JPS6393642U - - Google Patents

Info

Publication number
JPS6393642U
JPS6393642U JP18823986U JP18823986U JPS6393642U JP S6393642 U JPS6393642 U JP S6393642U JP 18823986 U JP18823986 U JP 18823986U JP 18823986 U JP18823986 U JP 18823986U JP S6393642 U JPS6393642 U JP S6393642U
Authority
JP
Japan
Prior art keywords
insulating
heating
semiconductor wafer
stand
cooling device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18823986U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP18823986U priority Critical patent/JPS6393642U/ja
Publication of JPS6393642U publication Critical patent/JPS6393642U/ja
Pending legal-status Critical Current

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  • Jigs For Machine Tools (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は第2図の―断面図、第2図は本考
案に係る静電チヤツクを示す平面図、第3図は従
来の静電チヤツクを示す平面図、第4図は第3図
の―断面図である。 2…中空枢軸、3,4…静電電極、5…絶縁層
、6…半導体ウエハ、11…絶縁台、14…加熱
冷却装置、15…温度コントローラ、16…発熱
体、17…送風装置。
Fig. 1 is a sectional view of Fig. 2, Fig. 2 is a plan view showing the electrostatic chuck according to the present invention, Fig. 3 is a plan view showing the conventional electrostatic chuck, and Fig. 4 is the same as Fig. 3. -This is a cross-sectional view. 2... Hollow axis, 3, 4... Electrostatic electrode, 5... Insulating layer, 6... Semiconductor wafer, 11... Insulating stand, 14... Heating/cooling device, 15... Temperature controller, 16... Heating element, 17... Air blower.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 水平方向に延在する中空枢軸によつて回動する
絶縁台と、この絶縁台に設けられその表面上に絶
縁層を介して半導体ウエハを吸着可能な静電電極
と、この静電電極に温度コントローラを介して接
続され前記半導体ウエハを加熱・冷却する加熱冷
却装置とを備え、この加熱冷却装置は前記絶縁台
の下方に設けられた発熱体および前記中空枢軸内
に冷却空気を供給する送風装置によつて構成され
ていることを特徴とする静電チヤツク。
An insulating stand that rotates by a hollow pivot extending horizontally, an electrostatic electrode that is provided on the insulating stand and can attract a semiconductor wafer through an insulating layer on the surface of the insulating stand, and a temperature a heating and cooling device connected via a controller to heat and cool the semiconductor wafer; the heating and cooling device includes a heating element provided below the insulating table and a blower device that supplies cooling air into the hollow shaft; An electrostatic chuck comprising:
JP18823986U 1986-12-05 1986-12-05 Pending JPS6393642U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18823986U JPS6393642U (en) 1986-12-05 1986-12-05

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18823986U JPS6393642U (en) 1986-12-05 1986-12-05

Publications (1)

Publication Number Publication Date
JPS6393642U true JPS6393642U (en) 1988-06-17

Family

ID=31139417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18823986U Pending JPS6393642U (en) 1986-12-05 1986-12-05

Country Status (1)

Country Link
JP (1) JPS6393642U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH029546A (en) * 1988-06-29 1990-01-12 Tokuda Seisakusho Ltd electrostatic chuck
JPH11354527A (en) * 1998-06-10 1999-12-24 Sukegawa Electric Co Ltd Plate body heating device
JP2014090167A (en) * 2012-10-11 2014-05-15 Lam Research Corporation Delamination drying apparatus and method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH029546A (en) * 1988-06-29 1990-01-12 Tokuda Seisakusho Ltd electrostatic chuck
JPH11354527A (en) * 1998-06-10 1999-12-24 Sukegawa Electric Co Ltd Plate body heating device
JP2014090167A (en) * 2012-10-11 2014-05-15 Lam Research Corporation Delamination drying apparatus and method

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