー
ハ導入用開口11を開閉する密閉用弁板、10は
気密容器1内を気密に保持するためのOリング、
2,3はそれぞれ気密容器1の内、外部に設けら
れた内、外側ウエーハ搬送機構である。内、外側
ウエーハ搬送機構2,3としては例えばエアトラ
ツクを用いることができる。
The drawing is a side sectional view showing the main parts of an embodiment of the present invention. First, the structure will be explained. 1 is an airtight container;
11 is an opening for introducing the wafer; 7 is a sealing valve plate for opening and closing the wafer introducing opening 11; 10 is an O-ring for keeping the inside of the airtight container 1 airtight;
Reference numerals 2 and 3 denote inner and outer wafer transport mechanisms provided inside and outside the airtight container 1, respectively. For example, air trucks can be used as the inner and outer wafer transport mechanisms 2 and 3.

9は回動規制バネで、図例ではバネ蝶番の場合
を示しているが、バネ付き蝶番の如きものでもよ
い。
Reference numeral 9 denotes a rotation regulating spring, and although a spring hinge is shown in the illustrated example, a spring-loaded hinge may also be used.

4は気密容器1の外部において固定部13に中
央部を枢支軸5により回動自在に枢支した、くの
字形のアームで、7はこのアーム4の先端部にピ
ン、軸、ネジ等の結合手段6により結合した密閉
用弁板である。8はアーム4の先端に枢着したコ
ロで、外側ウエーハ搬送機構3との接触を滑らか
にするためのものである。
4 is a dogleg-shaped arm whose central part is rotatably supported on a fixed part 13 by a pivot shaft 5 on the outside of the airtight container 1, and 7 is a pin, shaft, screw, etc. at the tip of this arm 4. This is a sealing valve plate connected by a connecting means 6. Reference numeral 8 denotes a roller pivotally attached to the tip of the arm 4 for smooth contact with the outer wafer transport mechanism 3.

そして密閉用弁板7の開時に固定部12の側面
に外側搬送機構3の端面が当接して内、外側搬送
機構2,3の一直線状態が確保され、かつ密閉用
弁板7の閉時にはアーム4に枢着したコロ8で外
側搬送機構3がバネ力に抗して持ち上げられるよ
うに外側搬送機構3を固定部12にバネ蝶番9で
連接せしめてある。
When the sealing valve plate 7 is opened, the end face of the outer conveyance mechanism 3 comes into contact with the side surface of the fixed part 12, ensuring that the inner and outer conveyance mechanisms 2 and 3 are in a straight line, and when the sealing valve plate 7 is closed, the arm The outer conveying mechanism 3 is connected to the fixing part 12 by a spring hinge 9 so that the outer conveying mechanism 3 can be lifted up against the spring force by a roller 8 pivotally connected to the outer conveying mechanism 3.

次に上記の如き構成の本考案の動作を説明す
る。いま、アーム4及び弁板7が仮想線で示す開
の位置にあり、外側ウエーハ搬送機構3が蝶番9
のバネ力により仮想線で示すように内側ウエーハ
搬送機構2に対し一直線状になる位置にあるとす
る。このような状態においてアーム4を枢支軸5
を中心に矢印Aで示す時計方向に回動すると、弁
板7がC矢印で示す時計方向に回動して実線で示
すように気密容器1の外側面にOリング10を介
して押付けられ、ウエーハ導入用開口11が閉じ
られる。これと同時に外側ウエーハ搬送機構3が
アーム4のコロ8によつて蝶番9のバネ力に抗し
て押されて矢印Fで示す反時計方向に回動し、実
線の状態になる。そこで気密容器1内を減圧する
と、弁板7が増々気密容器1の外側面にOリング
10を介して押付けられ、ウエーハ導入用開口1
1が密閉されて気密状態を保持することになる。
Next, the operation of the present invention configured as described above will be explained. Now, the arm 4 and the valve plate 7 are in the open position shown by the imaginary line, and the outer wafer transport mechanism 3 is in the hinge 9
Assume that the spring force causes the wafer to be in a straight line with respect to the inner wafer transport mechanism 2 as shown by the imaginary line. In this state, the arm 4 is connected to the pivot shaft 5.
When the valve plate 7 rotates clockwise as indicated by arrow A around , the valve plate 7 rotates clockwise as indicated by arrow C and is pressed against the outer surface of the airtight container 1 via the O-ring 10 as indicated by the solid line. The wafer introduction opening 11 is closed. At the same time, the outer wafer transport mechanism 3 is pushed by the rollers 8 of the arm 4 against the spring force of the hinge 9, and rotates in the counterclockwise direction shown by arrow F, so that it is in the state shown by the solid line. Therefore, when the pressure inside the airtight container 1 is reduced, the valve plate 7 is increasingly pressed against the outer surface of the airtight container 1 via the O-ring 10, and the wafer introduction opening 1
1 will be sealed and maintain an airtight state.

