JPS6235594A - Flexible circuit board and its manufacturing method - Google Patents
Flexible circuit board and its manufacturing methodInfo
- Publication number
- JPS6235594A JPS6235594A JP17467385A JP17467385A JPS6235594A JP S6235594 A JPS6235594 A JP S6235594A JP 17467385 A JP17467385 A JP 17467385A JP 17467385 A JP17467385 A JP 17467385A JP S6235594 A JPS6235594 A JP S6235594A
- Authority
- JP
- Japan
- Prior art keywords
- fine particles
- base material
- metal fine
- paste layer
- paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000002184 metal Substances 0.000 claims description 42
- 229910052751 metal Inorganic materials 0.000 claims description 42
- 239000000463 material Substances 0.000 claims description 29
- 239000010419 fine particle Substances 0.000 claims description 22
- 238000007772 electroless plating Methods 0.000 claims description 17
- 238000000576 coating method Methods 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 15
- 238000007747 plating Methods 0.000 claims description 15
- 229920006254 polymer film Polymers 0.000 claims description 6
- 238000005498 polishing Methods 0.000 claims description 5
- 239000011342 resin composition Substances 0.000 claims description 5
- 238000004898 kneading Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000003475 lamination Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000004161 brilliant blue FCF Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000005001 laminate film Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacturing Of Printed Wiring (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明はフレキシブル回路基板とそのE133方法に
関し、詳しくは電気回路がフレキシブルの基板にプリン
ト形成されたフレキシブル回路基板と、その製造方法に
係わるものである。[Detailed Description of the Invention] (Industrial Application Field) This invention relates to a flexible circuit board and an E133 method thereof, and more specifically to a flexible circuit board in which an electric circuit is printed on a flexible board, and a method for manufacturing the same. It is.
〈従来の技術)
従来、フレキシブル回路基板のフィルム基板はポリイミ
ドやポリエステル樹脂のフィルムと、銅箔とを熱硬化性
の樹脂接着剤を介してラミネートしたラミネートフィル
ムが用いられ、ラミネートフィルムの銅箔をエツチング
処理して回路となる導体パターンを形成してフレキシブ
ル回路基板を得ている。しかしながら、従来のフィルム
基材は銅箔とフィルムとの良好なラミネートが重要であ
リ、このラミネー1へ処理が厄介な工程のためコスト高
となり、また、従来の無電解めっき法では基材にめっき
触媒付与工程を必要とし、工程数の増加によりコスト高
を1i3 <問題があった。<Conventional technology> Conventionally, the film substrate of a flexible circuit board is a laminate film in which a polyimide or polyester resin film and copper foil are laminated with a thermosetting resin adhesive. A flexible circuit board is obtained by etching to form a conductor pattern that becomes a circuit. However, for conventional film base materials, it is important to have good lamination between copper foil and film, and the process of processing this lamination 1 is complicated, resulting in high costs. A plating catalyst application step was required, and the increase in the number of steps resulted in a problem of high costs.
(発明が解決しようとする問題点)
この発明は前記した従来の問題点を解決しようとしたも
のであって、従来における厄介なラミネート処理工程の
省略により工程数J3よびめっき触媒核付与工程を簡略
化し得て製作し易くなし、従来よりもコストダウンする
ことができるフレキシブル回路基板およびフレキシブル
回路基板の製造方法を提供することにある。(Problems to be Solved by the Invention) This invention attempts to solve the above-mentioned conventional problems, and by omitting the conventional troublesome lamination process, the number of steps J3 and the plating catalyst nucleation process are simplified. It is an object of the present invention to provide a flexible circuit board and a method for manufacturing the flexible circuit board, which can be easily manufactured and manufactured at a lower cost than before.
