JPH0569291B2 - - Google Patents

Info

Publication number
JPH0569291B2
JPH0569291B2 JP61281109A JP28110986A JPH0569291B2 JP H0569291 B2 JPH0569291 B2 JP H0569291B2 JP 61281109 A JP61281109 A JP 61281109A JP 28110986 A JP28110986 A JP 28110986A JP H0569291 B2 JPH0569291 B2 JP H0569291B2
Authority
JP
Japan
Prior art keywords
substrate
resist
alignment
exposure
pair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61281109A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63133527A (ja
Inventor
Shigeki Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP28110986A priority Critical patent/JPS63133527A/ja
Publication of JPS63133527A publication Critical patent/JPS63133527A/ja
Publication of JPH0569291B2 publication Critical patent/JPH0569291B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP28110986A 1986-11-25 1986-11-25 露光プリアライメント装置 Granted JPS63133527A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28110986A JPS63133527A (ja) 1986-11-25 1986-11-25 露光プリアライメント装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28110986A JPS63133527A (ja) 1986-11-25 1986-11-25 露光プリアライメント装置

Publications (2)

Publication Number Publication Date
JPS63133527A JPS63133527A (ja) 1988-06-06
JPH0569291B2 true JPH0569291B2 (2) 1993-09-30

Family

ID=17634477

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28110986A Granted JPS63133527A (ja) 1986-11-25 1986-11-25 露光プリアライメント装置

Country Status (1)

Country Link
JP (1) JPS63133527A (2)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2601335B2 (ja) * 1988-10-25 1997-04-16 ウシオ電機株式会社 ウエハ周辺露光装置
JP7602924B2 (ja) * 2021-02-02 2024-12-19 東京エレクトロン株式会社 基板処理装置、基板処理システム、基板処理方法及びコンピュータ記憶媒体

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5933971B2 (ja) * 1975-08-01 1984-08-20 株式会社日立製作所 回路パタ−ン形成方法及びその装置
JPS59138335A (ja) * 1983-01-28 1984-08-08 Toshiba Corp ウエハ端部のレジスト露光装置
JPS59158520A (ja) * 1983-02-28 1984-09-08 Toshiba Corp 照射装置
JPS6060724A (ja) * 1983-09-14 1985-04-08 Toshiba Corp 半導体露光装置
JPS61137320A (ja) * 1984-12-10 1986-06-25 Hitachi Ltd ウエハ処理装置

Also Published As

Publication number Publication date
JPS63133527A (ja) 1988-06-06

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