次に気密容器1内を大気圧に戻してアーム4を
枢支軸5を中心に矢印Bで示す反時計方向に弁板
7による実線の閉状態より仮想線の開状態になる
まで回動すると、弁板7がD矢印で示す反時計方
向に回動して実線の閉状態より仮想線の開状態に
なる。これと同時にアーム4のコロ8に対接して
いた外側ウエーハ搬送機構3は、アーム4のB矢
印で示す反時計方向に蝶番9のバネ力と外側ウエ
ーハ搬送機構3の自重によつてG矢印で示す時計
方向に回動し、仮想線の状態に復帰する。
Next, the inside of the airtight container 1 is returned to atmospheric pressure and the arm 4 is rotated about the pivot shaft 5 in the counterclockwise direction shown by the arrow B until the valve plate 7 changes from the closed state shown by the solid line to the open state shown by the imaginary line. , the valve plate 7 rotates in the counterclockwise direction indicated by arrow D, changing from the closed state shown by the solid line to the open state shown by the imaginary line. At the same time, the outer wafer transport mechanism 3, which was in contact with the rollers 8 of the arm 4, is moved counterclockwise as shown by the arrow G by the spring force of the hinge 9 and the own weight of the outer wafer transport mechanism 3. Rotate clockwise as shown and return to the state shown by the imaginary line.

この復帰状態では、外側ウエーハ搬送機構3は
内側ウエーハ搬送機構2に対し一直線状となつて
連通した状態に蝶番9によつて確保され、気密容
器1の内部で例えば気相成長されたり、エツチン
グされたり、あるいは拡散処理されたりしたウエ
ーハをこれらのウエーハ搬送機構2,3によつて
外部に搬出したり、逆に外部より未処理のウエー
ハを処理すべく気密容器1の内部に搬入したりす
ることができる。
In this return state, the outer wafer transport mechanism 3 is secured by the hinge 9 in a state in which the outer wafer transport mechanism 3 is in a straight line and communicated with the inner wafer transport mechanism 2. wafers that have been processed or have been subjected to diffusion processing are transported to the outside by these wafer transport mechanisms 2 and 3, and conversely, unprocessed wafers are transported from the outside into the airtight container 1 for processing. I can do it.

この実施例では回動規制バネ9としてバネ蝶番
を用いた例を説明したが、バネ付き蝶番を用いて
も同様に説明できることは明らかである。
In this embodiment, an example in which a spring hinge is used as the rotation regulating spring 9 has been described, but it is clear that the same explanation can be made using a hinge with a spring.

