JPS6312829U - - Google Patents

Description

[Brief explanation of the drawing]

FIG. 1A is a plan view showing the wafer stand of the present invention, FIG. 1B is a view taken along the arrow C-C in FIG. 1A, and FIG.
is the arrow view D-D in Figure 1A, Figure 2 is a detailed view showing the groove in Figure 1A, Figure 3 is a diagram showing the conventional groove and reactant gas flow, and Figure 4 is a diagram showing vapor phase growth. 5A is a plan view showing a conventional wafer stand;
Figure B is taken along arrow A-A in Figure 5A, Figure 5C is taken along arrow B-B in Figure 5A, and Figure 6 is cross-section E in Figure 2.
-E, FIG. 7 is a diagram showing a second embodiment corresponding to FIG. 6. 2: Wafer, 8a: Thin film, 34: Bar, 35:
Groove, 40: Lower end, 41: Outer flow, 42: Inner flow, 43
~44: Flow.

Claims (1)

[Scope of Claim for Utility Model Registration] 1. A wafer stand in which a reaction tube is provided so as to be enclosed in a heater, a reaction gas is introduced, and the wafer is left standing in the reaction tube so as to stand upright against the flow of the reaction gas. For use in a vapor phase growth apparatus, characterized in that the bar is a hollow body, grooves are provided at regular intervals for placing the wafer, and reactive gases can freely flow through the grooves between the inner and outer circumferential areas of the bar. wafer stand. 2. The wafer stand for a vapor phase growth apparatus according to claim 1, wherein the bars are made of hard glass, quartz glass, or metal, and a plurality of bars are provided in parallel. 3. The wafer stand for a vapor phase growth apparatus according to claim 1, wherein the groove is substantially V-shaped with respect to the bar core and makes point contact with the wafer.