JPS6410047U - - Google Patents
Info
- Publication number
- JPS6410047U JPS6410047U JP1987103644U JP10364487U JPS6410047U JP S6410047 U JPS6410047 U JP S6410047U JP 1987103644 U JP1987103644 U JP 1987103644U JP 10364487 U JP10364487 U JP 10364487U JP S6410047 U JPS6410047 U JP S6410047U
- Authority
- JP
- Japan
- Prior art keywords
- cover
- utility
- grounded electrode
- grounded
- plasma processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Treatment Of Fiber Materials (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Description
第1図は本考案のプラズマ処理装置の電極廻り
の概略図の一例を示す。1は非接地電極、2は接
地電極、3は吹き出し孔を有するガス導入管、4
は導入ガスを電極間に封じ込める為のカバー、5
,6は処理試料をプラズマ空間を走行させる為の
ローラー、また第2,3図において8は処理試料
7の送り出し及び巻取りローラー、9は真空ポン
プに通じる排気孔、10はアース、11は低周波
或いは高周波電源、マツチング回路に通じるケー
ブル、12は真空容器である。第3図のl1は非
接地電極の巾、l2はローラの間隔を示す。
FIG. 1 shows an example of a schematic diagram around electrodes of the plasma processing apparatus of the present invention. 1 is a non-grounded electrode, 2 is a grounded electrode, 3 is a gas introduction pipe having a blowout hole, 4
5 is a cover to confine the introduced gas between the electrodes;
, 6 are rollers for moving the processed sample through the plasma space, and in Figures 2 and 3, 8 is a delivery and take-up roller for the processed sample 7, 9 is an exhaust hole leading to a vacuum pump, 10 is a ground, and 11 is a low A frequency or high frequency power source, a cable leading to a matching circuit, and 12 a vacuum container. In FIG. 3, l1 indicates the width of the non-grounded electrode, and l2 indicates the spacing between the rollers.
Claims (1)
吹き出し孔を有するガス導入管3、導入されたガ
スを電極間に封じ込める為のカバー4、及び処理
物7をプラズマ空間を走行させる為のローラー5
,6からなるプラズマ処理ユニツトを少なくとも
1個有するプラズマ処理装置。 (2) カバー4が金属製である実用新案登録請求
の範囲第1項記載の装置。 (3) カバー4がプラズマ空間を監視できる透視
窓を有する実用新案請求の範囲第1項或いは第2
項記載の装置。 (4) カバー4が接地されている実用新案登録請
求の範囲第1項記載の装置。[Scope of claims for utility model registration] (1) Non-grounded electrode 1, grounded electrode 2,
A gas introduction pipe 3 having a blowout hole, a cover 4 for sealing the introduced gas between the electrodes, and a roller 5 for moving the processed material 7 through the plasma space.
, 6. A plasma processing apparatus having at least one plasma processing unit consisting of . (2) The device according to claim 1, wherein the cover 4 is made of metal. (3) Utility model claim 1 or 2 in which the cover 4 has a see-through window that can monitor the plasma space.
Apparatus described in section. (4) The device according to claim 1 of the utility model registration claim, in which the cover 4 is grounded.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987103644U JPH0646990Y2 (en) | 1987-07-06 | 1987-07-06 | Plasma processing device |
| US07/214,179 US4968918A (en) | 1987-07-06 | 1988-07-01 | Apparatus for plasma treatment |
| EP88110707A EP0298420B1 (en) | 1987-07-06 | 1988-07-05 | Apparatus for plasma treatment |
| DE3887933T DE3887933T2 (en) | 1987-07-06 | 1988-07-05 | Plasma processing device. |
| KR1019880008345A KR950001541B1 (en) | 1987-07-06 | 1988-07-06 | Plasma treatment equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987103644U JPH0646990Y2 (en) | 1987-07-06 | 1987-07-06 | Plasma processing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6410047U true JPS6410047U (en) | 1989-01-19 |
| JPH0646990Y2 JPH0646990Y2 (en) | 1994-11-30 |
Family
ID=31334664
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987103644U Expired - Lifetime JPH0646990Y2 (en) | 1987-07-06 | 1987-07-06 | Plasma processing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0646990Y2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101367422B1 (en) * | 2012-12-12 | 2014-02-26 | (주) 파카알지비 | Fabric surface treatment apparatus |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58132161A (en) * | 1982-01-26 | 1983-08-06 | 株式会社山東鉄工所 | Low temperature plasma treating apparatus |
| JPS58163772A (en) * | 1982-03-23 | 1983-09-28 | 株式会社山東鉄工所 | Low temperature plasma treating apparatus |
| JPS59179631A (en) * | 1983-03-31 | 1984-10-12 | Japan Synthetic Rubber Co Ltd | Apparatus for plasma polymerization treatment of film |
| JPS59226028A (en) * | 1983-06-06 | 1984-12-19 | Nitto Electric Ind Co Ltd | Vacuum treating device |
| JPS6048339A (en) * | 1983-08-26 | 1985-03-16 | Unitika Ltd | Method and apparatus for treating sheetlike item with plasma at low temperature |
-
1987
- 1987-07-06 JP JP1987103644U patent/JPH0646990Y2/en not_active Expired - Lifetime
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58132161A (en) * | 1982-01-26 | 1983-08-06 | 株式会社山東鉄工所 | Low temperature plasma treating apparatus |
| JPS58163772A (en) * | 1982-03-23 | 1983-09-28 | 株式会社山東鉄工所 | Low temperature plasma treating apparatus |
| JPS59179631A (en) * | 1983-03-31 | 1984-10-12 | Japan Synthetic Rubber Co Ltd | Apparatus for plasma polymerization treatment of film |
| JPS59226028A (en) * | 1983-06-06 | 1984-12-19 | Nitto Electric Ind Co Ltd | Vacuum treating device |
| JPS6048339A (en) * | 1983-08-26 | 1985-03-16 | Unitika Ltd | Method and apparatus for treating sheetlike item with plasma at low temperature |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0646990Y2 (en) | 1994-11-30 |
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