JPS629667B2 - - Google Patents
Info
- Publication number
- JPS629667B2 JPS629667B2 JP57119913A JP11991382A JPS629667B2 JP S629667 B2 JPS629667 B2 JP S629667B2 JP 57119913 A JP57119913 A JP 57119913A JP 11991382 A JP11991382 A JP 11991382A JP S629667 B2 JPS629667 B2 JP S629667B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- nitride thin
- nitrogen
- resistivity
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11991382A JPS5913607A (ja) | 1982-07-12 | 1982-07-12 | 金属窒化物薄膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11991382A JPS5913607A (ja) | 1982-07-12 | 1982-07-12 | 金属窒化物薄膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5913607A JPS5913607A (ja) | 1984-01-24 |
| JPS629667B2 true JPS629667B2 (de) | 1987-03-02 |
Family
ID=14773287
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11991382A Granted JPS5913607A (ja) | 1982-07-12 | 1982-07-12 | 金属窒化物薄膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5913607A (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04365965A (ja) * | 1991-06-12 | 1992-12-17 | Toyota Autom Loom Works Ltd | エンジンの保護装置 |
| JPH086098Y2 (ja) * | 1991-08-07 | 1996-02-21 | 日本機械工業株式会社 | 傾斜スライド式洗掘防止装置 |
| JP2565086Y2 (ja) * | 1991-08-08 | 1998-03-11 | 日本機械工業株式会社 | 傾斜スライド式洗掘防止装置 |
| EP0576376B1 (de) * | 1992-06-26 | 1998-05-06 | Eastman Kodak Company | Kobalt-Platin magnetischer Film und Herstellungsverfahren |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5428390A (en) * | 1977-08-05 | 1979-03-02 | Kuraray Co Ltd | Preparation of modified polyvinyl alcohol-type polymer |
-
1982
- 1982-07-12 JP JP11991382A patent/JPS5913607A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5913607A (ja) | 1984-01-24 |
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