JPS6317524A - 半導体パタ−ン露光装置 - Google Patents
半導体パタ−ン露光装置Info
- Publication number
- JPS6317524A JPS6317524A JP61162272A JP16227286A JPS6317524A JP S6317524 A JPS6317524 A JP S6317524A JP 61162272 A JP61162272 A JP 61162272A JP 16227286 A JP16227286 A JP 16227286A JP S6317524 A JPS6317524 A JP S6317524A
- Authority
- JP
- Japan
- Prior art keywords
- information
- original
- inputted
- keyboard
- original image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61162272A JPS6317524A (ja) | 1986-07-09 | 1986-07-09 | 半導体パタ−ン露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61162272A JPS6317524A (ja) | 1986-07-09 | 1986-07-09 | 半導体パタ−ン露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6317524A true JPS6317524A (ja) | 1988-01-25 |
| JPH0482174B2 JPH0482174B2 (2) | 1992-12-25 |
Family
ID=15751308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61162272A Granted JPS6317524A (ja) | 1986-07-09 | 1986-07-09 | 半導体パタ−ン露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6317524A (2) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5434777A (en) * | 1977-08-24 | 1979-03-14 | Hitachi Ltd | Mask aligner |
-
1986
- 1986-07-09 JP JP61162272A patent/JPS6317524A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5434777A (en) * | 1977-08-24 | 1979-03-14 | Hitachi Ltd | Mask aligner |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0482174B2 (2) | 1992-12-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI331677B (en) | Lithographic apparatus and device manufacturing method | |
| US4218142A (en) | Mask analysis | |
| US11621201B2 (en) | Laser beam spot shape correcting method | |
| CN101011236A (zh) | 修改进入患者眼睛的入射束和矫正双目视力的设备和方法 | |
| JP7212792B2 (ja) | 学習処理装置及び検査装置 | |
| US20090296062A1 (en) | Method of measuring position error of beam of exposure apparatus and exposure apparatus using the same | |
| US5569570A (en) | Automated mask alignment for UV projection exposure system | |
| JP2020047761A (ja) | 欠陥検査装置、欠陥検査方法、及び欠陥検査プログラム | |
| JP2001291054A (ja) | 半導体ウエハのｉｄ認識装置及びｉｄ認識ソータシステム | |
| JPS6317524A (ja) | 半導体パタ−ン露光装置 | |
| JPH102865A (ja) | レチクルの検査装置およびその検査方法 | |
| CN117368101A (zh) | 检查设备和检查方法 | |
| KR101273800B1 (ko) | 마스크리스 노광기의 정렬장치 | |
| TWI879141B (zh) | 三軸平台控制之鏡片檢測系統與運作方法 | |
| JP3246300B2 (ja) | マスクとワークの自動位置合わせ方法および装置 | |
| WO2020185639A1 (en) | System and method for applying patterns on articles and inspection thereof | |
| CN101071262A (zh) | 用于检查制造集成电路器件中使用的掩模的设备和方法 | |
| GB2076533A (en) | Mask Analysis | |
| TWM653942U (zh) | 三軸平台控制之鏡片檢測系統 | |
| JPH07311607A (ja) | シーケンス制御方法 | |
| JPH0746047B2 (ja) | パターン検査装置 | |
| JP2622714B2 (ja) | パターン検査装置 | |
| JP2005309314A (ja) | 光学ユニット光軸調整装置 | |
| JPH09246150A (ja) | 露光装置 | |
| JP2006234556A (ja) | 光ファイバ端面検査装置及び方法 |