JPS6384934U - - Google Patents
Info
- Publication number
- JPS6384934U JPS6384934U JP17924486U JP17924486U JPS6384934U JP S6384934 U JPS6384934 U JP S6384934U JP 17924486 U JP17924486 U JP 17924486U JP 17924486 U JP17924486 U JP 17924486U JP S6384934 U JPS6384934 U JP S6384934U
- Authority
- JP
- Japan
- Prior art keywords
- shutter
- reflected light
- exposure
- base substrate
- monitor section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims 2
- 238000001514 detection method Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Description
第１図は本考案の一実施例を示す概略図、第２
図及び第３図はそれぞれ他の実施例において反射
光強度をモニタする光学系の部分を示す概略図、
第４図はマスクの欠陥検査手段を備えた縮小投影
露光装置を示す概略図である。
２……光源、４……マスク、６……半導体ウエ
ハ、８……ホトレジスト、１０，１２……レンズ
系、１４……シヤツタ、１６……シヤツタコント
ロール部、２０……ハーフミラー、２２……光セ
ンサ、２４……光フアイバ。
Fig. 1 is a schematic diagram showing an embodiment of the present invention;
3 and 3 are schematic diagrams showing parts of an optical system for monitoring reflected light intensity in other embodiments, respectively,
FIG. 4 is a schematic diagram showing a reduction projection exposure apparatus equipped with mask defect inspection means. 2... Light source, 4... Mask, 6... Semiconductor wafer, 8... Photoresist, 10, 12... Lens system, 14... Shutter, 16... Shutter control unit, 20... Half mirror, 22... ... Optical sensor, 24... Optical fiber.
Claims (1)
光材料に照射して露光を行なう光学系に、シヤツ
タコントロール部により開閉動作が制御されて露
光時間を制御することのできるシヤツタを備えた
露光装置において、前記下地基板からの反射光強
度を検出する反射光モニタ部を設け、この反射光
モニタ部の検出信号を前記シヤツタコントロール
部に入力し、前記シヤツタの開時間を調整するこ
とを特徴とする露光装置。 In an exposure apparatus equipped with an optical system that performs exposure by irradiating light from a light source onto a photosensitive material on a base substrate through a mask, and a shutter whose opening/closing operation is controlled by a shutter control unit to control exposure time. , a reflected light monitor section for detecting the intensity of reflected light from the base substrate is provided, and a detection signal from the reflected light monitor section is input to the shutter control section to adjust the opening time of the shutter. Exposure equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17924486U JPS6384934U (en) | 1986-11-20 | 1986-11-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17924486U JPS6384934U (en) | 1986-11-20 | 1986-11-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6384934U true JPS6384934U (en) | 1988-06-03 |
Family
ID=31122134
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17924486U Pending JPS6384934U (en) | 1986-11-20 | 1986-11-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6384934U (en) |
-
1986
- 1986-11-20 JP JP17924486U patent/JPS6384934U/ja active Pending
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