JPS642192B2 - - Google Patents
Info
- Publication number
- JPS642192B2 JPS642192B2 JP28312885A JP28312885A JPS642192B2 JP S642192 B2 JPS642192 B2 JP S642192B2 JP 28312885 A JP28312885 A JP 28312885A JP 28312885 A JP28312885 A JP 28312885A JP S642192 B2 JPS642192 B2 JP S642192B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction vessel
- raw material
- cylindrical
- exhaust
- material gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28312885A JPS62142772A (ja) | 1985-12-18 | 1985-12-18 | マイクロ波プラズマcvd法による堆積膜形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28312885A JPS62142772A (ja) | 1985-12-18 | 1985-12-18 | マイクロ波プラズマcvd法による堆積膜形成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62142772A JPS62142772A (ja) | 1987-06-26 |
| JPS642192B2 true JPS642192B2 (cs) | 1989-01-13 |
Family
ID=17661588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28312885A Granted JPS62142772A (ja) | 1985-12-18 | 1985-12-18 | マイクロ波プラズマcvd法による堆積膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62142772A (cs) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3343805B2 (ja) * | 1995-08-15 | 2002-11-11 | 富士通株式会社 | ディスク装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6029470A (ja) * | 1983-07-27 | 1985-02-14 | Kyocera Corp | 量産型グロ−放電分解装置 |
-
1985
- 1985-12-18 JP JP28312885A patent/JPS62142772A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62142772A (ja) | 1987-06-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH05275345A (ja) | プラズマcvd方法およびその装置 | |
| WO2006109735A1 (ja) | 成膜方法及び成膜装置 | |
| JPH0510428B2 (cs) | ||
| US4913928A (en) | Microwave plasma chemical vapor deposition apparatus with magnet on waveguide | |
| JPH01272A (ja) | マイクロ波プラズマcvd装置 | |
| TW200917910A (en) | Plasma processing apparatus | |
| JPS642192B2 (cs) | ||
| KR20030051627A (ko) | 플라즈마 처리 장치 및 방법 | |
| JPS61232612A (ja) | 気相反応装置 | |
| JPS62142783A (ja) | プラズマcvd法による堆積膜形成装置 | |
| JP2553330B2 (ja) | プラズマcvd法による機能性堆積膜形成装置 | |
| JP2553331B2 (ja) | プラズマcvd法による堆積膜形成装置 | |
| RU214891U1 (ru) | Устройство для газоструйного осаждения алмазных покрытий | |
| JPS62235471A (ja) | プラズマcvd法による堆積膜形成装置 | |
| JP2620782B2 (ja) | プラズマcvd法による堆積膜形成装置 | |
| JPH0732127B2 (ja) | プラズマ気相反応装置 | |
| JPH057462B2 (cs) | ||
| JPS6086277A (ja) | 放電による堆積膜の形成方法 | |
| JP2504489B2 (ja) | 化学気相成長法 | |
| JPH0686665B2 (ja) | マイクロ波プラズマcvd法による機能性堆積膜形成装置 | |
| JPS63230880A (ja) | マイクロ波プラズマcvd法による機能性堆積膜形成装置 | |
| JP2553337B2 (ja) | マイクロ波プラズマcvd法による機能性堆積膜形成装置 | |
| JPS62224679A (ja) | プラズマcvd法による堆積膜形成装置 | |
| JPS62196377A (ja) | プラズマcvd法による堆積膜形成装置 | |
| JPH0627337B2 (ja) | プラズマcvd法による堆積膜形成装置 |