(問題点を解決するための手段)
上記問題点を解決するために、フレキシブル回路基板と
なす第1発明の手段は、
絶縁性ポリマーのフィルム基材と、
金属微粒子と樹脂組成物とが混練されたペーストをその
金属微粒子が表面に露出するように前記基材上の回路パ
ターン形成部分に塗着したペースト層と、
前記金属微粒子をめっき核として無電解めっきにより前
記回路パターン形成部分に設けた導電性金属被膜と、
よりなる構造にしたものである。そしてフレキシブル回
路基板を得る第2発明の手段は、金属微粒子と樹脂組成
物とを混練してなるペーストを、絶縁性ポリマーのフィ
ルム基材上の回路パターン形成部分に塗布し、ペースト
層を形成する工程と、
前記ペースト層上を研摩し、前記金属微粒子をベースl
−ff1表面に露出せしめる工程と、前記金属微粒子を
めっき核として無電解めっきにより前記回路パターン形
成部分に導電性金属被膜を析出せしめる工程と、
よりなるものとされる。前記した絶縁性ポリマーのフィ
ルム基材はポリサルフオン、ポリエーテルサルフオン、
ポリエーテルエーテルケトン、ポリエーテルイミド、ポ
リイミドなどのフレキシブルでかつ絶縁性を有するポリ
マーフィルムが用いられる。ペーストに混合する金属微
粒子は銀、銅。(Means for Solving the Problems) In order to solve the above problems, the means of the first invention, which is a flexible circuit board, is comprised of an insulating polymer film base material, metal fine particles, and a resin composition kneaded together. a paste layer in which a paste is applied to the circuit pattern forming part on the base material so that the metal fine particles are exposed on the surface; and a conductive layer provided on the circuit pattern forming part by electroless plating using the metal fine particles as plating nuclei. It has a structure consisting of a magnetic metal coating and The means of the second invention for obtaining a flexible circuit board is to apply a paste made by kneading metal fine particles and a resin composition to a circuit pattern forming portion on an insulating polymer film base material to form a paste layer. a step of polishing the paste layer and adding the metal fine particles to the base layer;
- ff1 is exposed on the surface; and a step of depositing a conductive metal film on the circuit pattern forming portion by electroless plating using the metal fine particles as plating nuclei. The above-mentioned insulating polymer film base materials include polysulfon, polyethersulfon,
A flexible and insulating polymer film such as polyetheretherketone, polyetherimide, polyimide, etc. is used. The metal particles mixed into the paste are silver and copper.
ニッケルなどの球状あるいは鱗片状などの微粒子が使用
される。Spherical or scale-like fine particles of nickel or the like are used.
導電性金属被膜は無電解めっき液の組゛成、液温。The conductive metal coating depends on the composition of the electroless plating solution and the temperature of the solution.
処理時間のコントロールにより所定厚さのものとされる
。A predetermined thickness is achieved by controlling the processing time.
(発明の作用)
第1発明において、導電性金属被膜は回路パターン形成
部分に塗着したペースト層表面の金属微粒子を介して無
電解めっきにより析出形成され、ペースト層と同じパタ
ーンに形成される。フィルム基材は絶縁性であり、導電
性金属被膜の部分が電気回路とされる。(Function of the Invention) In the first invention, the conductive metal film is deposited by electroless plating via metal fine particles on the surface of the paste layer applied to the circuit pattern forming portion, and is formed in the same pattern as the paste layer. The film base material is insulative, and the conductive metal coating is used as an electric circuit.
第2発明において、フィルム基材には回路パターン状に
硬質のペースト層が塗着され、ペースト層上には導電性
金属被膜が形成される。導電性金属被膜はペースト層表
面の露出した金属微粒子をめっき触媒核として無電解め
っき液の金属成分を析出固着させ、生長させることによ
りペースト層と同じパターンに形成される。In the second invention, a hard paste layer is applied to the film base material in the form of a circuit pattern, and a conductive metal coating is formed on the paste layer. The conductive metal film is formed in the same pattern as the paste layer by depositing and fixing the metal component of the electroless plating solution using the metal fine particles exposed on the surface of the paste layer as plating catalyst nuclei and growing.
(実施例) 以下に、本発明の一実施例を図面を参照して説明する。(Example) An embodiment of the present invention will be described below with reference to the drawings.
