JPS6249233U - - Google Patents

Info

Publication number
JPS6249233U
JPS6249233U JP1985141270U JP14127085U JPS6249233U JP S6249233 U JPS6249233 U JP S6249233U JP 1985141270 U JP1985141270 U JP 1985141270U JP 14127085 U JP14127085 U JP 14127085U JP S6249233 U JPS6249233 U JP S6249233U
Authority
JP
Japan
Prior art keywords
light
end point
time
light intensity
detection device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1985141270U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985141270U priority Critical patent/JPS6249233U/ja
Publication of JPS6249233U publication Critical patent/JPS6249233U/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Weting (AREA)

Description

【図面の簡単な説明】
第１図は本考案に係る終点検出装置の模式図、
第２図はフオトレジスト膜表面及び裏面における
レーザ光の反射状態を示す模式図、第３図は受光
強度の経時変化を示すパターン図、第４図、第５
図は現像工程における半導体装置の断面構造図で
ある。 １ｃ……フオトレジスト膜、２……光フアイバ
プローブ、３……投光用フアイバコード、４……
受光用バンドルフアイバコード、５……コリメー
タレンズ、９……光強度演算器、１０……終点表
示器、

Claims (1)

  1. 【実用新案登録請求の範囲】 被膜上に可干渉光を照射し、被膜表面及び裏面
    からの反射光の相互干渉に伴う光強度変化が０の
    状態が一定時間継続した時点を検出して、半導体
    装置作成工程における回路パターン形成の終点を
    検出する終点検出装置において、 前記可干渉光を発振して前記被膜上に照射する
    投光装置と、 前記反射光を受信して光強度を記録する受光装
    置と、 光強度変化が０の状態が一定時間継続した時点
    より５〜６０秒後に終点を報知する終点報知器と
    を具備することを特徴とする終点検出装置。
JP1985141270U 1985-09-13 1985-09-13 Pending JPS6249233U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985141270U JPS6249233U (ja) 1985-09-13 1985-09-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985141270U JPS6249233U (ja) 1985-09-13 1985-09-13

Publications (1)

Publication Number Publication Date
JPS6249233U true JPS6249233U (ja) 1987-03-26

Family

ID=31048890

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985141270U Pending JPS6249233U (ja) 1985-09-13 1985-09-13

Country Status (1)

Country Link
JP (1) JPS6249233U (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6412529A (en) * 1987-07-07 1989-01-17 Sumitomo Gca Kk Development of wafer

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5317078A (en) * 1976-07-30 1978-02-16 Toshiba Corp Etching end point detection circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5317078A (en) * 1976-07-30 1978-02-16 Toshiba Corp Etching end point detection circuit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6412529A (en) * 1987-07-07 1989-01-17 Sumitomo Gca Kk Development of wafer

Similar Documents

Publication Publication Date Title
JPS5767815A (en) Measuring method for position of reflector using light
JPS55117946A (en) Flaw detection method of hollow shaft inside surface
JPS6079108U (ja) スペツクル距離計
JPS5378855A (en) Polygonal jewery identifying device
JPS53118145A (en) Detecting method of light beam position
JPS56130606A (en) Optical measuring device for thickness of transparent material
JPH01162605U (ja)
JPS59144484U (ja) レ−ザ測距装置
JPS53104241A (en) Recorder
JPH03111478U (ja)
JPS6292459U (ja)
JPS5479693A (en) Wire body surface defect detector
JPS5532248A (en) Optical recorder and reproducing device
JPH01102710U (ja)
JPS62201738U (ja)
JPS6430473U (ja)
JPS6443295U (ja)
JPH02117719U (ja)
JPS626743U (ja)
JPH0329844U (ja)
JPS594406U (ja) 透明なシ−ト状物質の厚さ測定装置
JPH0267211U (ja)
JPH0428939U (ja)
JPS5322321A (en) Bar-code discriminating unit
JPS5872610U (ja) フイルムの厚み測定装置