JPS6422062A - Transistor - Google Patents

Transistor

Info

Publication number
JPS6422062A
JPS6422062A JP62179292A JP17929287A JPS6422062A JP S6422062 A JPS6422062 A JP S6422062A JP 62179292 A JP62179292 A JP 62179292A JP 17929287 A JP17929287 A JP 17929287A JP S6422062 A JPS6422062 A JP S6422062A
Authority
JP
Japan
Prior art keywords
electrode
field electrode
bonding region
wire
field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62179292A
Other languages
Japanese (ja)
Inventor
Shigeto Maruo
Norihiro Shigeta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP62179292A priority Critical patent/JPS6422062A/en
Publication of JPS6422062A publication Critical patent/JPS6422062A/en
Pending legal-status Critical Current

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  • Bipolar Transistors (AREA)

Abstract

PURPOSE:To increase the wire-bonding area of a fourth electrode, bury a field electrode under a second silicon oxide film, and prevent the short-circuiting, by forming the field electrode on a first layer, and making the fourth electrode extend in the direction of a field electrode. CONSTITUTION:A third and a fourth electrodes 12 and 13 of comb-type are arranged, which are in ohmic contact with a first and a second electrodes 8...8, 9 via a contact holes. The fourth electrode 13 makes a bonding region extend in the direction of a field electrode 10. Therefore the bonding region can be extended, and the reduction of defects is enabled. The third electrode 12 surrounds the periphery of the fourth electrode 13, and reaches both ends of the bonding region. The field electrode 10 is formed on the first layer. Therefore, the left end of the wire-bonding region of the fourth electrode 13 is a silicon oxide film 11, so that the short-circuiting to the third electrode 12 and the field electrode 10 at the time of wire-bonding can be prevented.
JP62179292A 1987-07-17 1987-07-17 Transistor Pending JPS6422062A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62179292A JPS6422062A (en) 1987-07-17 1987-07-17 Transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62179292A JPS6422062A (en) 1987-07-17 1987-07-17 Transistor

Publications (1)

Publication Number Publication Date
JPS6422062A true JPS6422062A (en) 1989-01-25

Family

ID=16063274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62179292A Pending JPS6422062A (en) 1987-07-17 1987-07-17 Transistor

Country Status (1)

Country Link
JP (1) JPS6422062A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH038435U (en) * 1989-06-09 1991-01-28

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH038435U (en) * 1989-06-09 1991-01-28

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