JPS6243831B2 - - Google Patents

Info

Publication number: JPS6243831B2
Authority: JP; Japan
Prior art keywords: laser; carbon dioxide; polisher; absorption; polishing
Prior art date: 1982-07-07
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

JP11680782A

Other languages

English (en)

Japanese (ja)

Other versions

JPS597557A (ja

Inventor

Koichi Kawada

Juji Hashidate

Takeo Myata

Takuhiro Ono

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

National Institute of Advanced Industrial Science and Technology AIST

Original Assignee

Agency of Industrial Science and Technology

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1982-07-07

Filing date

1982-07-07

Publication date

1987-09-17

1982-07-07 Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology

1982-07-07 Priority to JP11680782A priority Critical patent/JPS597557A/ja

1984-01-14 Publication of JPS597557A publication Critical patent/JPS597557A/ja

1987-09-17 Publication of JPS6243831B2 publication Critical patent/JPS6243831B2/ja

Status Granted legal-status Critical Current

Links

CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 26
230000003287 optical effect Effects 0.000 claims description 17
DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 15
WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 14
229910002092 carbon dioxide Inorganic materials 0.000 claims description 13
239000001569 carbon dioxide Substances 0.000 claims description 13
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 9
235000011164 potassium chloride Nutrition 0.000 claims description 7
239000001103 potassium chloride Substances 0.000 claims description 7
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 4
238000000034 method Methods 0.000 claims description 4
239000002245 particle Substances 0.000 claims description 3
238000004519 manufacturing process Methods 0.000 claims description 2
238000007517 polishing process Methods 0.000 claims 2
238000005498 polishing Methods 0.000 description 14
238000010521 absorption reaction Methods 0.000 description 11
238000012545 processing Methods 0.000 description 9
239000000126 substance Substances 0.000 description 8
230000005540 biological transmission Effects 0.000 description 7
239000010410 layer Substances 0.000 description 7
238000010586 diagram Methods 0.000 description 5
238000005530 etching Methods 0.000 description 5
239000006061 abrasive grain Substances 0.000 description 4
239000012530 fluid Substances 0.000 description 4
230000010355 oscillation Effects 0.000 description 4
230000002925 chemical effect Effects 0.000 description 3
229910003460 diamond Inorganic materials 0.000 description 3
239000010432 diamond Substances 0.000 description 3
238000002474 experimental method Methods 0.000 description 3
239000000463 material Substances 0.000 description 3
230000003746 surface roughness Effects 0.000 description 3
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
238000012993 chemical processing Methods 0.000 description 2
230000000694 effects Effects 0.000 description 2
239000007789 gas Substances 0.000 description 2
230000020169 heat generation Effects 0.000 description 2
239000007788 liquid Substances 0.000 description 2
230000000704 physical effect Effects 0.000 description 2
YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 2
239000002344 surface layer Substances 0.000 description 2
230000015572 biosynthetic process Effects 0.000 description 1
239000013590 bulk material Substances 0.000 description 1
238000006243 chemical reaction Methods 0.000 description 1
239000007795 chemical reaction product Substances 0.000 description 1
238000004140 cleaning Methods 0.000 description 1
238000011109 contamination Methods 0.000 description 1
238000005520 cutting process Methods 0.000 description 1
230000003670 easy-to-clean Effects 0.000 description 1
239000004744 fabric Substances 0.000 description 1
235000011187 glycerol Nutrition 0.000 description 1
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
239000010931 gold Substances 0.000 description 1
229910052737 gold Inorganic materials 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
229910052734 helium Inorganic materials 0.000 description 1
239000001307 helium Substances 0.000 description 1
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
239000000047 product Substances 0.000 description 1
239000000725 suspension Substances 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
238000003466 welding Methods 0.000 description 1

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes

Landscapes

Engineering & Computer Science (AREA)
Mechanical Engineering (AREA)
Crystals, And After-Treatments Of Crystals (AREA)