厚さ0.2mのポリサルフオンのフィルム基材1は所定
形状に截所されていて回路パターンPとなる所定部位に
は上下両面の回路パターンPを接続するための貫孔2〜
2が形成されている。フィルム基材1の片面には各貫孔
2〜2が所定位置となるように所定の回路パターンPの
形状に下塗り用のペースト3Aが印刷により塗着される
。前記ペースト3は金属微粒子4と軟質の樹脂組成物と
を混練してなるペースト状のものであり、本例では径約
0.2μmの球状の銀微粒子を72%含有するエポキシ
樹脂と高沸点のアルコール系溶剤を混合したペースト3
△を用いた。ペースト3Aは付着性良好であり、フィル
ム基材1面およびn孔2〜2の内部側にも塗着される。A polysulfon film base material 1 with a thickness of 0.2 m is cut into a predetermined shape, and through holes 2 to 2 are formed in predetermined portions that will become the circuit patterns P for connecting the circuit patterns P on both the upper and lower surfaces.
2 is formed. On one side of the film base material 1, an undercoating paste 3A is applied by printing in the shape of a predetermined circuit pattern P so that each of the through holes 2 to 2 is in a predetermined position. The paste 3 is a paste made by kneading metal fine particles 4 and a soft resin composition, and in this example, it is made of an epoxy resin containing 72% of spherical silver particles with a diameter of about 0.2 μm and a high boiling point epoxy resin. Paste 3 mixed with alcohol solvent
△ was used. The paste 3A has good adhesion and is applied to one surface of the film base material and also to the inside of the n-holes 2 and 2.
ペースト3Aを塗着したフィルム基材1は加熱室に移し
150℃で20分間加熱してペースト3Aを硬化させて
硬質のペースト層3となす。次いでフィルム基材1のペ
ースト層3の上面には薬液浸漬による化学研摩、あるい
は機械研摩による研摩処理を施し、ペースト層3の表面
に金属微粒子4〜4を露出せしめる。しかる後、ペース
ト層3を有するフィルム基材1は無電解めっき液(化学
めっき液)Mに浸してペースト層3表面の金属微粒子4
〜4をめっき触媒核として無電解めっき(化学めっぎ)
を行ない導電性の金属被膜5を形成する。The film base material 1 coated with the paste 3A is transferred to a heating chamber and heated at 150° C. for 20 minutes to harden the paste 3A and form a hard paste layer 3. Next, the upper surface of the paste layer 3 of the film base material 1 is subjected to chemical polishing by immersion in a chemical solution or polishing treatment by mechanical polishing to expose the metal fine particles 4 to 4 on the surface of the paste layer 3. After that, the film base material 1 having the paste layer 3 is immersed in an electroless plating solution (chemical plating solution) M to remove metal fine particles 4 on the surface of the paste layer 3.
Electroless plating (chemical plating) using ~4 as a plating catalyst nucleus
A conductive metal film 5 is formed by performing the following steps.
すなわち、ベース]・層3の表面は金属微粒子4〜4が
露出させであるため、露出した金属微粒子4〜4には無
電解めっき液Mの金穴成分が析出し生長し、フィルム基
材1の基材面および貫孔2のペースト層3には導電性の
金属被膜5が形成され、金属被膜5の形成された貫孔2
〜2はフィルム基材1両面の導電性金属被膜5を接続す
るためのスルーホール6とされる。本例では次表に示す
液組成の無電解めっき液Mにフィルム基材1を浸し、液
468〜72℃、メッキ速rcJ、2.5〜5μ/hノ
処理条件にてペースト層3に金属銅を析出させて銅被膜
を形成した。That is, since the surface of the layer 3 is where the metal fine particles 4 to 4 are exposed, the gold hole component of the electroless plating solution M precipitates and grows on the exposed metal fine particles 4 to 4, and the film base material 1 A conductive metal coating 5 is formed on the base material surface and the paste layer 3 of the through hole 2, and the through hole 2 on which the metal coating 5 is formed
2 are through holes 6 for connecting the conductive metal coatings 5 on both sides of the film base material 1. In this example, the film base material 1 is immersed in an electroless plating solution M having the liquid composition shown in the table below, and the paste layer 3 is coated with metal under the processing conditions of a solution temperature of 468 to 72°C, a plating speed of rcJ, and a plating rate of 2.5 to 5 μ/h. Copper was deposited to form a copper coating.
