JPS6423576A - Mis type field-effect transistor - Google Patents
Mis type field-effect transistorInfo
- Publication number
- JPS6423576A JPS6423576A JP62180306A JP18030687A JPS6423576A JP S6423576 A JPS6423576 A JP S6423576A JP 62180306 A JP62180306 A JP 62180306A JP 18030687 A JP18030687 A JP 18030687A JP S6423576 A JPS6423576 A JP S6423576A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- plane
- gate electrode
- distortion
- electrode layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/602—Heterojunction gate electrodes for FETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/40—Crystalline structures
- H10D62/405—Orientations of crystalline planes
Landscapes
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To obtain a function as a MISFET even if a gate voltage applied to a gate electrode layer 7 is comparatively lower, by composing a second semiconductor layer which has a plane orientation except a plane (100) in its main plane and has inner distortion. CONSTITUTION:A semiconductor layer 24 is formed in a crystal structure of a zincblende type, and it has a plane bearing with a plane (111) A in its main plane, and besides it has inner distortion and a non-diagonal component of a piezo distortion tensor. Since the semiconductor layer 24 has a lattice constant smaller than a semiconductor layer 23 has, an internal electric field is induced by the semiconductor layer 24 so that electrons are made to move from the side of the semiconductor layer 23 toward the opposite side of the gate electrode layer 7. A height of a barrier of the semiconductor layer 24 is made higher at least than an energy component, which is based on the internal electric field induced by the semiconductor layer 24, and a height of the barrier of the semiconductor layer 4. Hence a function as a MISFET can be obtained with prescribed characteristics even if a gate voltage applied to a gate electrode layer 7 is made high.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62180306A JPS6423576A (en) | 1987-07-20 | 1987-07-20 | Mis type field-effect transistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62180306A JPS6423576A (en) | 1987-07-20 | 1987-07-20 | Mis type field-effect transistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6423576A true JPS6423576A (en) | 1989-01-26 |
Family
ID=16080903
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62180306A Pending JPS6423576A (en) | 1987-07-20 | 1987-07-20 | Mis type field-effect transistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6423576A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02192737A (en) * | 1989-01-20 | 1990-07-30 | Nec Corp | Field effect transistor |
| US20110233689A1 (en) * | 2008-12-08 | 2011-09-29 | Sumitomo Chemical Company, Limited | Semiconductor device, process for producing semiconductor device, semiconductor substrate, and process for producing semiconductor substrate |
-
1987
- 1987-07-20 JP JP62180306A patent/JPS6423576A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02192737A (en) * | 1989-01-20 | 1990-07-30 | Nec Corp | Field effect transistor |
| US20110233689A1 (en) * | 2008-12-08 | 2011-09-29 | Sumitomo Chemical Company, Limited | Semiconductor device, process for producing semiconductor device, semiconductor substrate, and process for producing semiconductor substrate |
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