JPS6351432U - - Google Patents
Info
- Publication number
- JPS6351432U JPS6351432U JP14611486U JP14611486U JPS6351432U JP S6351432 U JPS6351432 U JP S6351432U JP 14611486 U JP14611486 U JP 14611486U JP 14611486 U JP14611486 U JP 14611486U JP S6351432 U JPS6351432 U JP S6351432U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- lid member
- susceptor
- reaction
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012495 reaction gas Substances 0.000 claims description 4
- 238000001947 vapour-phase growth Methods 0.000 claims 2
- 238000004140 cleaning Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案装置の一実施例を示す中央縦断
面図、第２図は従来装置の一実施例を示す中央縦
断面図である。
１……反応管、２……前室、３……蓋部材、４
……反応ガス導入部、５……反応ガス排出部、９
……軸部材、１０……サセプタ、１１……ウエハ
、２０……ブラシ、２１……グローブボツクス、
２２……開閉扉、２３……グローブ。
FIG. 1 is a central vertical cross-sectional view showing an embodiment of the device of the present invention, and FIG. 2 is a central vertical cross-sectional view showing an example of the conventional device. 1... Reaction tube, 2... Front chamber, 3... Lid member, 4
... Reaction gas introduction section, 5 ... Reaction gas discharge section, 9
... shaft member, 10 ... susceptor, 11 ... wafer, 20 ... brush, 21 ... glove box,
22...Openable door, 23...Glove.
Claims (1)
と反応ガス排出部とを設けると共に加熱手段を付
設してなる反応管と、該反応管に前記開口部を介
して連接しウエハの搬入、搬出を行なう前室と、
該前室を気密に貫通して前記反応管の開口部を開
閉する前進後退可能な蓋部材と、該蓋部材を気密
に貫通して前記反応室内に延びその端部にサセプ
タを設置するようにした前進後退可能な軸部材と
から構成されてなる気相成長装置において、前記
軸部材の端部とサセプタ及び反応管内壁面清掃用
のブラシとが該軸部材の端部で交換可能な着脱構
造とすると共に、前室に前記サセプタとブラシと
を外部との気密を保持して交換可能な操作手段を
設けたことを特徴とする気相成長装置。 a reaction tube formed by a cylindrical body having an opening at one end, provided with a reaction gas introduction part and a reaction gas discharge part, and provided with a heating means; a reaction tube connected to the reaction tube through the opening for carrying in a wafer; A front room for carrying out the work,
a lid member that airtightly penetrates the front chamber to open and close an opening of the reaction tube; and a lid member that airtightly penetrates the lid member and extends into the reaction chamber, and a susceptor is installed at an end of the lid member. A vapor phase growth apparatus comprising a shaft member that can move forward and backward, and a detachable structure in which an end of the shaft member, a susceptor, and a brush for cleaning the inner wall surface of the reaction tube can be replaced at the end of the shaft member. A vapor phase growth apparatus characterized in that the front chamber is provided with an operating means that allows the susceptor and the brush to be exchanged while keeping them airtight from the outside.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14611486U JPH058672Y2 (en) | 1986-09-24 | 1986-09-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14611486U JPH058672Y2 (en) | 1986-09-24 | 1986-09-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6351432U true JPS6351432U (en) | 1988-04-07 |
| JPH058672Y2 JPH058672Y2 (en) | 1993-03-04 |
Family
ID=31058281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14611486U Expired - Lifetime JPH058672Y2 (en) | 1986-09-24 | 1986-09-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH058672Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015138897A (en) * | 2014-01-23 | 2015-07-30 | 信越半導体株式会社 | Cleaning or inspection method for vapor phase growth equipment |
| JP2016039174A (en) * | 2014-08-05 | 2016-03-22 | 住友化学株式会社 | Reaction vessel sealing structure and substrate processing apparatus |
-
1986
- 1986-09-24 JP JP14611486U patent/JPH058672Y2/ja not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015138897A (en) * | 2014-01-23 | 2015-07-30 | 信越半導体株式会社 | Cleaning or inspection method for vapor phase growth equipment |
| JP2016039174A (en) * | 2014-08-05 | 2016-03-22 | 住友化学株式会社 | Reaction vessel sealing structure and substrate processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH058672Y2 (en) | 1993-03-04 |