JPS6442152A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS6442152A
JPS6442152A JP62198534A JP19853487A JPS6442152A JP S6442152 A JPS6442152 A JP S6442152A JP 62198534 A JP62198534 A JP 62198534A JP 19853487 A JP19853487 A JP 19853487A JP S6442152 A JPS6442152 A JP S6442152A
Authority
JP
Japan
Prior art keywords
interconnection
photosensitive
aluminum
photolithography technique
hole pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62198534A
Other languages
English (en)
Inventor
Yasushi Jin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP62198534A priority Critical patent/JPS6442152A/ja
Publication of JPS6442152A publication Critical patent/JPS6442152A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP62198534A 1987-08-07 1987-08-07 Manufacture of semiconductor device Pending JPS6442152A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62198534A JPS6442152A (en) 1987-08-07 1987-08-07 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62198534A JPS6442152A (en) 1987-08-07 1987-08-07 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS6442152A true JPS6442152A (en) 1989-02-14

Family

ID=16392751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62198534A Pending JPS6442152A (en) 1987-08-07 1987-08-07 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS6442152A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06140520A (ja) * 1990-04-30 1994-05-20 Internatl Business Mach Corp <Ibm> 感光性ポリイミドポリマー組成物を用いる多層導体／絶縁体共平面薄膜の形成方法及び前記方法で製造される半導体構造体

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06140520A (ja) * 1990-04-30 1994-05-20 Internatl Business Mach Corp <Ibm> 感光性ポリイミドポリマー組成物を用いる多層導体／絶縁体共平面薄膜の形成方法及び前記方法で製造される半導体構造体

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