〈表〉 無電解めっき液組成 なお、無電解めっき液Mにはil!ia潤剤、安定剤。<Table> Electroless plating solution composition In addition, electroless plating solution M contains il! ia lubricant, stabilizer.
ダクタリティ向上剤を少吊加えてめっき性の向上を図る
ことができる。Plating properties can be improved by adding a small amount of a conductivity improver.
しかる後、フィルム基材1を無電解めっき液Mより取り
出し、水洗し、乾燥してペースト層3と同じ回路パター
ンPの金属被膜5を有する回路基板7を得た。すなわち
、この回路基板7は、絶縁性のフィルム基材1と、この
基材上に回路とするパターン状に塗着形成し硬化させた
ペースト層3と、ペースト層3の金属微粒子4〜4をめ
っき触媒核として無電解めっきにより被着された導電性
の金属被膜5とよりなる構造のものであり、ペースト図
3部分のみに金属被膜5が被着され所定の回路パターン
Pを有し、かつフィルム基材1はフィルム体を使用して
いるのでフレキシブルなものである。なお、本例銅被膜
の物性試験は引張強度35〜45Kyl履2.伸び率1
0〜20%であり、充分に実用に適用するものであった
。Thereafter, the film base material 1 was taken out from the electroless plating solution M, washed with water, and dried to obtain a circuit board 7 having a metal coating 5 having the same circuit pattern P as the paste layer 3. That is, this circuit board 7 includes an insulating film base material 1, a paste layer 3 coated and cured in a circuit pattern on the base material, and metal fine particles 4 to 4 of the paste layer 3. It has a structure consisting of a conductive metal coating 5 deposited by electroless plating as a plating catalyst core, and has a predetermined circuit pattern P with the metal coating 5 deposited only on the paste diagram 3 portion, and The film base material 1 is flexible because it uses a film body. The physical properties of the copper coating in this example were determined to have a tensile strength of 35 to 45 Kyl. Growth rate 1
It was 0 to 20%, and was sufficiently applicable to practical use.
前記した実施例の回路基板7はフィルム基材1の片面側
に回路パターンPを形成したが、第5図に示すようにフ
ィルム基材1の両面にペースト層13を形成し無電解め
っきすることにより、フィルム基材11の両面側に導電
性金属被膜15よりなる所定の回路パターンQ1.Q2
を有するフレキシブルの回路基板17を得ることができ
る。なお、両面の回路パターンQ1.Q2は所定のスル
ーホール18により接続されている。In the circuit board 7 of the above embodiment, the circuit pattern P was formed on one side of the film base material 1, but as shown in FIG. Accordingly, a predetermined circuit pattern Q1. made of the conductive metal coating 15 is formed on both sides of the film base material 11. Q2
A flexible circuit board 17 can be obtained. Note that the circuit pattern Q1. Q2 is connected by a predetermined through hole 18.