以上の説明より明らかなように本考案によれ
ば、弁板7の開閉動作と外側ウエーハ搬送機構3
の逃げ動作をアーム4の回動操作だけで行えるよ
うに構成したので、弁板7と外側ウエーハ搬送
機構3の動作を1つの駆動源で行うことができ、
装置を簡単にできる。弁板7と外側ウエーハ搬
送機構3の動作が機械的に同期しているため、機
械的干渉による部品の破損を防止でき安全であ
る。センサーを弁板7用と外側ウエーハ搬送機
構3用の二系統とする必要はなく一系統でよいた
め、両者間のインターロツク機構も必要なくな
り、構成が簡単で信頼性が向上し、自動化も容易
に達成できる等の効果がある。
As is clear from the above explanation, according to the present invention, the opening/closing operation of the valve plate 7 and the outer wafer transport mechanism 3
Since the escape operation can be performed only by rotating the arm 4, the operation of the valve plate 7 and the outer wafer transport mechanism 3 can be performed with a single drive source.
Equipment can be easily constructed. Since the operations of the valve plate 7 and the outer wafer transport mechanism 3 are mechanically synchronized, damage to parts due to mechanical interference can be prevented, resulting in safety. There is no need to use two systems of sensors, one for the valve plate 7 and the other for the outer wafer transport mechanism 3, but only one system, so there is no need for an interlock mechanism between the two, making the configuration simple, improving reliability, and facilitating automation. There are effects such as being able to achieve this.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本考案の一実施例の要部を示す側断面図
である。 1……気密容器、2,3……内、外側ウエーハ
搬送機構、4……アーム、5……枢支軸、6……
結合手段、7……密閉用弁板、8……コロ(部
材)、9……バネ蝶番(回動規制バネ)、11……
ウエーハ導入用開口、12,13……固定部。
The drawing is a side sectional view showing a main part of an embodiment of the present invention. 1... Airtight container, 2, 3... Inner and outer wafer transfer mechanisms, 4... Arm, 5... Pivot shaft, 6...
Connection means, 7... Sealing valve plate, 8... Roller (member), 9... Spring hinge (rotation regulating spring), 11...
Wafer introduction opening, 12, 13... fixing part.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 気密容器1のウエーハ導入用開口11を開閉す
る密閉用弁板7と、気密容器内、外部にそれぞれ
設けられ、密閉用弁板の開時に、ウエーハをウエ
ーハ導入用開口を通して搬送するための内、外側
ウエーハ搬送機構2,3とを備えた半導体製造装
置において、前記密閉用弁板7を、気密容器外で
回動自在に枢支したアーム4に結合し、このアー
ム4の一部に部材8を取付けると共に、密閉用弁
板7の開時に固定部12の側面に外側搬送機構3
の一部が当接して内、外側搬送機構2,3の一直
線状態が確保され、かつ密閉用弁板7の閉時には
アーム4に取付けた部材8で外側搬送機構3がバ
ネ力に抗して持ち上げられるように外側搬送機構
3を固定部12に回動規制バネ9で連接せしめて
なる半導体製造装置。
A sealing valve plate 7 that opens and closes the wafer introduction opening 11 of the airtight container 1; and a sealing valve plate 7 provided inside and outside the airtight container to transport the wafer through the wafer introduction opening when the sealing valve plate is opened. In a semiconductor manufacturing apparatus equipped with outer wafer transport mechanisms 2 and 3, the sealing valve plate 7 is coupled to an arm 4 rotatably supported outside the airtight container, and a member 8 is attached to a part of this arm 4. At the same time, when the sealing valve plate 7 is opened, the outer conveying mechanism 3 is attached to the side of the fixed part 12.
A part of the inner and outer conveyance mechanisms 2 and 3 are in contact with each other to ensure a straight line state, and when the sealing valve plate 7 is closed, a member 8 attached to the arm 4 allows the outer conveyance mechanism 3 to resist the spring force. A semiconductor manufacturing apparatus in which an outer transport mechanism 3 is connected to a fixed part 12 by a rotation regulating spring 9 so as to be lifted up.
JP10692482U 1982-07-14 1982-07-14 semiconductor manufacturing equipment Granted JPS5911445U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10692482U JPS5911445U (en) 1982-07-14 1982-07-14 semiconductor manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10692482U JPS5911445U (en) 1982-07-14 1982-07-14 semiconductor manufacturing equipment

Publications (2)

Publication Number Publication Date
JPS5911445U JPS5911445U (en) 1984-01-24
JPS6233320Y2 true JPS6233320Y2 (en) 1987-08-26

Family

ID=30250025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10692482U Granted JPS5911445U (en) 1982-07-14 1982-07-14 semiconductor manufacturing equipment

Country Status (1)

Country Link
JP (1) JPS5911445U (en)

Also Published As

Publication number Publication date
JPS5911445U (en) 1984-01-24

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