JP11680782A 1982-07-07 1982-07-07 炭酸ガスレ−ザ用透明光学部品の製造方法 Granted JPS597557A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP11680782A JPS597557A (ja)	1982-07-07	1982-07-07	炭酸ガスレ−ザ用透明光学部品の製造方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP11680782A JPS597557A (ja)	1982-07-07	1982-07-07	炭酸ガスレ−ザ用透明光学部品の製造方法

Related Child Applications (1)

Application Number	Title	Priority Date	Filing Date
JP62035728A Division JPS62188670A (ja)	1987-02-20	1987-02-20	炭酸ガスレ−ザ用透明光学部品の製造方法

Publications (2)

Publication Number	Publication Date
JPS597557A JPS597557A (ja)	1984-01-14
JPS6243831B2 true JPS6243831B2 (2)	1987-09-17

Family

ID=14696141

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP11680782A Granted JPS597557A (ja)	1982-07-07	1982-07-07	炭酸ガスレ−ザ用透明光学部品の製造方法

Country Status (1)

Country	Link
JP (1)	JPS597557A (2)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH06304858A (ja) *	1993-04-09	1994-11-01	Chiyoda Kk	研磨パットの処理剤
CN103897607B (zh) *	2014-03-25	2015-08-19	山东天岳晶体材料有限公司	一种碳化硅用机械抛光液及采用其进行机械抛光的方法

1982
- 1982-07-07 JP JP11680782A patent/JPS597557A/ja active Granted

Also Published As

Publication number	Publication date
JPS597557A (ja)	1984-01-14

Publication	Publication Date	Title
US5548606A (en)	1996-08-20	Multiform crystal and apparatus for fabrication
EP0834191B1 (en)	2002-01-02	Removal of material by polarized radiation and back side application of radiation
RU2141879C1 (ru)	1999-11-27	Выборочное удаление материала облучением
EP0255167B1 (en)	1993-09-29	Method of removing undesired particles from a surface of a substrate
US5961852A (en)	1999-10-05	Laser scribe and break process
JPS59115530A (ja)	1984-07-04	裏面がゲツタ−リング作用を有する半導体ウエフアの製造方法
JPH0640797A (ja)	1994-02-15	ダイヤモンドの加工方法
US6597521B2 (en)	2003-07-22	Optical unit and method for making the same
JP2628632B2 (ja)	1997-07-09	Ｘ線分光用結晶構成体及び該結晶構成体を備えるｘ線分析装置
JPH0418474B2 (2)	1992-03-27
JPS597557A (ja)	1984-01-14	炭酸ガスレ−ザ用透明光学部品の製造方法
JPH1167700A (ja)	1999-03-09	半導体ウェハの製造方法
JPS6285433A (ja)	1987-04-18	研摩装置
JPH0919787A (ja)	1997-01-21	非金属材料の加工方法及びその加工装置
JPH03276662A (ja)	1991-12-06	ウエハ割断法
JPS62188670A (ja)	1987-08-18	炭酸ガスレ−ザ用透明光学部品の製造方法
JPS6243830B2 (2)	1987-09-17
JPS6153731A (ja)	1986-03-17	紫外線によるエツチング方法及び装置
JPH03171138A (ja)	1991-07-24	電子デバイス用ガラス基板の製造方法
JPS58143301A (ja)	1983-08-25	炭酸ガスレ−ザ用全反射鏡
FR2528585B1 (fr)	1986-03-21	Procede de fabrication de miroir cylindrique, miroir cylindrique et appareil d'irradiation par un faisceau laser
JPS59214550A (ja)	1984-12-04	平面研摩方法
Spawr et al.	1976	Metal mirror selection guide
Gottmann et al.	2008	Manufacturing of periodical nanostructures by fs-laser direct writing
Murahara	2001	Photochemical polishing of fused-silica optics by using ArF excimer laser