JPS6444448A - Outward appearance inspecting method for photomask or the like - Google Patents

Outward appearance inspecting method for photomask or the like

Info

Publication number
JPS6444448A
JPS6444448A JP19971287A JP19971287A JPS6444448A JP S6444448 A JPS6444448 A JP S6444448A JP 19971287 A JP19971287 A JP 19971287A JP 19971287 A JP19971287 A JP 19971287A JP S6444448 A JPS6444448 A JP S6444448A
Authority
JP
Japan
Prior art keywords
area
photomask
data
inspection
outward appearance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19971287A
Other languages
Japanese (ja)
Inventor
Yasuhiro Koizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP19971287A priority Critical patent/JPS6444448A/en
Publication of JPS6444448A publication Critical patent/JPS6444448A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To eliminate misdecision making due to a shift in an inspection area by forming an alignment mark for superposition outside an area to be inspected and performing inspection by using its data. CONSTITUTION:The alignment mark 3 for superposing set pattern data as the base of a shape and design pattern data formed on a photomak 1 is formed outside the transfer exposure area 2 of the photomask 1. Then the data of the mark 3 is used to superpose both data one over the other, the superposition shift quantity of each inspection divided area 6 is detected and corrected, and a next area 6 is inspected. This method eliminates the misdecision in the inspection area 4 due to the shift and the photomask having no outward appearance defect is formed.
JP19971287A 1987-08-12 1987-08-12 Outward appearance inspecting method for photomask or the like Pending JPS6444448A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19971287A JPS6444448A (en) 1987-08-12 1987-08-12 Outward appearance inspecting method for photomask or the like

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19971287A JPS6444448A (en) 1987-08-12 1987-08-12 Outward appearance inspecting method for photomask or the like

Publications (1)

Publication Number Publication Date
JPS6444448A true JPS6444448A (en) 1989-02-16

Family

ID=16412355

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19971287A Pending JPS6444448A (en) 1987-08-12 1987-08-12 Outward appearance inspecting method for photomask or the like

Country Status (1)

Country Link
JP (1) JPS6444448A (en)

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