JPS63133527A - 露光プリアライメント装置 - Google Patents

露光プリアライメント装置

Info

Publication number: JPS63133527A
Authority: JP; Japan
Prior art keywords: substrate; resist; laser; exposure; alignment
Prior art date: 1986-11-25
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP28110986A

Other languages

English (en)

Japanese (ja)

Other versions

JPH0569291B2 (2

Inventor

Shigeki Kato

茂樹加藤

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

NEC Corp

Original Assignee

NEC Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-11-25

Filing date

1986-11-25

Publication date

1988-06-06

1986-11-25 Application filed by NEC Corp filed Critical NEC Corp

1986-11-25 Priority to JP28110986A priority Critical patent/JPS63133527A/ja

1988-06-06 Publication of JPS63133527A publication Critical patent/JPS63133527A/ja

1993-09-30 Publication of JPH0569291B2 publication Critical patent/JPH0569291B2/ja

Status Granted legal-status Critical Current

Links

239000000758 substrate Substances 0.000 claims abstract description 60
239000004065 semiconductor Substances 0.000 claims abstract description 12
238000001259 photo etching Methods 0.000 claims description 5
230000002093 peripheral effect Effects 0.000 abstract description 14
239000002904 solvent Substances 0.000 abstract description 8
238000000034 method Methods 0.000 abstract description 6
238000005530 etching Methods 0.000 abstract description 5
238000004519 manufacturing process Methods 0.000 abstract description 5
239000013307 optical fiber Substances 0.000 abstract description 4
238000012545 processing Methods 0.000 abstract description 4
230000000694 effects Effects 0.000 abstract description 3
230000003287 optical effect Effects 0.000 abstract 1
239000007921 spray Substances 0.000 description 4
238000011161 development Methods 0.000 description 3
238000005516 engineering process Methods 0.000 description 2
229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
239000004926 polymethyl methacrylate Substances 0.000 description 2
238000012546 transfer Methods 0.000 description 2
238000013480 data collection Methods 0.000 description 1
230000006866 deterioration Effects 0.000 description 1
230000002542 deteriorative effect Effects 0.000 description 1
239000000428 dust Substances 0.000 description 1
230000001678 irradiating effect Effects 0.000 description 1
238000001459 lithography Methods 0.000 description 1
239000000155 melt Substances 0.000 description 1
238000007781 pre-processing Methods 0.000 description 1
238000003825 pressing Methods 0.000 description 1
238000007790 scraping Methods 0.000 description 1
238000004528 spin coating Methods 0.000 description 1

Landscapes

Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

JP28110986A 1986-11-25 1986-11-25 露光プリアライメント装置 Granted JPS63133527A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP28110986A JPS63133527A (ja)	1986-11-25	1986-11-25	露光プリアライメント装置

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP28110986A JPS63133527A (ja)	1986-11-25	1986-11-25	露光プリアライメント装置

Publications (2)

Publication Number	Publication Date
JPS63133527A true JPS63133527A (ja)	1988-06-06
JPH0569291B2 JPH0569291B2 (2)	1993-09-30

Family

ID=17634477

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP28110986A Granted JPS63133527A (ja)	1986-11-25	1986-11-25	露光プリアライメント装置

Country Status (1)

Country	Link
JP (1)	JPS63133527A (2)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH02114628A (ja) *	1988-10-25	1990-04-26	Ushio Inc	ウエハ周辺露光装置
JP2022118376A (ja) *	2021-02-02	2022-08-15	東京エレクトロン株式会社	基板処理装置、基板処理システム、基板処理方法及びコンピュータ記憶媒体

Citations (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5218175A (en) *	1975-08-01	1977-02-10	Hitachi Ltd	Circuit pattern formation method and its device
JPS59138335A (ja) *	1983-01-28	1984-08-08	Toshiba Corp	ウエハ端部のレジスト露光装置
JPS59158520A (ja) *	1983-02-28	1984-09-08	Toshiba Corp	照射装置
JPS6060724A (ja) *	1983-09-14	1985-04-08	Toshiba Corp	半導体露光装置
JPS61137320A (ja) *	1984-12-10	1986-06-25	Hitachi Ltd	ウエハ処理装置

1986
- 1986-11-25 JP JP28110986A patent/JPS63133527A/ja active Granted

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5218175A (en) *	1975-08-01	1977-02-10	Hitachi Ltd	Circuit pattern formation method and its device
JPS59138335A (ja) *	1983-01-28	1984-08-08	Toshiba Corp	ウエハ端部のレジスト露光装置
JPS59158520A (ja) *	1983-02-28	1984-09-08	Toshiba Corp	照射装置
JPS6060724A (ja) *	1983-09-14	1985-04-08	Toshiba Corp	半導体露光装置
JPS61137320A (ja) *	1984-12-10	1986-06-25	Hitachi Ltd	ウエハ処理装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH02114628A (ja) *	1988-10-25	1990-04-26	Ushio Inc	ウエハ周辺露光装置
JP2022118376A (ja) *	2021-02-02	2022-08-15	東京エレクトロン株式会社	基板処理装置、基板処理システム、基板処理方法及びコンピュータ記憶媒体

Also Published As

Publication number	Publication date
JPH0569291B2 (2)	1993-09-30

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