JPS6445799A - Production of cadmium telluride based crystal - Google Patents
Production of cadmium telluride based crystalInfo
- Publication number
- JPS6445799A JPS6445799A JP20126687A JP20126687A JPS6445799A JP S6445799 A JPS6445799 A JP S6445799A JP 20126687 A JP20126687 A JP 20126687A JP 20126687 A JP20126687 A JP 20126687A JP S6445799 A JPS6445799 A JP S6445799A
- Authority
- JP
- Japan
- Prior art keywords
- cdte
- chamber
- based crystal
- contamination
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 title abstract 7
- 239000013078 crystal Substances 0.000 title abstract 5
- 238000011109 contamination Methods 0.000 abstract 3
- 239000007788 liquid Substances 0.000 abstract 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 239000000155 melt Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000007789 sealing Methods 0.000 abstract 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
PURPOSE:To obtain a Cadmium telluride (CdTe) based crystal of high purity without contamination with boron, by hermetically sealing a growth chamber with liquid B2O3 so as to prevent a gas in the growth vessel provided in a high-pressure chamber from leaking into the high-pressure chamber and keeping the temperature of the above-mentioned B2O3 within a given temperature range. CONSTITUTION:A crucible 1, containing CdTe melt 2 and rotatably supported by a crucible shaft 3 is placed in the interior of a growth chamber 4. A through- hole for passing a pulling up shaft 6 for pulling up a CdTe crystal 5 from the melt 2 is formed in the upper part of the chamber 4 and a receiving part 7 is formed on the through-hole. Liquid B2O3 placed in the receiving part 7 is used to prevent vapor in the interior of the chamber 4 from leaking to a high-pressure chamber 10. In this case, temperature of the above-mentioned liquid B2O3 is kept at 730-1,080 deg.C. Contamination with B due to the B2O3 vapor in the CdTe based crystal is prevented according to the method of this invention and the aimed CdTe based crystal without contamination with the B can be grown.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20126687A JPS6445799A (en) | 1987-08-11 | 1987-08-11 | Production of cadmium telluride based crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20126687A JPS6445799A (en) | 1987-08-11 | 1987-08-11 | Production of cadmium telluride based crystal |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6445799A true JPS6445799A (en) | 1989-02-20 |
Family
ID=16438103
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20126687A Pending JPS6445799A (en) | 1987-08-11 | 1987-08-11 | Production of cadmium telluride based crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6445799A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5309224A (en) * | 1990-10-31 | 1994-05-03 | Matsushita Electric Industrial Co., Ltd. | Apparatus for converting a television signal of a first television system into a television signal of a second television system employing a digital chrominance signal processing circuit |
| JP2016207752A (en) * | 2015-04-17 | 2016-12-08 | Jx金属株式会社 | CdTe compound semiconductor and radiation detection element using the same |
| CN111809235A (en) * | 2020-09-08 | 2020-10-23 | 宁波碲晶光电科技有限公司 | Method for preparing cadmium telluride or cadmium zinc telluride polycrystal material |
| CN111809243A (en) * | 2020-09-08 | 2020-10-23 | 宁波碲晶光电科技有限公司 | A kind of method for preparing cadmium telluride or cadmium zinc telluride polycrystalline material |
-
1987
- 1987-08-11 JP JP20126687A patent/JPS6445799A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5309224A (en) * | 1990-10-31 | 1994-05-03 | Matsushita Electric Industrial Co., Ltd. | Apparatus for converting a television signal of a first television system into a television signal of a second television system employing a digital chrominance signal processing circuit |
| JP2016207752A (en) * | 2015-04-17 | 2016-12-08 | Jx金属株式会社 | CdTe compound semiconductor and radiation detection element using the same |
| CN111809235A (en) * | 2020-09-08 | 2020-10-23 | 宁波碲晶光电科技有限公司 | Method for preparing cadmium telluride or cadmium zinc telluride polycrystal material |
| CN111809243A (en) * | 2020-09-08 | 2020-10-23 | 宁波碲晶光电科技有限公司 | A kind of method for preparing cadmium telluride or cadmium zinc telluride polycrystalline material |
| CN111809235B (en) * | 2020-09-08 | 2020-12-22 | 宁波碲晶光电科技有限公司 | Method for preparing cadmium telluride or cadmium zinc telluride polycrystal material |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6445799A (en) | Production of cadmium telluride based crystal | |
| JPS60251191A (en) | Process for growing single crystal of compound having high dissociation pressure | |
| US3481711A (en) | Crystal growth apparatus | |
| EP0102054B1 (en) | Method for growing gaas single crystal by using floating zone | |
| EP0132618A1 (en) | Process for preparing ZnSe single crystal | |
| JPS5669298A (en) | Method of growing single crystal of semiconductor | |
| JP2585276B2 (en) | CdTe crystal manufacturing equipment | |
| JPS5777098A (en) | Method and apparatus for growing znse in liquid phase | |
| JPS54122682A (en) | Single crystal growing device | |
| JP2830306B2 (en) | Compound semiconductor crystal manufacturing equipment | |
| JPS6437497A (en) | Method for growing compound semiconductor crystal | |
| EP0100453B1 (en) | method for growing a gaas single crystal by pulling from gaas melt | |
| JPS58167500A (en) | Preparation of single crystal of gallium arsenic | |
| CN2666932Y (en) | Apparatus for compound semiconductor material polycrystal synthetization | |
| JPS57129896A (en) | Liquid phase epitaxial growing apparatus | |
| JPS54141389A (en) | Crucible used in crystal growing device, manufacture of said crucible and crystal growing method using said crucible | |
| JP2830315B2 (en) | High dissociation pressure single crystal manufacturing equipment | |
| KR900003424A (en) | High dissociation pressure compound semiconductor single crystal growth method and device | |
| JPS564232A (en) | Method for liquid-phase epitaxial growing | |
| JPS54128990A (en) | Growing method for single crystal of gallium phosphide | |
| JPS57170894A (en) | Manufacture of single crystal of ferrodielectic substance | |
| JPS57149721A (en) | Method of vapor epitaxial growth | |
| JPH01230493A (en) | Apparatus for producing iii-v compound semiconductor single crystal and apparatus therefor | |
| JPS6437488A (en) | Production of single crystal of compound semiconductor and device therefor | |
| JPS5492597A (en) | Semi-insulating gallium arsenide crystals produced by liquid capsule pulling method |