JPS63777B2 - - Google Patents

Info

Publication number
JPS63777B2
JPS63777B2 JP16507683A JP16507683A JPS63777B2 JP S63777 B2 JPS63777 B2 JP S63777B2 JP 16507683 A JP16507683 A JP 16507683A JP 16507683 A JP16507683 A JP 16507683A JP S63777 B2 JPS63777 B2 JP S63777B2
Authority
JP
Japan
Prior art keywords
foreign matter
metal frame
transparent substrate
minute
pellicle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16507683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6057841A (ja
Inventor
Toshihiko Nakada
Yasuo Nakagawa
Yoshisada Oshida
Mitsuyoshi Koizumi
Masataka Shiba
Yukio Uto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58165076A priority Critical patent/JPS6057841A/ja
Publication of JPS6057841A publication Critical patent/JPS6057841A/ja
Publication of JPS63777B2 publication Critical patent/JPS63777B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58165076A 1983-09-09 1983-09-09 異物固定方法及び装置 Granted JPS6057841A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58165076A JPS6057841A (ja) 1983-09-09 1983-09-09 異物固定方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58165076A JPS6057841A (ja) 1983-09-09 1983-09-09 異物固定方法及び装置

Publications (2)

Publication Number Publication Date
JPS6057841A JPS6057841A (ja) 1985-04-03
JPS63777B2 true JPS63777B2 (de) 1988-01-08

Family

ID=15805407

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58165076A Granted JPS6057841A (ja) 1983-09-09 1983-09-09 異物固定方法及び装置

Country Status (1)

Country Link
JP (1) JPS6057841A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0779551A2 (de) 1995-12-15 1997-06-18 Shin-Etsu Chemical Co., Ltd. Von einem Rahmen getragener Schutzfilm für eine Photomaske

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61137948U (de) * 1985-02-19 1986-08-27
JP2642637B2 (ja) * 1987-08-18 1997-08-20 三井石油化学工業 株式会社 防塵膜
JP2535971B2 (ja) * 1987-11-05 1996-09-18 三井石油化学工業株式会社 ペリクル
JPH01103305U (de) * 1987-12-28 1989-07-12
JP3434731B2 (ja) 1999-06-09 2003-08-11 Ｎｅｃエレクトロニクス株式会社 ペリクル及びそのケース
CN119493333A (zh) * 2018-11-27 2025-02-21 Asml荷兰有限公司 隔膜清洁设备
US12271109B2 (en) * 2019-12-13 2025-04-08 Mitsui Chemicals, Inc. Pellicle demounting method, and pellicle demounting device
CN111446101A (zh) * 2020-04-23 2020-07-24 东莞市凯华电子有限公司 一种超薄型机械式贴片编码器封装结构
EP4163719A4 (de) 2020-06-04 2024-08-07 Shin-Etsu Chemical Co., Ltd. Pellikelrahmen, pellikelausgerüstete belichtungsoriginalplatte, belichtungsverfahren, verfahren zur herstellung eines halbleiters und verfahren zur herstellung einer flüssigkristallanzeigetafel

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0779551A2 (de) 1995-12-15 1997-06-18 Shin-Etsu Chemical Co., Ltd. Von einem Rahmen getragener Schutzfilm für eine Photomaske

Also Published As

Publication number Publication date
JPS6057841A (ja) 1985-04-03

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