JPS6428366A - Crucible of vacuum deposition device - Google Patents

Crucible of vacuum deposition device

Info

Publication number: JPS6428366A
Authority: JP; Japan
Prior art keywords: crucible; temp; graphite; vacuum deposition; deposition device
Prior art date: 1987-07-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP18432087A

Other languages

English (en)

Inventor

Makoto Shinohara

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Shimadzu Corp

Original Assignee

Shimadzu Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-07-22

Filing date

1987-07-22

Publication date

1989-01-30

1987-07-22 Application filed by Shimadzu Corp filed Critical Shimadzu Corp

1987-07-22 Priority to JP18432087A priority Critical patent/JPS6428366A/ja

1989-01-30 Publication of JPS6428366A publication Critical patent/JPS6428366A/ja

Status Pending legal-status Critical Current

Links

238000001771 vacuum deposition Methods 0.000 title abstract 2
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
239000011248 coating agent Substances 0.000 abstract 2
238000000576 coating method Methods 0.000 abstract 2
229910002804 graphite Inorganic materials 0.000 abstract 2
239000010439 graphite Substances 0.000 abstract 2
229910052582 BN Inorganic materials 0.000 abstract 1
PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 abstract 1
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
230000015556 catabolic process Effects 0.000 abstract 1
238000007796 conventional method Methods 0.000 abstract 1
238000006731 degradation reaction Methods 0.000 abstract 1
238000001514 detection method Methods 0.000 abstract 1
230000008020 evaporation Effects 0.000 abstract 1
238000001704 evaporation Methods 0.000 abstract 1
238000010438 heat treatment Methods 0.000 abstract 1
239000012212 insulator Substances 0.000 abstract 1
239000000463 material Substances 0.000 abstract 1
238000000034 method Methods 0.000 abstract 1
239000000758 substrate Substances 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)

JP18432087A 1987-07-22 1987-07-22 Crucible of vacuum deposition device Pending JPS6428366A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP18432087A JPS6428366A (en)	1987-07-22	1987-07-22	Crucible of vacuum deposition device

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP18432087A JPS6428366A (en)	1987-07-22	1987-07-22	Crucible of vacuum deposition device

Publications (1)

Publication Number	Publication Date
JPS6428366A true JPS6428366A (en)	1989-01-30

Family

ID=16151269

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP18432087A Pending JPS6428366A (en)	1987-07-22	1987-07-22	Crucible of vacuum deposition device

Country Status (1)

Country	Link
JP (1)	JPS6428366A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH04231459A (ja) *	1990-06-06	1992-08-20	Union Carbide Coatings Service Technol Corp	窒化硼素製るつぼ及びそれを製造するための方法
GB2306512A (en) *	1995-10-27	1997-05-07	Leybold Ag	Electron beam vacuum coating plant having a crucible of high melting material
JP2006233304A (ja) *	2005-02-28	2006-09-07	Toppan Printing Co Ltd	蒸着ボートおよびシース熱電対

1987
- 1987-07-22 JP JP18432087A patent/JPS6428366A/ja active Pending

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH04231459A (ja) *	1990-06-06	1992-08-20	Union Carbide Coatings Service Technol Corp	窒化硼素製るつぼ及びそれを製造するための方法
GB2306512A (en) *	1995-10-27	1997-05-07	Leybold Ag	Electron beam vacuum coating plant having a crucible of high melting material
GB2306512B (en) *	1995-10-27	1999-06-16	Leybold Ag	Vacuum coating plant with a crucible disposed in the vacuum chamber for holding material to be evaporated
JP2006233304A (ja) *	2005-02-28	2006-09-07	Toppan Printing Co Ltd	蒸着ボートおよびシース熱電対

Similar Documents

Publication	Publication Date	Title
US3419487A (en)	1968-12-31	Method of growing thin film semiconductors using an electron beam
US4170662A (en)	1979-10-09	Plasma plating
SE8402153L (sv)	1984-11-14	Forfarande och anordning for ytbeleggning av ett substrat med ett material som pa elektrisk veg har overforts till angfas
EP0269446A3 (en)	1990-03-07	System and method for vacuum deposition of thin films
EP0282836A3 (en)	1989-07-26	Process and apparatus for depositing of high ohmic resistance layers by cathodic sputtering
US4237183A (en)	1980-12-02	Process for the surface treatment of a synthetic resin lens and the product thereof
JPS5562778A (en)	1980-05-12	Preparation of photoconductor film
JPS6428366A (en)	1989-01-30	Crucible of vacuum deposition device
WO1987007916A1 (fr)	1987-12-30	Appareil pour former un film mince
US3392056A (en)	1968-07-09	Method of making single crystal films and the product resulting therefrom
JPH0661335A (ja)	1994-03-04	半導体製造装置用の基板保持プレート
US3676320A (en)	1972-07-11	Method for depositing thin films on thin elongated electrically insulating substrates
JPS57194254A (en)	1982-11-29	Cathode for insulator target in rf sputtering
ATE115645T1 (de)	1994-12-15	Verfahren zum aufdampfen eines diamantähnlichen films auf ein niedrig schmelzendes substrat.
DE3666993D1 (en)	1989-12-21	Refractory coated article
SE8501281L (sv)	1985-11-26	Forfarande for bekledning av keramiska emnen och kvartsdeglar med material som pa elektrisk veg har overforts till angfasen
SE8501521D0 (sv)	1985-03-27	Forfarande for paforande av en beleggning
JPS5457477A (en)	1979-05-09	Throw away tip of coated tool steel
US4201654A (en)	1980-05-06	Anode assisted sputter etch and deposition apparatus
SE8604842L (sv)	1988-05-13	Forfarande for avsettning av en notningsbestendig beleggning pa ett skerverktyg ur ett kolinnehallande material
JPS5614408A (en)	1981-02-12	Manufacture of solid electrolyte
JPS63238266A (ja)	1988-10-04	スパツタリング装置
JPS573831A (en)	1982-01-09	Vacuum metallizing method
JPS5678422A (en)	1981-06-27	Preparation of electrically conductive transparent thin film
JPS55141564A (en)	1980-11-05	Crucible for vapour coating