(発明の効果)
本発明は前記した問題解決手段となしたため前記作用に
より所期の問題点が解決される。すなわち、本第1発明
および本第2発明によれば従来のラミネート処理の工程
および無電解めっき用のめっき触媒核付与工程を省略で
き、製作し易いものであり、工程の省略分J3よび製品
歩留まりの向上によりコストダウンが可能である。(Effects of the Invention) Since the present invention is a means for solving the above-described problem, the desired problem can be solved by the above-mentioned action. That is, according to the first invention and the second invention, it is possible to omit the conventional laminating process and the plating catalyst nucleation process for electroless plating, and it is easy to manufacture. It is possible to reduce costs by improving
図面は本発明の製造工程例を示すものであり、第1図は
ペースト層を形成したフィルム基材の拡大断面図、第2
図は無電解めっき処理の作用説明図、第3図は導電性金
属被膜が形成されたフィルム基材の拡大断面図、第4図
は形成された回路基板の一部を示す正面図、第5図は回
路基板の切倒を示す要部拡大断面図である。
1.11・・・フィルム基材
3.13・・・ペースト層
3△・・・ペースト
4.14・・・金属微粒子
5.15・・・導電性金属被膜
7.17・・・回路基板The drawings show an example of the manufacturing process of the present invention, and FIG. 1 is an enlarged sectional view of a film base material on which a paste layer is formed,
The figure is an explanatory diagram of the action of electroless plating treatment, Figure 3 is an enlarged sectional view of the film base material on which the conductive metal coating is formed, Figure 4 is a front view showing a part of the formed circuit board, and Figure 5 The figure is an enlarged cross-sectional view of the main part showing the cutting down of the circuit board. 1.11...Film base material 3.13...Paste layer 3Δ...Paste 4.14...Metal fine particles 5.15...Conductive metal coating 7.17...Circuit board
Claims (2)
金属微粒子が表面に露出するように前記基材上の回路パ
ターン形成部分に塗着したペースト層と、 前記金属微粒子をめっき核として無電解めつきにより前
記回路パターン形成部分に設けた導電性金属被膜と、 よりなることを特徴とするフレキシブル回路基板。(1) A paste layer in which a paste made by kneading an insulating polymer film base material, metal fine particles, and a resin composition is applied to the circuit pattern forming portion of the base material so that the metal fine particles are exposed on the surface. A flexible circuit board comprising: and a conductive metal coating provided on the circuit pattern forming portion by electroless plating using the metal fine particles as plating nuclei.
トを、絶縁性ポリマーのフィルム基材上の回路パターン
形成部分に塗布し、ペースト層を形成する工程と、 前記ペースト層上を研摩し、前記金属微粒子をペースト
層表面に露出せしめる工程と、 前記金属微粒子をめつき核として無電解めっきにより前
記回路パターン形成部分に導電性金属被膜を析出せしめ
る工程と、 よりなることを特徴とするフレキシブル回路基板の製造
方法。(2) A step of applying a paste obtained by kneading metal fine particles and a resin composition to a circuit pattern forming portion on an insulating polymer film base material to form a paste layer, and polishing the paste layer. , a step of exposing the metal fine particles on the surface of the paste layer; and a step of depositing a conductive metal film on the circuit pattern forming portion by electroless plating using the metal fine particles as plating nuclei. Method of manufacturing circuit boards.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17467385A JPS6235594A (en) | 1985-08-08 | 1985-08-08 | Flexible circuit board and its manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17467385A JPS6235594A (en) | 1985-08-08 | 1985-08-08 | Flexible circuit board and its manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6235594A true JPS6235594A (en) | 1987-02-16 |
Family
ID=15982691
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17467385A Pending JPS6235594A (en) | 1985-08-08 | 1985-08-08 | Flexible circuit board and its manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6235594A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2003103352A1 (en) * | 2002-06-04 | 2005-10-06 | 住友電気工業株式会社 | Printed wiring board, printed wiring board and manufacturing method thereof |
| JP2025508814A (en) * | 2022-02-24 | 2025-04-10 | エルジー エナジー ソリューション リミテッド | Flexible printed circuit board and secondary battery module including same |
-
1985
- 1985-08-08 JP JP17467385A patent/JPS6235594A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2003103352A1 (en) * | 2002-06-04 | 2005-10-06 | 住友電気工業株式会社 | Printed wiring board, printed wiring board and manufacturing method thereof |
| US8231766B2 (en) | 2002-06-04 | 2012-07-31 | Sumitomo Electric Industries, Ltd. | Method for producing printed wiring board |
| JP2025508814A (en) * | 2022-02-24 | 2025-04-10 | エルジー エナジー ソリューション リミテッド | Flexible printed circuit board and secondary battery module including same |
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